DE602007001393D1 - EINRICHTUNG ZUM SAMMELN VON FLUß ELEKTROMAGNETISCHER STRAHLUNG IM EXTREMEN ULTRAVIOLETTBEREICH - Google Patents

EINRICHTUNG ZUM SAMMELN VON FLUß ELEKTROMAGNETISCHER STRAHLUNG IM EXTREMEN ULTRAVIOLETTBEREICH

Info

Publication number
DE602007001393D1
DE602007001393D1 DE602007001393T DE602007001393T DE602007001393D1 DE 602007001393 D1 DE602007001393 D1 DE 602007001393D1 DE 602007001393 T DE602007001393 T DE 602007001393T DE 602007001393 T DE602007001393 T DE 602007001393T DE 602007001393 D1 DE602007001393 D1 DE 602007001393D1
Authority
DE
Germany
Prior art keywords
electromagnetic radiation
extreme ultraviolet
collecting flow
concave
collector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602007001393T
Other languages
English (en)
Inventor
Roland Geyl
Vincent Patoz
Francois Riguet
De Virel Francois Dufresne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Safran Electronics and Defense SAS
Original Assignee
Sagem Defense Securite SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sagem Defense Securite SA filed Critical Sagem Defense Securite SA
Publication of DE602007001393D1 publication Critical patent/DE602007001393D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lenses (AREA)
  • X-Ray Techniques (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DE602007001393T 2006-04-07 2007-04-04 EINRICHTUNG ZUM SAMMELN VON FLUß ELEKTROMAGNETISCHER STRAHLUNG IM EXTREMEN ULTRAVIOLETTBEREICH Active DE602007001393D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0603116A FR2899698A1 (fr) 2006-04-07 2006-04-07 Dispositif de collecte de flux de rayonnement electromagnetique dans l'extreme ultraviolet
PCT/FR2007/000573 WO2007118993A1 (fr) 2006-04-07 2007-04-04 Dispositif de collecte de flux de rayonnement electromagnetique dans l'extreme ultraviolet

Publications (1)

Publication Number Publication Date
DE602007001393D1 true DE602007001393D1 (de) 2009-08-06

Family

ID=37451123

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602007001393T Active DE602007001393D1 (de) 2006-04-07 2007-04-04 EINRICHTUNG ZUM SAMMELN VON FLUß ELEKTROMAGNETISCHER STRAHLUNG IM EXTREMEN ULTRAVIOLETTBEREICH

Country Status (7)

Country Link
US (1) US8023182B2 (de)
EP (1) EP2005252B1 (de)
JP (1) JP4897039B2 (de)
AT (1) ATE434778T1 (de)
DE (1) DE602007001393D1 (de)
FR (1) FR2899698A1 (de)
WO (1) WO2007118993A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101592136B1 (ko) * 2007-10-26 2016-02-04 칼 짜이스 에스엠티 게엠베하 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 갖는 마이크로리소그래피용 투영 노광 장치
FR2932283B1 (fr) * 2008-06-05 2010-07-30 Sagem Defense Securite Collecteur de rayonnement
CN102177470B (zh) * 2008-10-17 2014-03-12 Asml荷兰有限公司 收集器组件、辐射源、光刻设备和器件制造方法
DE102010028655A1 (de) 2010-05-06 2011-11-10 Carl Zeiss Smt Gmbh EUV-Kollektor
US9057962B2 (en) * 2010-06-18 2015-06-16 Media Lario S.R.L. Source-collector module with GIC mirror and LPP EUV light source
DE102010041623A1 (de) * 2010-09-29 2012-03-29 Carl Zeiss Smt Gmbh Spiegel
DE102013012956A1 (de) * 2013-08-02 2015-02-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Kollektoranordnung für EUV- und/oder weiche Röntgenstrahlung
JP6676066B2 (ja) * 2015-11-05 2020-04-08 ギガフォトン株式会社 極端紫外光生成装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3325238A (en) * 1963-06-04 1967-06-13 Keuffel & Esser Co Solar simulator
GB2197962A (en) * 1986-11-10 1988-06-02 Compact Spindle Bearing Corp Catoptric reduction imaging apparatus
US5212588A (en) * 1991-04-09 1993-05-18 The United States Of America As Represented By The United States Department Of Energy Reflective optical imaging system for extreme ultraviolet wavelengths
JPH05164966A (ja) * 1991-12-13 1993-06-29 Olympus Optical Co Ltd 集光光学系
US5737137A (en) * 1996-04-01 1998-04-07 The Regents Of The University Of California Critical illumination condenser for x-ray lithography
US7410265B2 (en) 2000-09-13 2008-08-12 Carl Zeiss Smt Ag Focusing-device for the radiation from a light source
JP2003014893A (ja) * 2001-04-27 2003-01-15 Nikon Corp 多層膜反射鏡及び露光装置
DE10139177A1 (de) * 2001-08-16 2003-02-27 Zeiss Carl Objektiv mit Pupillenobskuration
US7084412B2 (en) * 2002-03-28 2006-08-01 Carl Zeiss Smt Ag Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm
JP4340851B2 (ja) * 2003-04-09 2009-10-07 株式会社ニコン 光源ユニット、照明光学装置、露光装置および露光方法
EP1469349B1 (de) * 2003-04-17 2011-10-05 ASML Netherlands B.V. Lithographische Projektionsvorrichtung mit einem einen Konkavspiegel und einen Konvexspiegel aufweisenden Kollektor
US7075713B2 (en) * 2003-05-05 2006-07-11 University Of Central Florida Research Foundation High efficiency collector for laser plasma EUV source
JP4327799B2 (ja) * 2003-08-27 2009-09-09 カール・ツァイス・エスエムティー・アーゲー 光源、とくにｅｕｖプラズマ放電源のための傾斜ミラーの垂直入射コレクタシステム
US7405871B2 (en) * 2005-02-08 2008-07-29 Intel Corporation Efficient EUV collector designs

Also Published As

Publication number Publication date
EP2005252B1 (de) 2009-06-24
US20090244696A1 (en) 2009-10-01
US8023182B2 (en) 2011-09-20
JP2009532891A (ja) 2009-09-10
WO2007118993A1 (fr) 2007-10-25
FR2899698A1 (fr) 2007-10-12
JP4897039B2 (ja) 2012-03-14
ATE434778T1 (de) 2009-07-15
EP2005252A1 (de) 2008-12-24

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