DE60332966D1 - Kollektoren in zwei hemispheren - Google Patents

Kollektoren in zwei hemispheren

Info

Publication number
DE60332966D1
DE60332966D1 DE60332966T DE60332966T DE60332966D1 DE 60332966 D1 DE60332966 D1 DE 60332966D1 DE 60332966 T DE60332966 T DE 60332966T DE 60332966 T DE60332966 T DE 60332966T DE 60332966 D1 DE60332966 D1 DE 60332966D1
Authority
DE
Germany
Prior art keywords
hemisphere
source
hemisphones
collectors
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60332966T
Other languages
English (en)
Inventor
Michael Goldstein
Peter Silverman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Intel Corp
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Application granted granted Critical
Publication of DE60332966D1 publication Critical patent/DE60332966D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Secondary Cells (AREA)
  • Medicines Containing Material From Animals Or Micro-Organisms (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Amplifiers (AREA)
DE60332966T 2003-03-20 2003-12-15 Kollektoren in zwei hemispheren Expired - Lifetime DE60332966D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/394,412 US7034320B2 (en) 2003-03-20 2003-03-20 Dual hemispherical collectors
PCT/US2003/040315 WO2004095140A2 (en) 2003-03-20 2003-12-15 Collectors in two hemispheres

Publications (1)

Publication Number Publication Date
DE60332966D1 true DE60332966D1 (de) 2010-07-22

Family

ID=32988377

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60332966T Expired - Lifetime DE60332966D1 (de) 2003-03-20 2003-12-15 Kollektoren in zwei hemispheren

Country Status (9)

Country Link
US (2) US7034320B2 (de)
EP (1) EP1604246B1 (de)
KR (1) KR100737645B1 (de)
CN (1) CN1729431B (de)
AT (1) ATE470888T1 (de)
AU (1) AU2003301038A1 (de)
DE (1) DE60332966D1 (de)
TW (1) TWI232351B (de)
WO (1) WO2004095140A2 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7405871B2 (en) * 2005-02-08 2008-07-29 Intel Corporation Efficient EUV collector designs
US7482609B2 (en) * 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US7465943B2 (en) * 2005-12-08 2008-12-16 Asml Netherlands B.V. Controlling the flow through the collector during cleaning
ATE528693T1 (de) 2006-09-15 2011-10-15 Media Lario Srl Optisches kollektorsystem
US20080237498A1 (en) * 2007-01-29 2008-10-02 Macfarlane Joseph J High-efficiency, low-debris short-wavelength light sources
US8901521B2 (en) 2007-08-23 2014-12-02 Asml Netherlands B.V. Module and method for producing extreme ultraviolet radiation
EP2182412A1 (de) * 2008-11-04 2010-05-05 ASML Netherlands B.V. Strahlungsquelle und lithografische Vorrichtung
EP2534672B1 (de) 2010-02-09 2016-06-01 Energetiq Technology Inc. Laserbetriebene lichtquelle
DE102010028655A1 (de) 2010-05-06 2011-11-10 Carl Zeiss Smt Gmbh EUV-Kollektor
US9057962B2 (en) * 2010-06-18 2015-06-16 Media Lario S.R.L. Source-collector module with GIC mirror and LPP EUV light source
DE102011084266A1 (de) * 2011-10-11 2013-04-11 Carl Zeiss Smt Gmbh Kollektor
DE102012220465A1 (de) * 2012-11-09 2014-05-15 Carl Zeiss Smt Gmbh EUV-Kollektor
DE102013204441A1 (de) 2013-03-14 2014-04-03 Carl Zeiss Smt Gmbh Kollektor
DE102013218132A1 (de) 2013-09-11 2015-03-12 Carl Zeiss Smt Gmbh Kollektor
DE102013218128A1 (de) 2013-09-11 2015-03-12 Carl Zeiss Smt Gmbh Beleuchtungssystem
IL234727B (en) 2013-09-20 2020-09-30 Asml Netherlands Bv A light source operated by a laser in an optical system corrected for deviations and the method of manufacturing the system as mentioned
IL234729B (en) 2013-09-20 2021-02-28 Asml Netherlands Bv A light source operated by a laser and a method using a mode mixer
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
EP3457429B1 (de) 2014-05-15 2023-11-08 Excelitas Technologies Corp. Lasergesteuerte abgedichtete strahllampe mit einstellbarem druck
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
US9576785B2 (en) 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
US10057973B2 (en) 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
CN110940488B (zh) * 2019-11-11 2020-11-17 中国科学院西安光学精密机械研究所 一种WolterⅠ型非球面反射镜角分辨率检测系统及方法

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2198014A (en) * 1937-07-22 1940-04-23 Harry G Ott Optical system
GB676644A (en) * 1949-07-29 1952-07-30 Westinghouse Brake & Signal Improvements relating to optical projection apparatus
US4916485A (en) * 1989-07-18 1990-04-10 Parallex Company, Inc. Xenon optical system for cinematograph projection
US5037191A (en) * 1989-12-21 1991-08-06 Cheng Dah Y Orthogonal parabolic reflector systems
DE59107556D1 (de) * 1991-06-21 1996-04-18 Tetsuhiro Kano Reflektor und Verfahren zum Erzeugen einer Reflektorform
US5446639A (en) * 1992-04-03 1995-08-29 Nippon Sheet Glass Co., Ltd. Illuminating apparatus
US5339346A (en) * 1993-05-20 1994-08-16 At&T Bell Laboratories Device fabrication entailing plasma-derived x-ray delineation
DE19704467B4 (de) * 1997-02-06 2006-07-20 Automotive Lighting Reutlingen Gmbh Fahrzeug-Scheinwerfer
US6064072A (en) * 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
US6815700B2 (en) * 1997-05-12 2004-11-09 Cymer, Inc. Plasma focus light source with improved pulse power system
US6049588A (en) * 1997-07-10 2000-04-11 Focused X-Rays X-ray collimator for lithography
JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
US6120166A (en) * 1998-03-09 2000-09-19 Janos Technology Inc. Light source apparatus for a spectral analyzer
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US6469827B1 (en) * 1998-08-06 2002-10-22 Euv Llc Diffraction spectral filter for use in extreme-UV lithography condenser
US6118577A (en) * 1998-08-06 2000-09-12 Euv, L.L.C Diffractive element in extreme-UV lithography condenser
US6186632B1 (en) * 1998-12-31 2001-02-13 The Regents Of The University Of California Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography
EP1141760B1 (de) 1999-01-04 2004-09-29 Cyclovision Technologies, Inc. Vorrichtung zur aufnahme von panoramabildern
US6195201B1 (en) * 1999-01-27 2001-02-27 Svg Lithography Systems, Inc. Reflective fly's eye condenser for EUV lithography
JP4521896B2 (ja) 1999-06-08 2010-08-11 キヤノン株式会社 照明装置、投影露光装置及びデバイス製造方法
WO2001007939A1 (en) 1999-07-21 2001-02-01 Jmar Research, Inc. Collimator and focusing optic
JP4505664B2 (ja) * 2000-03-24 2010-07-21 株式会社ニコン Ｘ線発生装置
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
JP2002006096A (ja) * 2000-06-23 2002-01-09 Nikon Corp 電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
US20020097505A1 (en) * 2000-11-30 2002-07-25 Delong James A. Single-element catadioptric condenser lens
US6804327B2 (en) * 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
DE10138284A1 (de) * 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren
US7084412B2 (en) * 2002-03-28 2006-08-01 Carl Zeiss Smt Ag Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm
JP4105616B2 (ja) * 2002-08-15 2008-06-25 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフ投影装置およびこの装置用の反射鏡アセンブリ
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
FR2860385B1 (fr) * 2003-09-26 2007-06-01 Cit Alcatel Source euv
US7481544B2 (en) * 2004-03-05 2009-01-27 Optical Research Associates Grazing incidence relays
FR2871622B1 (fr) * 2004-06-14 2008-09-12 Commissariat Energie Atomique Dispositif de generation de lumiere dans l'extreme ultraviolet et application a une source de lithographie par rayonnement dans l'extreme ultraviolet
US7405871B2 (en) * 2005-02-08 2008-07-29 Intel Corporation Efficient EUV collector designs

Also Published As

Publication number Publication date
KR20050111780A (ko) 2005-11-28
ATE470888T1 (de) 2010-06-15
WO2004095140A3 (en) 2005-05-19
US20040183031A1 (en) 2004-09-23
US20060237668A1 (en) 2006-10-26
CN1729431B (zh) 2013-11-20
CN1729431A (zh) 2006-02-01
AU2003301038A1 (en) 2004-11-19
WO2004095140A2 (en) 2004-11-04
AU2003301038A8 (en) 2004-11-19
TWI232351B (en) 2005-05-11
US7501641B2 (en) 2009-03-10
EP1604246B1 (de) 2010-06-09
KR100737645B1 (ko) 2007-07-09
EP1604246A2 (de) 2005-12-14
US7034320B2 (en) 2006-04-25
TW200421010A (en) 2004-10-16

Similar Documents

Publication Publication Date Title
DE60332966D1 (de) Kollektoren in zwei hemispheren
CY1113839T1 (el) Γραμμικες ηλιακες συστοιχιες fresnel
TW200632582A (en) Polarized radiation in lithographic apparatus and device manufacturing method
ITMI20021439A0 (it) Impianto di generazione eolica ad alto rendimento energetico
TW200700904A (en) Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
DE60213696D1 (de) Sekundär-Energiequelle
TW200717039A (en) Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
DE60325556D1 (de) Kollektor mit hohem Wirkungsgrad
DE602006001501D1 (de) Kompaktes Objektiv mit drei Einzellinsen
ATE507503T1 (de) Vorrichtung zur beeinflussung von licht
AU2003206691A1 (en) Optical arrangement, optical grid for use in an optical arrangement and method for the production of one such optical lattice
NL1021971A1 (nl) Brandstofcelinrichting.
ITTO20030832A1 (it) Struttura di tubazione del carburante in veicolo di piccole dimensioni.
ATA2872001A (de) Solar-kollektor
NL1022271A1 (nl) Plaatvormige fotovoltaische zonnemodule.
DK1692435T3 (da) Solanlæg
ES1049600Y (es) Aparato vareador recolector mecanico portatil ligero.
TW200511125A (en) Inquiring apparatus and method thereof
NO20040545L (no) Forbedret solcelle.
ES1052575Y (es) Colector solar plano multiparabolico.
ATA10192001A (de) Hochdynamische veränderbare stromquellen
TW200707528A (en) System and method for wafer visual inspection
ITRM20020131U1 (it) Impianto fotovoltaico mobile rimorchiabile.
EA200702665A1 (ru) Солнечный коллектор
FI20010878A (fi) Suuren hyötysuhteen omaava puolijohdevalolähde ja menetelmä sen valmistamiseksi