DE602005027435D1 - Ionenquelle mit hoher Stromdichte - Google Patents

Ionenquelle mit hoher Stromdichte

Info

Publication number
DE602005027435D1
DE602005027435D1 DE602005027435T DE602005027435T DE602005027435D1 DE 602005027435 D1 DE602005027435 D1 DE 602005027435D1 DE 602005027435 T DE602005027435 T DE 602005027435T DE 602005027435 T DE602005027435 T DE 602005027435T DE 602005027435 D1 DE602005027435 D1 DE 602005027435D1
Authority
DE
Germany
Prior art keywords
plasma
plasma chamber
current density
high current
ion source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005027435T
Other languages
English (en)
Inventor
Tantraporn Wirojana
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thailand Research Fund
Original Assignee
Thailand Research Fund
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thailand Research Fund filed Critical Thailand Research Fund
Publication of DE602005027435D1 publication Critical patent/DE602005027435D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
DE602005027435T 2005-02-10 2005-02-10 Ionenquelle mit hoher Stromdichte Active DE602005027435D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05450024A EP1693877B1 (de) 2005-02-10 2005-02-10 Ionenquelle mit hoher Stromdichte

Publications (1)

Publication Number Publication Date
DE602005027435D1 true DE602005027435D1 (de) 2011-05-26

Family

ID=34943308

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005027435T Active DE602005027435D1 (de) 2005-02-10 2005-02-10 Ionenquelle mit hoher Stromdichte

Country Status (3)

Country Link
EP (1) EP1693877B1 (de)
AT (1) ATE505807T1 (de)
DE (1) DE602005027435D1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117711909B (zh) * 2024-02-04 2024-04-12 中国科学院合肥物质科学研究院 一种非均匀场的离子化器和离子聚焦方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH547549A (de) * 1972-01-24 1974-03-29 Balzers Patent Beteilig Ag Anordnung zur erzeugung von ionen.
JPH09223594A (ja) * 1996-02-16 1997-08-26 Ebara Corp ビーム源及び微細加工方法
US6388381B2 (en) * 1996-09-10 2002-05-14 The Regents Of The University Of California Constricted glow discharge plasma source
DE10047688B4 (de) * 2000-09-24 2004-10-28 Roentdek-Handels Gmbh Ionenquelle

Also Published As

Publication number Publication date
ATE505807T1 (de) 2011-04-15
EP1693877A1 (de) 2006-08-23
EP1693877B1 (de) 2011-04-13

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