DE602005022604D1 - Anlage zur kontinuierlichen Herstellung eines Supraleiterbandes - Google Patents

Anlage zur kontinuierlichen Herstellung eines Supraleiterbandes

Info

Publication number
DE602005022604D1
DE602005022604D1 DE602005022604T DE602005022604T DE602005022604D1 DE 602005022604 D1 DE602005022604 D1 DE 602005022604D1 DE 602005022604 T DE602005022604 T DE 602005022604T DE 602005022604 T DE602005022604 T DE 602005022604T DE 602005022604 D1 DE602005022604 D1 DE 602005022604D1
Authority
DE
Germany
Prior art keywords
treatment chamber
plant
continuous production
tape
situated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005022604T
Other languages
English (en)
Inventor
Marco Canetti
Alessandro Battocchio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIAL VACUUM Srl
Original Assignee
RIAL VACUUM Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIAL VACUUM Srl filed Critical RIAL VACUUM Srl
Publication of DE602005022604D1 publication Critical patent/DE602005022604D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/16—Sealings between relatively-moving surfaces
    • F16J15/168—Sealings between relatively-moving surfaces which permits material to be continuously conveyed
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/16—Sealings between relatively-moving surfaces
    • F16J15/40—Sealings between relatively-moving surfaces by means of fluid
    • F16J15/406—Sealings between relatively-moving surfaces by means of fluid by at least one pump
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0381—Processes for depositing or forming copper oxide superconductor layers by evaporation, e.g. MBE

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Physical Vapour Deposition (AREA)
DE602005022604T 2005-12-28 2005-12-28 Anlage zur kontinuierlichen Herstellung eines Supraleiterbandes Active DE602005022604D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05113039A EP1804306B1 (de) 2005-12-28 2005-12-28 Anlage zur kontinuierlichen Herstellung eines Supraleiterbandes

Publications (1)

Publication Number Publication Date
DE602005022604D1 true DE602005022604D1 (de) 2010-09-09

Family

ID=36581841

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005022604T Active DE602005022604D1 (de) 2005-12-28 2005-12-28 Anlage zur kontinuierlichen Herstellung eines Supraleiterbandes

Country Status (3)

Country Link
EP (1) EP1804306B1 (de)
AT (1) ATE475993T1 (de)
DE (1) DE602005022604D1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104236991A (zh) * 2014-08-19 2014-12-24 宁波英飞迈材料科技有限公司 一种可拆卸原位热处理装置及其使用方法
CN105970174B (zh) * 2016-06-14 2019-06-21 肇庆市大力真空设备有限公司 一种快速的真空磁控溅射镀膜设备及其加工方法
CN109402596A (zh) * 2018-10-29 2019-03-01 厦门建霖健康家居股份有限公司 一种连续型真空多彩镀膜系统
CN111519159B (zh) * 2020-04-30 2021-06-04 绍兴市宇德塑料制品有限公司 一种多适用规格的塑料制品真空镀膜设备
CN116641037B (zh) * 2023-07-27 2023-10-20 上海超导科技股份有限公司 双面镀制超导带材保护层的设备

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1009883B (de) * 1953-05-15 1957-06-06 Heraeus Gmbh W C Hochvakuumbedampfungsanlage
FR1545284A (fr) * 1967-11-24 1968-11-08 Hochvakuum Dresden Veb Dispositif de projection par vaporisation sur des bandes
US4763601A (en) * 1987-09-02 1988-08-16 Nippon Steel Corporation Continuous composite coating apparatus for coating strip
US20040016401A1 (en) * 2002-07-26 2004-01-29 Metal Oxide Technologies, Inc. Method and apparatus for forming superconductor material on a tape substrate

Also Published As

Publication number Publication date
ATE475993T1 (de) 2010-08-15
EP1804306A1 (de) 2007-07-04
EP1804306B1 (de) 2010-07-28

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