DE602005018459D1 - Verfahren zur herstellung von sputterbeschichteten substraten, magnetronquelle und sputterkammer mit einer solchen quelle - Google Patents

Verfahren zur herstellung von sputterbeschichteten substraten, magnetronquelle und sputterkammer mit einer solchen quelle

Info

Publication number
DE602005018459D1
DE602005018459D1 DE602005018459T DE602005018459T DE602005018459D1 DE 602005018459 D1 DE602005018459 D1 DE 602005018459D1 DE 602005018459 T DE602005018459 T DE 602005018459T DE 602005018459 T DE602005018459 T DE 602005018459T DE 602005018459 D1 DE602005018459 D1 DE 602005018459D1
Authority
DE
Germany
Prior art keywords
source
sputter
area
closed loop
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005018459T
Other languages
English (en)
Inventor
Stanislav Kadlec
Eduard Kuegler
Walter Haag
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
OC Oerlikon Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OC Oerlikon Balzers AG filed Critical OC Oerlikon Balzers AG
Publication of DE602005018459D1 publication Critical patent/DE602005018459D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3455—Movable magnets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
DE602005018459T 2004-03-12 2005-01-06 Verfahren zur herstellung von sputterbeschichteten substraten, magnetronquelle und sputterkammer mit einer solchen quelle Active DE602005018459D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/798,331 US7718042B2 (en) 2004-03-12 2004-03-12 Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source
PCT/CH2005/000006 WO2005088670A2 (en) 2004-03-12 2005-01-06 Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source

Publications (1)

Publication Number Publication Date
DE602005018459D1 true DE602005018459D1 (de) 2010-02-04

Family

ID=34920254

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005018459T Active DE602005018459D1 (de) 2004-03-12 2005-01-06 Verfahren zur herstellung von sputterbeschichteten substraten, magnetronquelle und sputterkammer mit einer solchen quelle

Country Status (9)

Country Link
US (1) US7718042B2 (de)
EP (2) EP2164091B1 (de)
JP (1) JP5133049B2 (de)
KR (1) KR101143928B1 (de)
CN (1) CN1930652B (de)
AT (2) ATE543200T1 (de)
DE (1) DE602005018459D1 (de)
TW (1) TWI376423B (de)
WO (1) WO2005088670A2 (de)

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US7686928B2 (en) * 2004-09-23 2010-03-30 Applied Materials, Inc. Pressure switched dual magnetron
US8597479B2 (en) * 2005-02-08 2013-12-03 Tohoku Seiki Industries, Ltd. Sputtering system
US8557094B2 (en) * 2006-10-05 2013-10-15 Applied Materials, Inc. Sputtering chamber having auxiliary backside magnet to improve etch uniformity and magnetron producing sustained self sputtering of ruthenium and tantalum
US20080118663A1 (en) * 2006-10-12 2008-05-22 Applied Materials, Inc. Contamination reducing liner for inductively coupled chamber
JP4762187B2 (ja) * 2007-03-28 2011-08-31 株式会社東芝 マグネトロンスパッタリング装置および半導体装置の製造方法
GB0715879D0 (en) * 2007-08-15 2007-09-26 Gencoa Ltd Low impedance plasma
JP4276276B2 (ja) * 2007-09-07 2009-06-10 富士フイルム株式会社 圧電素子の製造方法
US20090314631A1 (en) * 2008-06-18 2009-12-24 Angstrom Sciences, Inc. Magnetron With Electromagnets And Permanent Magnets
JP5496223B2 (ja) * 2008-12-26 2014-05-21 フンダシオン テクニケル アーク・エバポレーターおよびアーク・エバポレーターの操作方法
KR20120023792A (ko) * 2009-07-17 2012-03-13 가부시키가이샤 아루박 성막 장치
CN102277559B (zh) * 2010-06-10 2014-04-30 鸿富锦精密工业（深圳）有限公司 溅镀装置
DE102011121770A1 (de) * 2011-12-21 2013-06-27 Oerlikon Trading Ag, Trübbach Homogenes HIPIMS-Beschichtungsverfahren
US20130240147A1 (en) * 2012-03-19 2013-09-19 Sang Ki Nam Methods and apparatus for selectively modulating azimuthal non-uniformity in a plasma processing system
WO2013161970A1 (ja) * 2012-04-27 2013-10-31 宇部興産株式会社 ポリアミック酸溶液組成物、及びポリイミド
DE102013106351A1 (de) * 2013-06-18 2014-12-18 Innovative Ion Coatings Ltd. Verfahren zur Vorbehandlung einer zu beschichtenden Oberfläche
US20150380635A1 (en) * 2014-06-30 2015-12-31 Texas Instruments Incorporated METHODS TO IMPROVE THE CRYSTALLINITY OF PbZrTiO3 AND Pt FILMS FOR MEMS APPLICATIONS
CN107475669B (zh) * 2017-09-19 2024-05-31 上海陛通半导体能源科技股份有限公司 金属氧化物或氮化物溅射工艺腔
JP7471236B2 (ja) * 2018-02-13 2024-04-19 エヴァテック・アーゲー マグネトロンスパッタリングのための方法および装置

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US4422896A (en) * 1982-01-26 1983-12-27 Materials Research Corporation Magnetically enhanced plasma process and apparatus
DE3619194A1 (de) * 1986-06-06 1987-12-10 Leybold Heraeus Gmbh & Co Kg Magnetron-zerstaeubungskatode fuer vakuum-beschichtungsanlagen
US5320728A (en) * 1990-03-30 1994-06-14 Applied Materials, Inc. Planar magnetron sputtering source producing improved coating thickness uniformity, step coverage and step coverage uniformity
DE4018914C1 (de) * 1990-06-13 1991-06-06 Leybold Ag, 6450 Hanau, De
EP0508359B1 (de) * 1991-04-12 1996-10-09 Balzers Aktiengesellschaft Verfahren und Anlage zur Beschichtung mindestens eines Gegenstandes
US5374343A (en) * 1992-05-15 1994-12-20 Anelva Corporation Magnetron cathode assembly
US5744011A (en) * 1993-03-18 1998-04-28 Kabushiki Kaisha Toshiba Sputtering apparatus and sputtering method
US6155200A (en) * 1997-07-08 2000-12-05 Tokyo Electron Limited ECR plasma generator and an ECR system using the generator
US6306265B1 (en) * 1999-02-12 2001-10-23 Applied Materials, Inc. High-density plasma for ionized metal deposition capable of exciting a plasma wave
JP4680353B2 (ja) * 1999-07-06 2011-05-11 アプライド マテリアルズ インコーポレイテッド スパッタリング装置および成膜方法
US6440282B1 (en) 1999-07-06 2002-08-27 Applied Materials, Inc. Sputtering reactor and method of using an unbalanced magnetron
US6398929B1 (en) * 1999-10-08 2002-06-04 Applied Materials, Inc. Plasma reactor and shields generating self-ionized plasma for sputtering
US6610184B2 (en) 2001-11-14 2003-08-26 Applied Materials, Inc. Magnet array in conjunction with rotating magnetron for plasma sputtering
US20010050220A1 (en) * 1999-11-16 2001-12-13 Applied Materials, Inc. Method and apparatus for physical vapor deposition using modulated power
US6451177B1 (en) * 2000-01-21 2002-09-17 Applied Materials, Inc. Vault shaped target and magnetron operable in two sputtering modes
US6277249B1 (en) 2000-01-21 2001-08-21 Applied Materials Inc. Integrated process for copper via filling using a magnetron and target producing highly energetic ions
US6352629B1 (en) 2000-07-10 2002-03-05 Applied Materials, Inc. Coaxial electromagnet in a magnetron sputtering reactor
US6663754B2 (en) * 2001-04-13 2003-12-16 Applied Materials, Inc. Tubular magnet as center pole in unbalanced sputtering magnetron
US6491801B1 (en) * 2001-08-07 2002-12-10 Applied Materials, Inc. Auxiliary vertical magnet outside a nested unbalanced magnetron
KR100846484B1 (ko) * 2002-03-14 2008-07-17 삼성전자주식회사 Ｒｍｉｍ 전극 및 그 제조방법 및 이를 채용하는 스퍼터링장치
US6837975B2 (en) 2002-08-01 2005-01-04 Applied Materials, Inc. Asymmetric rotating sidewall magnet ring for magnetron sputtering
WO2004017356A2 (en) 2002-08-16 2004-02-26 The Regents Of The University Of California Process and apparatus for pulsed dc magnetron reactive sputtering of thin film coatings on large substrates using smaller sputter cathodes

Also Published As

Publication number Publication date
CN1930652B (zh) 2012-02-15
WO2005088670A2 (en) 2005-09-22
TW200535268A (en) 2005-11-01
KR20070037705A (ko) 2007-04-06
EP1723664A2 (de) 2006-11-22
CN1930652A (zh) 2007-03-14
JP5133049B2 (ja) 2013-01-30
US20050199485A1 (en) 2005-09-15
ATE543200T1 (de) 2012-02-15
WO2005088670A3 (en) 2005-11-10
ATE453207T1 (de) 2010-01-15
EP2164091B1 (de) 2012-01-25
EP1723664B1 (de) 2009-12-23
EP2164091A3 (de) 2010-05-12
EP1723664B9 (de) 2010-05-19
JP2007528939A (ja) 2007-10-18
EP2164091A2 (de) 2010-03-17
TWI376423B (en) 2012-11-11
US7718042B2 (en) 2010-05-18
KR101143928B1 (ko) 2012-05-11

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