DE602004030173D1 - Verfahren und Vorrichtung zur Herstellung piezoelektrischer Röhren - Google Patents

Verfahren und Vorrichtung zur Herstellung piezoelektrischer Röhren

Info

Publication number
DE602004030173D1
DE602004030173D1 DE602004030173T DE602004030173T DE602004030173D1 DE 602004030173 D1 DE602004030173 D1 DE 602004030173D1 DE 602004030173 T DE602004030173 T DE 602004030173T DE 602004030173 T DE602004030173 T DE 602004030173T DE 602004030173 D1 DE602004030173 D1 DE 602004030173D1
Authority
DE
Germany
Prior art keywords
particles
tube
rod
piezoelectric tubes
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004030173T
Other languages
English (en)
Inventor
Jan Ma
Yin Chiang Boey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanyang Technological University
Original Assignee
Nanyang Technological University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanyang Technological University filed Critical Nanyang Technological University
Publication of DE602004030173D1 publication Critical patent/DE602004030173D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/50—Piezoelectric or electrostrictive devices having a stacked or multilayer structure
    • H10N30/506—Piezoelectric or electrostrictive devices having a stacked or multilayer structure having a cylindrical shape and having stacking in the radial direction, e.g. coaxial or spiral type rolls
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C23C26/02—Coating not provided for in groups C23C2/00 - C23C24/00 applying molten material to the substrate
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/02—Electrophoretic coating characterised by the process with inorganic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/20—Pretreatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H10N30/077—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/09—Forming piezoelectric or electrostrictive materials
    • H10N30/093—Forming inorganic materials
    • H10N30/097—Forming inorganic materials by sintering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Manufacturing Of Tubular Articles Or Embedded Moulded Articles (AREA)
  • Glass Compositions (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Rigid Pipes And Flexible Pipes (AREA)
DE602004030173T 2003-07-01 2004-02-12 Verfahren und Vorrichtung zur Herstellung piezoelektrischer Röhren Expired - Lifetime DE602004030173D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/611,401 US20040118686A1 (en) 2002-10-02 2003-07-01 Piezoelectric tubes

Publications (1)

Publication Number Publication Date
DE602004030173D1 true DE602004030173D1 (de) 2010-12-30

Family

ID=33564253

Family Applications (2)

Application Number Title Priority Date Filing Date
DE602004030173T Expired - Lifetime DE602004030173D1 (de) 2003-07-01 2004-02-12 Verfahren und Vorrichtung zur Herstellung piezoelektrischer Röhren
DE602004022049T Expired - Lifetime DE602004022049D1 (de) 2003-07-01 2004-02-12 Verfahren zur herstellung piezoelektrischer röhren

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE602004022049T Expired - Lifetime DE602004022049D1 (de) 2003-07-01 2004-02-12 Verfahren zur herstellung piezoelektrischer röhren

Country Status (6)

Country Link
US (1) US20040118686A1 (de)
EP (2) EP1976039B1 (de)
JP (1) JP4922755B2 (de)
AT (1) ATE488875T1 (de)
DE (2) DE602004030173D1 (de)
WO (1) WO2005004249A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006022557A1 (en) * 2004-08-24 2006-03-02 Auckland Uniservices Limited Optical fibre switch
WO2007140320A2 (en) 2006-05-26 2007-12-06 Nanyang Technological University Implantable article, method of forming same and method for reducing thrombogenicity
DE102006026481A1 (de) * 2006-06-07 2007-12-13 Siemens Ag Verfahren zum Anordnen einer Pulverschicht auf einem Substrat sowie Schichtaufbau mit mindestens einer Pulverschicht auf einem Substrat
US8206635B2 (en) 2008-06-20 2012-06-26 Amaranth Medical Pte. Stent fabrication via tubular casting processes
US8206636B2 (en) 2008-06-20 2012-06-26 Amaranth Medical Pte. Stent fabrication via tubular casting processes
US10898620B2 (en) 2008-06-20 2021-01-26 Razmodics Llc Composite stent having multi-axial flexibility and method of manufacture thereof
US8431037B2 (en) * 2009-10-11 2013-04-30 Indian Institute Of Technology Madras Liquid composite dielectric material
CN102263199B (zh) * 2011-08-10 2013-07-31 边义祥 分布电极式含芯压电棒弹簧
DE102011116255B3 (de) * 2011-10-18 2012-11-08 Wdt-Wolz-Dental-Technik Gmbh Verfahren und Vorrichtung zur elektrophoretischen Herstellung von flächigen Rohlingen aus einem Metall- oder Keramikschlicker
JP2013118231A (ja) * 2011-12-01 2013-06-13 Seiko Epson Corp 液体噴射ヘッド及び液体噴射装置並びに圧電素子
CN103193482B (zh) * 2013-03-11 2015-09-09 华中科技大学 一种锆钛酸铅厚膜及其制备方法
KR101612381B1 (ko) 2014-09-16 2016-04-14 국방과학연구소 마이크로 압전 유연와이어의 제조방법, 상기 마이크로 압전 유연와이어를 이용한 압전 에너지 하베스터 및 상기 압전 에너지 하베스터의 제조방법

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3305825A (en) * 1963-08-26 1967-02-21 Mobil Oil Corp Telemetering device and system for pumping wells
JPH01101155A (ja) * 1987-10-14 1989-04-19 Hitachi Metals Ltd 液体噴射装置
US5108982A (en) * 1988-12-22 1992-04-28 General Atomics Apparatus and method for manufacturing a ceramic superconductor coated metal fiber
US5324177A (en) * 1989-05-08 1994-06-28 The Cleveland Clinic Foundation Sealless rotodynamic pump with radially offset rotor
US5147281A (en) * 1990-04-23 1992-09-15 Advanced Medical Systems, Inc. Biological fluid pumping means and method
JPH04202791A (ja) * 1990-11-30 1992-07-23 Ishikawajima Harima Heavy Ind Co Ltd 電気泳動装置
US5472583A (en) * 1992-09-24 1995-12-05 W. R. Grace & Co.-Conn. Manufacture of conical pore ceramics by electrophoretic deposition
US5947892A (en) * 1993-11-10 1999-09-07 Micromed Technology, Inc. Rotary blood pump
US5761782A (en) * 1994-08-29 1998-06-09 Oceaneering International, Inc. Method of fabrication of piezoelectric bender elements
US5798600A (en) * 1994-08-29 1998-08-25 Oceaneering International, Inc. Piezoelectric pumps
JP3319223B2 (ja) 1995-06-14 2002-08-26 富士電機株式会社 圧電素子およびその製造方法
US5840070A (en) * 1996-02-20 1998-11-24 Kriton Medical, Inc. Sealless rotary blood pump
JPH09300614A (ja) * 1996-05-09 1997-11-25 Minolta Co Ltd 圧電アクチュエータおよびその製造方法
US20020024270A1 (en) * 1998-10-14 2002-02-28 Sumsung Electro-Mechanics Co. Piezoelectric/electrostrictive film element formed at low temperature using electrophoretic deposition
US6349455B1 (en) * 1998-10-14 2002-02-26 Samsung Electro-Mechanics Co., Ltd. Method for forming piezoelectric/electrostrictive film element at low temperature using electrophoretric deposition
US6527520B2 (en) * 1999-07-29 2003-03-04 Jonathan B. Rosefsky Ribbon drive pumping with centrifugal contaminant removal
US6127283A (en) * 1999-11-02 2000-10-03 Cerel (Ceramic Technologies) Ltd. Method of electrophoretic deposition of ferroelectric films using a trifunctional additive and compositions for effecting same
JP2001207988A (ja) * 2000-01-26 2001-08-03 Nipro Corp 磁気駆動型軸流ポンプ
CA2308092C (en) * 2000-05-10 2008-10-21 Partho Sarkar Production of hollow ceramic membranes by electrophoretic deposition
US6593681B2 (en) * 2000-12-15 2003-07-15 Matsushita Electric Industrial Co., Ltd. Polarization apparatus and polarization method of coaxial flexible piezoelectric cable
JP2002252391A (ja) * 2001-02-22 2002-09-06 Matsushita Electric Ind Co Ltd 同軸状可撓性圧電体チューブの分極装置
US6388364B1 (en) * 2001-03-15 2002-05-14 Optovation (Canada) Corp. Piezoelectric rotator

Also Published As

Publication number Publication date
EP1639657A4 (de) 2006-08-30
WO2005004249A1 (en) 2005-01-13
EP1976039A3 (de) 2009-01-14
EP1639657A1 (de) 2006-03-29
EP1639657B1 (de) 2009-07-15
EP1976039A2 (de) 2008-10-01
EP1976039B1 (de) 2010-11-17
JP2007527330A (ja) 2007-09-27
JP4922755B2 (ja) 2012-04-25
DE602004022049D1 (de) 2009-08-27
ATE488875T1 (de) 2010-12-15
US20040118686A1 (en) 2004-06-24

Similar Documents

Publication Publication Date Title
ATE488875T1 (de) Verfahren und vorrichtung zur herstellung piezoelektrischer röhren
ATE460086T1 (de) Vorrichtung und verfahren zur herstellung von filtern
ATE224858T1 (de) Verfahren zur herstellung eines diamant- siliciumcarbid-siliciumkomposits und ein nach diesem verfahren hergestelltes komposit
ATE265990T1 (de) Verfahren und vorrichtung zur herstellung eines glasstabes aus synthetischem quarz
ATE473950T1 (de) Verfahren zur herstellung dreidimensionaler keramischer formkörper
ATE399148T1 (de) Verfahren zum herstellen eines reibkörpers aus siliziuminfiltriertem,kohlenstofffaser verstärktem porösen kohlenstoff und verwendung eines solchen reibkörpers
ATE448563T1 (de) Verfahren zur substratbehandlung und trockungs- sammelrohr
ATE274371T1 (de) Verfahren zur herstellung eines filterkörpers
DE59207469D1 (de) Verfahren zur herstellung poröser, durchströmbarer formkörper aus siliciumcarbid
DE50200055D1 (de) Vorrichtung und Verfahren zur Herstellung eines polykristallinen Siliciumstabes
DE602004024509D1 (de) Verfahren zur herstellung eines formwerkzeugs
ATE443585T1 (de) Verfahren und einrichtung zum aushärten von anorganischen giesserei-kernen und -formen
DE60003726D1 (de) Verfahren und vorrichtung zur pulveragglomeration
DE60314311D1 (de) Verfahren und Vorrichtung für die Herstellung eines Tiegels aus Quarzglas mittels Lichtbogenschmelzen
DE60015219D1 (de) Mikrostrukturanordnung und Verfahren, Gerät und Form zur Erzeugung der Mikrostrukturanordnung
DE60102428D1 (de) Optisches Aufzeichnungsmedium, Vorrichtung dafür und Verfahren zur Herstellung desselben
DE60143601D1 (de) Sinterverfahren und Vorrichtung die eine Zentrifugalkraft verwenden
ATE416711T1 (de) Verfahren zum herstellen einer dentalkeramischen struktur
ATE317238T1 (de) Heizmodul mit heizfläche und durchlauferhitzer und verfahren zu seiner herstellung
DE60015255D1 (de) Verfahren zur Herstellung von gesinterten Formkörpern aus Metallpulver durch Schlickergiessen und Gravieren
DE50104838D1 (de) Keramikmasse, verfahren zur herstellung der keramikmasse und verwendung der keramikmasse
DE602006000294D1 (de) Verfahren und Vorrichtung zum Entfernen von Schlacke
DE60139143D1 (de) Verfahren, optische aufzeichnungsvorrichtung mit diesen verfahren und optisches aufzeichnungsmedium zur verwendung in den verfahren und der vorrichtung
EP1481747A3 (de) Verfahren zur Herstellung eines wärmebelasteten Bauteils sowie wärmebelastetes Bauteil
DE50212762D1 (de) Verfahren und vorrichtung zur herstellung von teilchen aus flüssigen ausgangsmedien