DE602004026553D1 - Verfahren zur herstellung von polyorganosiloxanteilchen und zur herstellung von siliciumdioxidteilchen - Google Patents

Verfahren zur herstellung von polyorganosiloxanteilchen und zur herstellung von siliciumdioxidteilchen

Info

Publication number
DE602004026553D1
DE602004026553D1 DE602004026553T DE602004026553T DE602004026553D1 DE 602004026553 D1 DE602004026553 D1 DE 602004026553D1 DE 602004026553 T DE602004026553 T DE 602004026553T DE 602004026553 T DE602004026553 T DE 602004026553T DE 602004026553 D1 DE602004026553 D1 DE 602004026553D1
Authority
DE
Germany
Prior art keywords
producing
polyorganosiloxan
particles
silicon dioxide
dioxide parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004026553T
Other languages
English (en)
Inventor
Taro Suzuki
Junji Kawashima
Tatsuya Nakano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Exsymo Co Ltd
Original Assignee
Ube Nitto Kasei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2003050417A external-priority patent/JP2004262981A/ja
Priority claimed from JP2003067777A external-priority patent/JP4464058B2/ja
Priority claimed from JP2003135245A external-priority patent/JP4491200B2/ja
Application filed by Ube Nitto Kasei Co Ltd filed Critical Ube Nitto Kasei Co Ltd
Publication of DE602004026553D1 publication Critical patent/DE602004026553D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/51—Particles with a specific particle size distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/51—Particles with a specific particle size distribution
    • C01P2004/53—Particles with a specific particle size distribution bimodal size distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2270/00—Compositions for creating interpenetrating networks
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13392—Gaskets; Spacers; Sealing of cells spacers dispersed on the cell substrate, e.g. spherical particles, microfibres

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Polymers (AREA)
DE602004026553T 2003-02-27 2004-02-24 Verfahren zur herstellung von polyorganosiloxanteilchen und zur herstellung von siliciumdioxidteilchen Expired - Lifetime DE602004026553D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003050417A JP2004262981A (ja) 2003-02-27 2003-02-27 ポリオルガノシロキサン粒子の製造方法およびシリカ粒子の製造方法
JP2003067777A JP4464058B2 (ja) 2003-03-13 2003-03-13 ポリオルガノシロキサン粒子の製造方法
JP2003135245A JP4491200B2 (ja) 2003-05-14 2003-05-14 ポリオルガノシロキサン粒子の製造方法およびシリカ粒子の製造方法
PCT/JP2004/002130 WO2004076533A1 (ja) 2003-02-27 2004-02-24 ポリオルガノシロキサン粒子の製造方法およびシリカ粒子の製造方法

Publications (1)

Publication Number Publication Date
DE602004026553D1 true DE602004026553D1 (de) 2010-05-27

Family

ID=32931128

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004026553T Expired - Lifetime DE602004026553D1 (de) 2003-02-27 2004-02-24 Verfahren zur herstellung von polyorganosiloxanteilchen und zur herstellung von siliciumdioxidteilchen

Country Status (7)

Country Link
US (1) US7476706B2 (de)
EP (1) EP1598388B1 (de)
KR (1) KR100952094B1 (de)
DE (1) DE602004026553D1 (de)
IL (1) IL169778A0 (de)
TW (1) TW200502279A (de)
WO (1) WO2004076533A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5000303B2 (ja) * 2004-09-27 2012-08-15 新日鐵化学株式会社 シリカ含有シリコーン樹脂組成物及びその成形体
KR101134587B1 (ko) 2005-12-07 2012-04-09 삼성코닝정밀소재 주식회사 금속 배선용 연마 슬러리
KR100692612B1 (ko) 2006-04-21 2007-03-14 한국화학연구원 구형 실리콘 미립자의 제조 방법
CN102027047B (zh) * 2008-05-16 2013-02-13 日本电气株式会社 金属氧化物基微粒及其制造方法以及树脂组合物
JP5543722B2 (ja) * 2009-03-31 2014-07-09 株式会社日本触媒 ポリオルガノシロキサン粒子および有機無機複合粒子の製造方法
KR101715777B1 (ko) * 2015-06-25 2017-03-14 배재대학교 산학협력단 실리콘 입자 및 이의 제조방법
JP6216474B1 (ja) * 2017-03-07 2017-10-18 宇部エクシモ株式会社 有機無機複合粒子
CN112812361B (zh) * 2020-12-31 2024-01-09 浙江三时纪新材科技有限公司 一种二氧化硅粉体填料的制备方法、由此得到的粉体填料及其应用

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3354095A (en) * 1964-07-23 1967-11-21 Owens Illinois Inc Solid, substantially spherical, hard particles and preparation thereof
JPH0470335A (ja) 1990-07-02 1992-03-05 Hitachi Chem Co Ltd 積層板の製造方法
JPH0488023A (ja) 1990-07-30 1992-03-19 Toray Ind Inc 球状シリコーン微粒子の製造法
JP2512835B2 (ja) * 1991-01-22 1996-07-03 宇部日東化成株式会社 シリカ微粒子の製造方法
JP3330984B2 (ja) * 1992-09-04 2002-10-07 株式会社オハラ 単分散球状シリカの製造方法
JP2763242B2 (ja) * 1992-12-22 1998-06-11 信越化学工業株式会社 球状シリコーン樹脂微粒子の製造方法
CN1082934C (zh) * 1994-04-11 2002-04-17 宇部日东化成株式会社 交联树脂包覆二氧化硅微粒及其制造方法
US5801262A (en) * 1997-06-30 1998-09-01 General Electric Company Process for preparing polysiloxane microspheres with a narrow size distribution
JP4031575B2 (ja) * 1997-08-07 2008-01-09 宇部日東化成株式会社 ポリオルガノシロキサン微粒子の製造方法
JP4098893B2 (ja) * 1997-08-29 2008-06-11 宇部日東化成株式会社 ポリオルガノシロキサン微粒子の製造方法
US5936031A (en) * 1998-01-30 1999-08-10 Eastman Kodak Company Preparation of polyalkylsilsesquioxane particles
KR100542032B1 (ko) 1998-02-09 2006-01-16 쇼꾸바이 카세이 고교 가부시키가이샤 오르가노폴리실록산 미세 입자, 그의 제조방법 및 액정디스플레이
JP4397981B2 (ja) * 1998-04-28 2010-01-13 宇部日東化成株式会社 ポリオルガノシロキサン微粒子の製造方法
KR100267508B1 (ko) 1998-07-13 2001-01-15 김충섭 다겹지 제조용 접착제 및 이를 이용한 다겹지 제조방법
JP3552966B2 (ja) * 1998-11-09 2004-08-11 触媒化成工業株式会社 ポリオルガノシロキサン微粒子の製造方法および液晶表示装置
KR100563717B1 (ko) * 1998-12-21 2006-03-28 쇼쿠바이가세고교 가부시키가이샤 미립자, 미립자분산졸, 동분산졸의 제조방법 및피막부착기재
JP2000204268A (ja) 1999-01-13 2000-07-25 Nippon Seronpakku Kk フライアッシュ樹脂混合組成物と、その組成物からなる樹木の支持用部材
US6214927B1 (en) * 1999-11-02 2001-04-10 General Electric Company Method for making aqueous emulsions of functionalized organopolysiloxanes
JP2001302227A (ja) * 2000-04-26 2001-10-31 Ube Nitto Kasei Co Ltd シリカ粒子の製造方法
JP5041625B2 (ja) * 2000-06-23 2012-10-03 宇部日東化成株式会社 ポリオルガノシロキサン粒子の製造方法およびシリカ粒子の製造方法
JP2002038049A (ja) * 2000-07-28 2002-02-06 Ube Nitto Kasei Co Ltd シリカ系微粒子およびその製造方法
JP3717379B2 (ja) * 2000-08-02 2005-11-16 信越化学工業株式会社 球状シリコーン樹脂微粒子の製造方法
KR20020095103A (ko) * 2001-06-11 2002-12-20 제이에스알 가부시끼가이샤 실리카막의 형성 방법, 실리카막, 절연막 및 반도체 장치
JP2003171466A (ja) * 2001-12-07 2003-06-20 Nikko Rika Kk 球状ポリオルガノシルセスキオキサン微粒子の製造方法

Also Published As

Publication number Publication date
KR20050103277A (ko) 2005-10-28
EP1598388A4 (de) 2006-06-14
IL169778A0 (en) 2009-02-11
TW200502279A (en) 2005-01-16
KR100952094B1 (ko) 2010-04-13
TWI328591B (de) 2010-08-11
WO2004076533A1 (ja) 2004-09-10
US7476706B2 (en) 2009-01-13
EP1598388A1 (de) 2005-11-23
EP1598388B1 (de) 2010-04-14
US20050261380A1 (en) 2005-11-24

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