DE602004007014D1 - Optisches verfahren und einrichtung zur texturquantifizierung photovoltaischer zellen - Google Patents

Optisches verfahren und einrichtung zur texturquantifizierung photovoltaischer zellen

Info

Publication number
DE602004007014D1
DE602004007014D1 DE602004007014T DE602004007014T DE602004007014D1 DE 602004007014 D1 DE602004007014 D1 DE 602004007014D1 DE 602004007014 T DE602004007014 T DE 602004007014T DE 602004007014 T DE602004007014 T DE 602004007014T DE 602004007014 D1 DE602004007014 D1 DE 602004007014D1
Authority
DE
Germany
Prior art keywords
texture
quantification
photovoltaic cells
optical method
texturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602004007014T
Other languages
English (en)
Other versions
DE602004007014T2 (de
Inventor
Luezas Carlos Enrique Zaldo
Martin Jose Maria Albella
Garcia Eduardo Fornies
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Consejo Superior de Investigaciones Cientificas CSIC
Original Assignee
Consejo Superior de Investigaciones Cientificas CSIC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Consejo Superior de Investigaciones Cientificas CSIC filed Critical Consejo Superior de Investigaciones Cientificas CSIC
Publication of DE602004007014D1 publication Critical patent/DE602004007014D1/de
Application granted granted Critical
Publication of DE602004007014T2 publication Critical patent/DE602004007014T2/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N2021/4735Solid samples, e.g. paper, glass

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Photovoltaic Devices (AREA)
  • Silicon Compounds (AREA)
  • Hybrid Cells (AREA)
DE602004007014T 2003-07-15 2004-07-14 Optisches verfahren und einrichtung zur texturquantifizierung photovoltaischer zellen Expired - Fee Related DE602004007014T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
ES200301666A ES2235608B1 (es) 2003-07-15 2003-07-15 Metodo optico y dispositivo para la cuantificacion de la textura en celulas fotovoltaicas.
ES200301666 2003-07-15
PCT/ES2004/070050 WO2005008175A1 (es) 2003-07-15 2004-07-14 Método óptico y dispositivo para la cuantificación de la textura en células fotovoltaicas

Publications (2)

Publication Number Publication Date
DE602004007014D1 true DE602004007014D1 (de) 2007-07-26
DE602004007014T2 DE602004007014T2 (de) 2008-02-14

Family

ID=34072908

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004007014T Expired - Fee Related DE602004007014T2 (de) 2003-07-15 2004-07-14 Optisches verfahren und einrichtung zur texturquantifizierung photovoltaischer zellen

Country Status (8)

Country Link
US (1) US20060268283A1 (de)
EP (1) EP1662227B1 (de)
JP (1) JP2007528997A (de)
CN (1) CN100419377C (de)
AT (1) ATE364830T1 (de)
DE (1) DE602004007014T2 (de)
ES (1) ES2235608B1 (de)
WO (1) WO2005008175A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7742171B2 (en) * 2007-08-06 2010-06-22 Ci Systems Ltd. Reflectivity/emissivity measurement probe insensitive to variations in probe-to-target distance
US8378661B1 (en) 2008-05-29 2013-02-19 Alpha-Omega Power Technologies, Ltd.Co. Solar simulator
GB0816047D0 (en) * 2008-09-04 2008-10-08 Rolls Royce Plc Crystallographic orientation measurement
DE102009044458B4 (de) * 2009-11-06 2021-03-04 Hanwha Q.CELLS GmbH Analyseverfahren zum Analysieren eines Halbleiterwafers
DE102010011056A1 (de) 2010-03-11 2011-09-15 Jörg Bischoff Verfahren und Anordnung zur quantitativen, optischen Messung der Oberflächentextur
DE102010029133A1 (de) * 2010-05-19 2011-11-24 Robert Bosch Gmbh Verfahren und Vorrichtung zur Charakterisierung von pyramidalen Oberflächenstrukturen auf einem Substrat
JP2013002900A (ja) * 2011-06-15 2013-01-07 Mitsubishi Electric Corp エリプソメーター装置および単結晶シリコンに形成された反射防止膜の測定方法
DE102012012156B4 (de) 2012-06-19 2014-05-15 Audiodev Gmbh Verfahren zum optischen vermessen von pyramiden auf texturierten monokristallinen siliziumwafern

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4137123A (en) * 1975-12-31 1979-01-30 Motorola, Inc. Texture etching of silicon: method
JPS58111743A (ja) * 1981-12-26 1983-07-02 Toshiba Corp ボンディング性評価方法
JPS58140609A (ja) * 1982-02-17 1983-08-20 Toshiba Corp 表面状態評価装置
JPH0739946B2 (ja) * 1987-08-26 1995-05-01 株式会社豊田中央研究所 表面状態検査装置
US6118525A (en) * 1995-03-06 2000-09-12 Ade Optical Systems Corporation Wafer inspection system for distinguishing pits and particles
WO1997046865A1 (en) * 1996-06-04 1997-12-11 Tencor Instruments Optical scanning system for surface inspection
JP3257413B2 (ja) * 1996-09-10 2002-02-18 松下電器産業株式会社 レーザ加工装置及びレーザ加工方法
TW482898B (en) * 1996-12-04 2002-04-11 Ade Optical Syst Corp A surface inspection system and method for distinguishing between particle defects and pit defects on a surface of a workpiece.
DE19811878C2 (de) * 1998-03-18 2002-09-19 Siemens Solar Gmbh Verfahren und Ätzlösung zum naßchemischen pyramidalen Texturätzen von Siliziumoberflächen
SE514309C2 (sv) * 1999-05-28 2001-02-05 Ericsson Telefon Ab L M Förfarande för att bestämma ytstruktur
US6778273B2 (en) * 2001-03-30 2004-08-17 Therma-Wave, Inc. Polarimetric scatterometer for critical dimension measurements of periodic structures
US7280230B2 (en) * 2001-12-19 2007-10-09 Kla-Tencor Technologies Corporation Parametric profiling using optical spectroscopic systems

Also Published As

Publication number Publication date
ES2235608A1 (es) 2005-07-01
DE602004007014T2 (de) 2008-02-14
US20060268283A1 (en) 2006-11-30
CN100419377C (zh) 2008-09-17
JP2007528997A (ja) 2007-10-18
CN1871495A (zh) 2006-11-29
ES2235608B1 (es) 2006-11-01
EP1662227A1 (de) 2006-05-31
EP1662227B1 (de) 2007-06-13
ATE364830T1 (de) 2007-07-15
WO2005008175A1 (es) 2005-01-27

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Legal Events

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8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee