DE60135328D1 - Photopolymere und ihre anwendung - Google Patents

Photopolymere und ihre anwendung

Info

Publication number
DE60135328D1
DE60135328D1 DE60135328T DE60135328T DE60135328D1 DE 60135328 D1 DE60135328 D1 DE 60135328D1 DE 60135328 T DE60135328 T DE 60135328T DE 60135328 T DE60135328 T DE 60135328T DE 60135328 D1 DE60135328 D1 DE 60135328D1
Authority
DE
Germany
Prior art keywords
aliphatic
present
polymers
photopolymers
application
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60135328T
Other languages
English (en)
Inventor
Navin Suyal
Iain Mcewan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Exxelis Ltd
Original Assignee
TERAHERTZ PHOTONICS Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TERAHERTZ PHOTONICS Ltd filed Critical TERAHERTZ PHOTONICS Ltd
Application granted granted Critical
Publication of DE60135328D1 publication Critical patent/DE60135328D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/38—Esters containing sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Polymerisation Methods In General (AREA)
  • Dental Preparations (AREA)
DE60135328T 2000-06-07 2001-06-07 Photopolymere und ihre anwendung Expired - Lifetime DE60135328D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0013767.9A GB0013767D0 (en) 2000-06-07 2000-06-07 Photo-polymers and use thereof
PCT/GB2001/002498 WO2001094430A1 (en) 2000-06-07 2001-06-07 Photo-polymers and use thereof

Publications (1)

Publication Number Publication Date
DE60135328D1 true DE60135328D1 (de) 2008-09-25

Family

ID=9893094

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60135328T Expired - Lifetime DE60135328D1 (de) 2000-06-07 2001-06-07 Photopolymere und ihre anwendung

Country Status (9)

Country Link
US (1) US20030114619A1 (de)
EP (1) EP1287047B1 (de)
JP (1) JP2004501241A (de)
CN (1) CN1215098C (de)
AT (1) ATE404598T1 (de)
AU (1) AU2001262526A1 (de)
DE (1) DE60135328D1 (de)
GB (2) GB0013767D0 (de)
WO (1) WO2001094430A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4535307B2 (ja) * 2000-12-20 2010-09-01 日本化薬株式会社 樹脂組成物、レンズ用樹脂組成物及びその硬化物
TWI300790B (en) * 2001-02-28 2008-09-11 Shinetsu Chemical Co Polymers, Resist Compositions and Patterning Process
AU2003232437A1 (en) * 2002-05-29 2003-12-19 Inphase Technologies, Inc. High reflective index photoactive compound for optical applications
WO2003102959A1 (en) * 2002-05-29 2003-12-11 Inphase Technologies, Inc. Holographic data storage media comprising an aluminum salt compound and an asymetric acrylate compound
JP4778416B2 (ja) 2003-04-17 2011-09-21 エシロール アテルナジオナール カンパニー ジェネラーレ デ オプティック 光硬化性接着剤組成物およびその光学分野における用途
US7294657B2 (en) * 2005-03-07 2007-11-13 General Electric Company Curable acrylate compositions, methods of making the compositions and articles made therefrom
JP5228321B2 (ja) * 2006-12-20 2013-07-03 ソニー株式会社 光学補償パネル，光学補償パネルの製造方法、および、液晶表示装置
US8986812B2 (en) 2007-07-09 2015-03-24 3M Innovative Properties Company Thin microstructured optical films
JP5338809B2 (ja) * 2008-03-31 2013-11-13 ダイキン工業株式会社 多官能含フッ素化合物及び該化合物の製造方法
WO2011004785A1 (ja) * 2009-07-10 2011-01-13 積水化学工業株式会社 光ファイバー及びその製造方法
JP5669687B2 (ja) * 2011-07-29 2015-02-12 新中村化学工業株式会社 含フッ素（メタ）アクリレート化合物
EP3435156A1 (de) * 2017-07-26 2019-01-30 Covestro Deutschland AG Schutzschicht für photopolymer

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4075237A (en) * 1968-04-10 1978-02-21 Geigy Chemical Corporation Perfluorinated esters of fumaric acid and certain other ethylenically unsaturated poly-basic acid and soil repellant polymers thereof
CA2010364C (en) * 1989-02-22 1998-10-20 Yuichiro Iguchi Thiol methacrylate or acrylate and resin made therefrom
US5656707A (en) * 1995-06-16 1997-08-12 Regents Of The University Of Minnesota Highly cross-linked polymeric supports
FR2765879B1 (fr) * 1997-07-11 2002-06-07 Essilor Int Nouvelles compositions polymerisables et lentilles optiques a haut indice de refraction obtenues a partir de ces compositions
US6353069B1 (en) * 1998-04-15 2002-03-05 Alcon Manufacturing, Ltd. High refractive index ophthalmic device materials
US6297337B1 (en) * 1999-05-19 2001-10-02 Pmd Holdings Corp. Bioadhesive polymer compositions

Also Published As

Publication number Publication date
CN1215098C (zh) 2005-08-17
ATE404598T1 (de) 2008-08-15
GB2375767B (en) 2004-01-14
GB0013767D0 (en) 2000-07-26
WO2001094430A1 (en) 2001-12-13
US20030114619A1 (en) 2003-06-19
AU2001262526A1 (en) 2001-12-17
GB0215458D0 (en) 2002-08-14
EP1287047B1 (de) 2008-08-13
GB2375767A (en) 2002-11-27
JP2004501241A (ja) 2004-01-15
EP1287047A1 (de) 2003-03-05
CN1436201A (zh) 2003-08-13

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: XYRATEX TECHNOLOGY LTD., HAVANT, HAMPSHIRE, GB

8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MACROCOM (870) LTD., EDINBURGH, GB

8327 Change in the person/name/address of the patent owner

Owner name: EXXELIS LTD., EDINBURGH, GB