DE60127181D1 - Projizierter kardanischer antriebspunkt - Google Patents

Projizierter kardanischer antriebspunkt

Info

Publication number
DE60127181D1
DE60127181D1 DE60127181T DE60127181T DE60127181D1 DE 60127181 D1 DE60127181 D1 DE 60127181D1 DE 60127181 T DE60127181 T DE 60127181T DE 60127181 T DE60127181 T DE 60127181T DE 60127181 D1 DE60127181 D1 DE 60127181D1
Authority
DE
Germany
Prior art keywords
projected
spindle
wafer carrier
cardanian
spherical surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60127181T
Other languages
English (en)
Other versions
DE60127181T2 (de
Inventor
David G Halley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Research Corp filed Critical Lam Research Corp
Application granted granted Critical
Publication of DE60127181D1 publication Critical patent/DE60127181D1/de
Publication of DE60127181T2 publication Critical patent/DE60127181T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/04—Headstocks; Working-spindles; Features relating thereto
    • B24B41/047—Grinding heads for working on plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00—Drives or gearings; Equipment therefor
    • B24B47/10—Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Fittings On The Vehicle Exterior For Carrying Loads, And Devices For Holding Or Mounting Articles (AREA)
  • Lubrication Of Internal Combustion Engines (AREA)
  • Molds, Cores, And Manufacturing Methods Thereof (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Switches With Compound Operations (AREA)
DE60127181T 2000-07-01 2001-06-29 Projizierter kardanischer antriebspunkt Expired - Fee Related DE60127181T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21566600P 2000-07-01 2000-07-01
US215666P 2000-07-01
PCT/US2001/041232 WO2002002276A2 (en) 2000-07-01 2001-06-29 Projected gimbal point drive

Publications (2)

Publication Number Publication Date
DE60127181D1 true DE60127181D1 (de) 2007-04-19
DE60127181T2 DE60127181T2 (de) 2007-11-15

Family

ID=22803881

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60127181T Expired - Fee Related DE60127181T2 (de) 2000-07-01 2001-06-29 Projizierter kardanischer antriebspunkt

Country Status (10)

Country Link
US (1) US6808443B2 (de)
EP (1) EP1365888B1 (de)
JP (1) JP2004502311A (de)
KR (1) KR20030016307A (de)
CN (1) CN1258432C (de)
AT (1) ATE355934T1 (de)
AU (1) AU2001273665A1 (de)
DE (1) DE60127181T2 (de)
TW (1) TW491746B (de)
WO (1) WO2002002276A2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4700996B2 (ja) * 2005-04-19 2011-06-15 東芝機械株式会社 転写装置
US7648354B2 (en) * 2005-04-28 2010-01-19 Toshiba Kikai Kabushiki Kaisha Transfer apparatus having gimbal mechanism and transfer method using the transfer apparatus
JP4729338B2 (ja) * 2005-05-10 2011-07-20 東芝機械株式会社 転写装置
JP4701008B2 (ja) * 2005-05-25 2011-06-15 東芝機械株式会社 ジンバル機構を備えた転写装置
KR101039255B1 (ko) * 2009-07-07 2011-06-07 (주)아산테크 보수 및 관리가 용이한 대구경의 관로시스템
US8545290B2 (en) * 2010-12-08 2013-10-01 Edmond Arzuman Abrahamians Wafer polishing apparatus and method
CN103363243B (zh) * 2013-08-07 2015-07-22 重庆望江工业有限公司 一种阴阳线内管修整装置
CN115401568B (zh) * 2022-09-22 2023-10-20 安庆帝新机电设备有限公司 一种浮封环打磨用自动下料装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2526105A (en) * 1947-01-13 1950-10-17 James B Adams Universal joint for hand tools
US3107505A (en) * 1961-02-15 1963-10-22 Hague Mfg Company Universal joint
EP0119989A1 (de) * 1983-03-18 1984-09-26 Karl Hufnagl Gelenk zur Übertragung eines Drehmoments
US4636180A (en) * 1984-08-23 1987-01-13 Allied Corporation Universal joint with stationary seats
US5342067A (en) * 1993-08-09 1994-08-30 Corning Incorporated Method and apparatus for machining substrate plates for magnetic memory disks
US5423558A (en) * 1994-03-24 1995-06-13 Ipec/Westech Systems, Inc. Semiconductor wafer carrier and method
US5571044A (en) * 1994-10-11 1996-11-05 Ontrak Systems, Inc. Wafer holder for semiconductor wafer polishing machine
US5830806A (en) * 1996-10-18 1998-11-03 Micron Technology, Inc. Wafer backing member for mechanical and chemical-mechanical planarization of substrates
US6425812B1 (en) * 1997-04-08 2002-07-30 Lam Research Corporation Polishing head for chemical mechanical polishing using linear planarization technology
US6368189B1 (en) * 1999-03-03 2002-04-09 Mitsubishi Materials Corporation Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure
EP1092504B1 (de) * 1999-10-15 2005-12-07 Ebara Corporation Verfahren und Gerät zum Polieren eines Werkstückes

Also Published As

Publication number Publication date
WO2002002276A3 (en) 2003-09-25
CN1533316A (zh) 2004-09-29
EP1365888A2 (de) 2003-12-03
KR20030016307A (ko) 2003-02-26
CN1258432C (zh) 2006-06-07
WO2002002276A2 (en) 2002-01-10
US20020002031A1 (en) 2002-01-03
DE60127181T2 (de) 2007-11-15
US6808443B2 (en) 2004-10-26
EP1365888B1 (de) 2007-03-07
JP2004502311A (ja) 2004-01-22
TW491746B (en) 2002-06-21
ATE355934T1 (de) 2007-03-15
AU2001273665A1 (en) 2002-01-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee