DE60114348D1 - Verfahren zur Reinigung von Gasen - Google Patents
Verfahren zur Reinigung von GasenInfo
- Publication number
- DE60114348D1 DE60114348D1 DE60114348T DE60114348T DE60114348D1 DE 60114348 D1 DE60114348 D1 DE 60114348D1 DE 60114348 T DE60114348 T DE 60114348T DE 60114348 T DE60114348 T DE 60114348T DE 60114348 D1 DE60114348 D1 DE 60114348D1
- Authority
- DE
- Germany
- Prior art keywords
- gases
- purification
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01C—AMMONIA; CYANOGEN; COMPOUNDS THEREOF
- C01C1/00—Ammonia; Compounds thereof
- C01C1/02—Preparation, purification or separation of ammonia
- C01C1/024—Purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/04—Purification or separation of nitrogen
- C01B21/0405—Purification or separation processes
- C01B21/0433—Physical processing only
- C01B21/045—Physical processing only by adsorption in solids
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B23/00—Noble gases; Compounds thereof
- C01B23/001—Purification or separation processes of noble gases
- C01B23/0036—Physical processing only
- C01B23/0052—Physical processing only by adsorption in solids
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0029—Obtaining noble gases
- C01B2210/0031—Helium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0029—Obtaining noble gases
- C01B2210/0034—Argon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0042—Making ultrapure specific gas
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Drying Of Gases (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Separation Of Gases By Adsorption (AREA)
- Gas Separation By Absorption (AREA)
- Treatment Of Liquids With Adsorbents In General (AREA)
- Treating Waste Gases (AREA)
- Hydrogen, Water And Hydrids (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/735,802 US6576138B2 (en) | 2000-12-14 | 2000-12-14 | Method for purifying semiconductor gases |
US735802 | 2000-12-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60114348D1 true DE60114348D1 (de) | 2005-12-01 |
DE60114348T2 DE60114348T2 (de) | 2006-06-08 |
Family
ID=24957243
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60114348T Expired - Lifetime DE60114348T2 (de) | 2000-12-14 | 2001-12-12 | Verfahren zur Reinigung von Gasen |
Country Status (9)
Country | Link |
---|---|
US (2) | US6576138B2 (de) |
EP (1) | EP1214965B1 (de) |
JP (1) | JP2002255542A (de) |
KR (1) | KR100591521B1 (de) |
CN (1) | CN1243596C (de) |
CA (1) | CA2365027A1 (de) |
DE (1) | DE60114348T2 (de) |
SG (1) | SG97227A1 (de) |
TW (1) | TW583015B (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6524544B1 (en) * | 2000-10-27 | 2003-02-25 | Aeronex, Inc. | Self-regenerative process for contaminant removal from ammonia |
US6576138B2 (en) * | 2000-12-14 | 2003-06-10 | Praxair Technology, Inc. | Method for purifying semiconductor gases |
KR100462672B1 (ko) * | 2002-01-23 | 2004-12-20 | 주식회사 케이피씨 | 반도체 제조용 공정가스의 정제장치 |
JP2004002106A (ja) * | 2002-05-31 | 2004-01-08 | Shin Etsu Chem Co Ltd | 低損失光ファイバ母材とその製造方法 |
JP2004142987A (ja) * | 2002-10-24 | 2004-05-20 | Japan Pionics Co Ltd | アンモニアの精製方法 |
US20050006310A1 (en) * | 2003-07-10 | 2005-01-13 | Rajat Agrawal | Purification and recovery of fluids in processing applications |
US20050019244A1 (en) * | 2003-07-23 | 2005-01-27 | Spiegelman Jeffrey J. | Method for the point of use production of ammonia from water and nitrogen |
US7078011B2 (en) * | 2004-03-30 | 2006-07-18 | Praxair Technology, Inc. | Method of storing and supplying hydrogen to a pipeline |
US7297181B2 (en) * | 2004-07-07 | 2007-11-20 | Air Liquide America L.P. | Purification and transfilling of ammonia |
US7789971B2 (en) | 2005-05-13 | 2010-09-07 | Tokyo Electron Limited | Treatment of substrate using functionalizing agent in supercritical carbon dioxide |
US7740690B2 (en) * | 2007-03-29 | 2010-06-22 | Praxair Technology, Inc. | Methods and systems for purifying gases |
US8268046B2 (en) | 2008-05-16 | 2012-09-18 | Matheson Tri-Gas | Removal of impurities from hydrogen-containing materials |
US8425149B2 (en) | 2010-06-10 | 2013-04-23 | Praxair Technology, Inc. | Hydrogen storage method and system |
JP5636261B2 (ja) | 2010-11-02 | 2014-12-03 | 住友精化株式会社 | アンモニア精製システム |
KR101570392B1 (ko) * | 2011-01-25 | 2015-11-19 | 스미토모 세이카 가부시키가이샤 | 암모니아 정제 시스템 및 암모니아의 정제 방법 |
US8950419B2 (en) | 2012-02-16 | 2015-02-10 | Praxair Technology, Inc. | Hydrogen supply method and system |
US9284120B2 (en) | 2012-05-25 | 2016-03-15 | Praxair Technology, Inc. | Methods for storing hydrogen in a salt cavern with a permeation barrier |
US8690476B2 (en) | 2012-05-25 | 2014-04-08 | Praxair Technology, Inc. | Method and system for storing hydrogen in a salt cavern with a permeation barrier |
US9718618B2 (en) | 2014-09-02 | 2017-08-01 | Praxair Technology, Inc. | System and method for treating hydrogen to be stored in a salt cavern and supplying therefrom |
US9707603B2 (en) | 2014-09-30 | 2017-07-18 | Praxair Technology, Inc. | System and method for purging contaminants from a salt cavern |
EP3218086A1 (de) * | 2014-11-10 | 2017-09-20 | Akzo Nobel Chemicals International B.V. | Verfahren zur entfernung kleinmolekularer verunreinigungen aus einem chlorverbindungsstrom |
US9950927B2 (en) | 2015-12-18 | 2018-04-24 | Praxair Technology, Inc. | Method of supplying hydrogen through an integrated supply system |
JP7305924B2 (ja) * | 2018-05-23 | 2023-07-11 | 株式会社Ihi | 蒸気発生設備 |
CN114644348B (zh) * | 2022-03-18 | 2023-12-12 | 西安吉利电子新材料股份有限公司 | 一种从氨气直接生产电子级氨水的制备系统及方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1129704B (it) * | 1980-01-08 | 1986-06-11 | Montedison Spa | Processo di sintesi dell'ammoniaca da idrocarburi |
US4983363A (en) * | 1987-03-24 | 1991-01-08 | Advanced Technology Materials, Inc. | Apparatus for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefrom |
JPH0340902A (ja) * | 1989-07-10 | 1991-02-21 | Japan Pionics Co Ltd | 水素化物ガスの精製方法 |
IT1244006B (it) | 1990-11-02 | 1994-06-28 | Getters Spa | Procedimento di purificazione dell'ammoniaca. |
US5106399A (en) * | 1991-02-25 | 1992-04-21 | Union Carbide Industrial Gases Technology Corporation | Argon purification system |
US5385689A (en) | 1993-06-29 | 1995-01-31 | Novapure Corporation | Process and composition for purifying semiconductor process gases to remove Lewis acid and oxidant impurities therefrom |
US5846386A (en) | 1994-01-07 | 1998-12-08 | Startec Ventures, Inc. | On-site ammonia purification for semiconductor manufacture |
KR19990022281A (ko) * | 1995-06-05 | 1999-03-25 | 제프리 엘. 웬트 | 전자부품 제조를 위한 사용지점 암모니아 정제 |
US6001223A (en) * | 1995-07-07 | 1999-12-14 | Air Liquide America Corporation | On-site ammonia purification for semiconductor manufacture |
IT1277458B1 (it) * | 1995-08-07 | 1997-11-10 | Getters Spa | Processo per la rimozione di ossigeno da ammoniaca a temperatura ambiente |
US6122931A (en) * | 1998-04-07 | 2000-09-26 | American Air Liquide Inc. | System and method for delivery of a vapor phase product to a point of use |
US6183539B1 (en) * | 1998-07-01 | 2001-02-06 | Zeochem Co. | Molecular sieve adsorbent for gas purification and preparation thereof |
US6085548A (en) * | 1998-08-24 | 2000-07-11 | Air Products And Chemicals, Inc. | Control vent system for ultra-high purity delivery system for liquefied compressed gases |
US6241955B1 (en) * | 1998-10-02 | 2001-06-05 | Aeronex, Inc. | Method and apparatus for purification of hydride gas streams |
US6370911B1 (en) * | 1999-08-13 | 2002-04-16 | Air Liquide America Corporation | Nitrous oxide purification system and process |
US6576138B2 (en) * | 2000-12-14 | 2003-06-10 | Praxair Technology, Inc. | Method for purifying semiconductor gases |
-
2000
- 2000-12-14 US US09/735,802 patent/US6576138B2/en not_active Expired - Lifetime
-
2001
- 2001-12-12 KR KR1020010078550A patent/KR100591521B1/ko active IP Right Grant
- 2001-12-12 CA CA002365027A patent/CA2365027A1/en not_active Abandoned
- 2001-12-12 JP JP2001378223A patent/JP2002255542A/ja active Pending
- 2001-12-12 TW TW090130803A patent/TW583015B/zh not_active IP Right Cessation
- 2001-12-12 SG SG200107797A patent/SG97227A1/en unknown
- 2001-12-12 CN CNB011435429A patent/CN1243596C/zh not_active Expired - Fee Related
- 2001-12-12 DE DE60114348T patent/DE60114348T2/de not_active Expired - Lifetime
- 2001-12-12 EP EP01129633A patent/EP1214965B1/de not_active Expired - Lifetime
-
2003
- 2003-06-02 US US10/452,466 patent/US7413661B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1214965A2 (de) | 2002-06-19 |
JP2002255542A (ja) | 2002-09-11 |
KR20020046980A (ko) | 2002-06-21 |
EP1214965B1 (de) | 2005-10-26 |
KR100591521B1 (ko) | 2006-06-20 |
US6576138B2 (en) | 2003-06-10 |
US20020074289A1 (en) | 2002-06-20 |
SG97227A1 (en) | 2003-07-18 |
US7413661B2 (en) | 2008-08-19 |
CN1243596C (zh) | 2006-03-01 |
TW583015B (en) | 2004-04-11 |
CN1360961A (zh) | 2002-07-31 |
US20030205532A1 (en) | 2003-11-06 |
EP1214965A3 (de) | 2003-01-15 |
DE60114348T2 (de) | 2006-06-08 |
CA2365027A1 (en) | 2002-06-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |