DE60113910D1 - Herstellungsverfahren für eine Lichtwellenleiter-Sonde in einem optischen Nahfeld-Rastermikroskop - Google Patents

Herstellungsverfahren für eine Lichtwellenleiter-Sonde in einem optischen Nahfeld-Rastermikroskop

Info

Publication number
DE60113910D1
DE60113910D1 DE60113910T DE60113910T DE60113910D1 DE 60113910 D1 DE60113910 D1 DE 60113910D1 DE 60113910 T DE60113910 T DE 60113910T DE 60113910 T DE60113910 T DE 60113910T DE 60113910 D1 DE60113910 D1 DE 60113910D1
Authority
DE
Germany
Prior art keywords
manufacturing
waveguide probe
field scanning
optical waveguide
optical microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60113910T
Other languages
English (en)
Other versions
DE60113910T2 (de
Inventor
Yasuyuki Mitsuoka
Takashi Niwa
Kenji Kato
Manabu Oumi
Nobuyuki Kasama
Susumu Ichihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Publication of DE60113910D1 publication Critical patent/DE60113910D1/de
Application granted granted Critical
Publication of DE60113910T2 publication Critical patent/DE60113910T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/02—Multiple-type SPM, i.e. involving more than one SPM techniques
    • G01Q60/06—SNOM [Scanning Near-field Optical Microscopy] combined with AFM [Atomic Force Microscopy]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/241—Light guide terminations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/862—Near-field probe

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Radiology & Medical Imaging (AREA)
  • Nanotechnology (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Biophysics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optical Integrated Circuits (AREA)
  • Micromachines (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Optical Head (AREA)
DE60113910T 2000-04-19 2001-04-17 Herstellungsverfahren für eine Lichtwellenleiter-Sonde in einem optischen Nahfeld-Rastermikroskop Expired - Fee Related DE60113910T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000117967 2000-04-19
JP2000117967 2000-04-19
JP2001078891A JP4717235B2 (ja) 2000-04-19 2001-03-19 光導波路プローブおよびその製造方法、ならびに走査型近視野顕微鏡
JP2001078891 2001-03-19

Publications (2)

Publication Number Publication Date
DE60113910D1 true DE60113910D1 (de) 2006-02-23
DE60113910T2 DE60113910T2 (de) 2006-05-11

Family

ID=26590389

Family Applications (3)

Application Number Title Priority Date Filing Date
DE60113910T Expired - Fee Related DE60113910T2 (de) 2000-04-19 2001-04-17 Herstellungsverfahren für eine Lichtwellenleiter-Sonde in einem optischen Nahfeld-Rastermikroskop
DE60127598T Expired - Fee Related DE60127598T2 (de) 2000-04-19 2001-04-17 Lichtwellenleiter-Sonde sowie optisches Nahfeld-Rastermikroskop
DE60129055T Expired - Lifetime DE60129055T2 (de) 2000-04-19 2001-04-17 Lichtwellenleiter-Sonde und optisches Nahfeld-Rastermikroskop

Family Applications After (2)

Application Number Title Priority Date Filing Date
DE60127598T Expired - Fee Related DE60127598T2 (de) 2000-04-19 2001-04-17 Lichtwellenleiter-Sonde sowie optisches Nahfeld-Rastermikroskop
DE60129055T Expired - Lifetime DE60129055T2 (de) 2000-04-19 2001-04-17 Lichtwellenleiter-Sonde und optisches Nahfeld-Rastermikroskop

Country Status (4)

Country Link
US (1) US6744030B2 (de)
EP (3) EP1455213B1 (de)
JP (1) JP4717235B2 (de)
DE (3) DE60113910T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1816642B1 (de) * 1998-11-09 2009-10-21 Seiko Instruments Inc. Nahfeld Abtastkopf und Herstellungsverfahren dafür
US7218803B1 (en) 2006-03-24 2007-05-15 Fitel Usa Corp. Microsphere probe for optical surface microscopy and method of using the same
US8353061B2 (en) * 2008-05-02 2013-01-08 Ofs Fitel, Llc Near-field scanning optical microscopy with nanoscale resolution from microscale probes
CH704900A1 (de) * 2011-05-05 2012-11-15 Nemo Devices Ag Messvorrichtung zur Messung zerebraler Parameter.
WO2012155919A1 (en) * 2011-05-16 2012-11-22 Danmarks Tekniske Universitet A microdevice for emitting electromagnetic radiation
CH707194A1 (de) 2012-11-06 2014-05-15 Nemodevices Ag Messvorrichtung zur Bestimmung zerebraler Parameter.
WO2014187849A1 (de) 2013-05-22 2014-11-27 Nemodevices Ag Messsystem und -verfahren zur messung von parametern in einem körpergewebe
US11906946B2 (en) * 2020-10-08 2024-02-20 National University Of Singapore System and method for controlling directionality of fast-wet etching of crystalline silicon, c-Si

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2704601B2 (ja) * 1993-04-12 1998-01-26 セイコーインスツルメンツ株式会社 走査型近視野原子間力顕微鏡、及びその顕微鏡に使用されるプローブ、及びそのプローブの製造方法
IL106613A0 (en) * 1993-08-08 1993-12-08 Klony S Lieberman Device and method for probe microscopy
JPH07120638A (ja) * 1993-10-22 1995-05-12 Matsushita Electric Ind Co Ltd 光接続素子およびその製造方法
JP2903211B2 (ja) * 1996-04-09 1999-06-07 セイコーインスツルメンツ株式会社 プローブとプローブ製造方法及び走査型プローブ顕微鏡
JP3006832B2 (ja) * 1996-05-14 2000-02-07 日本電気株式会社 発光素子と光導波路の光結合構造
EP0964251B1 (de) * 1997-12-15 2008-07-23 Seiko Instruments Inc. Optische wellenleitersonde und deren herstellungsverfahren

Also Published As

Publication number Publication date
US20010038063A1 (en) 2001-11-08
EP1148371A3 (de) 2003-05-02
DE60129055D1 (de) 2007-08-02
EP1148371A2 (de) 2001-10-24
JP2002006159A (ja) 2002-01-09
EP1148371B1 (de) 2005-10-12
DE60127598T2 (de) 2007-12-20
DE60127598D1 (de) 2007-05-10
JP4717235B2 (ja) 2011-07-06
EP1455213A1 (de) 2004-09-08
DE60113910T2 (de) 2006-05-11
EP1455213B1 (de) 2007-06-20
EP1619531A3 (de) 2006-02-22
DE60129055T2 (de) 2007-09-27
EP1619531B1 (de) 2007-03-28
EP1619531A2 (de) 2006-01-25
US6744030B2 (en) 2004-06-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee