DE60103048D1 - Verfahren zur verarbeitung von ultradünnen kunststofffolien - Google Patents

Verfahren zur verarbeitung von ultradünnen kunststofffolien

Info

Publication number
DE60103048D1
DE60103048D1 DE60103048T DE60103048T DE60103048D1 DE 60103048 D1 DE60103048 D1 DE 60103048D1 DE 60103048 T DE60103048 T DE 60103048T DE 60103048 T DE60103048 T DE 60103048T DE 60103048 D1 DE60103048 D1 DE 60103048D1
Authority
DE
Germany
Prior art keywords
materials
enclosure
deposition
plastic films
thin plastic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60103048T
Other languages
English (en)
Other versions
DE60103048T2 (de
Inventor
Per-Erik Nordal
Nicklas Johansson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ensurge Micropower ASA
Original Assignee
Thin Film Electronics ASA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thin Film Electronics ASA filed Critical Thin Film Electronics ASA
Publication of DE60103048D1 publication Critical patent/DE60103048D1/de
Application granted granted Critical
Publication of DE60103048T2 publication Critical patent/DE60103048T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
    • B29C41/34—Component parts, details or accessories; Auxiliary operations
    • B29C41/50—Shaping under special conditions, e.g. vacuum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00—Other particular articles
    • B29L2031/755—Membranes, diaphragms
DE60103048T 2000-02-29 2001-02-06 Verfahren zur herstellung von ultradünnen polymerfolien Expired - Fee Related DE60103048T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
NO20001025 2000-02-29
NO20001025A NO312180B1 (no) 2000-02-29 2000-02-29 Fremgangsmåte til behandling av ultratynne filmer av karbonholdige materialer
PCT/NO2001/000040 WO2001064413A1 (en) 2000-02-29 2001-02-06 A method for the processing of ultra-thin polymeric films

Publications (2)

Publication Number Publication Date
DE60103048D1 true DE60103048D1 (de) 2004-06-03
DE60103048T2 DE60103048T2 (de) 2005-04-28

Family

ID=19910808

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60103048T Expired - Fee Related DE60103048T2 (de) 2000-02-29 2001-02-06 Verfahren zur herstellung von ultradünnen polymerfolien

Country Status (13)

Country Link
US (1) US20020160116A1 (de)
EP (1) EP1272321B1 (de)
JP (1) JP3816803B2 (de)
KR (1) KR100519244B1 (de)
CN (1) CN1406173A (de)
AT (1) ATE265298T1 (de)
AU (1) AU771387B2 (de)
CA (1) CA2401139C (de)
DE (1) DE60103048T2 (de)
ES (1) ES2219507T3 (de)
NO (1) NO312180B1 (de)
RU (1) RU2213662C1 (de)
WO (1) WO2001064413A1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6756620B2 (en) * 2001-06-29 2004-06-29 Intel Corporation Low-voltage and interface damage-free polymer memory device
US6624457B2 (en) 2001-07-20 2003-09-23 Intel Corporation Stepped structure for a multi-rank, stacked polymer memory device and method of making same
US7275135B2 (en) * 2001-08-31 2007-09-25 Intel Corporation Hardware updated metadata for non-volatile mass storage cache
US20030074524A1 (en) * 2001-10-16 2003-04-17 Intel Corporation Mass storage caching processes for power reduction
US7103724B2 (en) * 2002-04-01 2006-09-05 Intel Corporation Method and apparatus to generate cache data
WO2004086419A1 (ja) 2003-03-26 2004-10-07 Daikin Industries Ltd. 強誘電性薄膜の形成方法
JP2007525337A (ja) * 2003-12-22 2007-09-06 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 強誘電性ポリマー層のパターニング方法
CN1596035B (zh) * 2004-06-24 2010-05-12 同济大学 一种硅微型驻极体声传感器储电膜的化学表面修正方法
JP4749162B2 (ja) * 2005-01-31 2011-08-17 株式会社半導体エネルギー研究所 半導体装置
US7768014B2 (en) 2005-01-31 2010-08-03 Semiconductor Energy Laboratory Co., Ltd. Memory device and manufacturing method thereof
US8212064B2 (en) * 2008-05-14 2012-07-03 E.I. Du Pont De Nemours And Company Ethylene tetrafluoroethylene intermediates
US8318877B2 (en) * 2008-05-20 2012-11-27 E.I. Du Pont De Nemours And Company Ethylene tetrafluoroethylene (meth)acrylate copolymers
KR20130101833A (ko) * 2012-03-06 2013-09-16 삼성전자주식회사 Ｐｖｄｆ계 폴리머 필름 제조방법 및 이를 이용한 적층형 폴리머 액츄에이터 제조방법
TW201631065A (zh) * 2014-12-17 2016-09-01 漢高股份有限及兩合公司 可印刷鐵電型墨水
CN106115613A (zh) * 2016-07-22 2016-11-16 西北工业大学 一种大面积单层致密纳米微球薄膜组装方法、装置及装置的使用方法
CN108533576A (zh) * 2018-07-17 2018-09-14 国网山东省电力公司济南市长清区供电公司 一种可过滤排除液压油油气的断路器

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3373240A (en) 1964-06-01 1968-03-12 Dow Chemical Co Method of operating an electric arc furnace
US3979535A (en) * 1973-07-31 1976-09-07 E. I. Du Pont De Nemours And Company Process for the spray application of aqueous paints by controlling the temperature of the air in the paint spray zone
DE2951801A1 (de) * 1979-12-21 1981-07-02 Bayer Ag, 5090 Leverkusen Verfahren zur herstellung von aequilibrierungsprodukten von organosiloxanen
NO154498C (no) 1984-01-25 1986-10-01 Ardal Og Sunndal Verk Fremgangsmaate og anordning for tilfoering av varme til flytende metall samt anvendelse av fremgangsmaaten.
US5139697A (en) * 1988-01-25 1992-08-18 Canon Kabushiki Kaisha Liquid crystal composition and liquid crystal device using same
JP2788265B2 (ja) * 1988-07-08 1998-08-20 オリンパス光学工業株式会社 強誘電体メモリ及びその駆動方法，製造方法
US5057339A (en) * 1988-12-29 1991-10-15 Matsushita Electric Industrial Co., Ltd. Metallized polyacetylene-type or polyacene-type ultralong conjugated polymers and process for producing the same
US5254504A (en) * 1989-04-13 1993-10-19 Trustees Of The University Of Pennsylvania Method of manufacturing ferroelectric MOSFET sensors
JPH0517595A (ja) * 1991-07-15 1993-01-26 Matsushita Electric Ind Co Ltd 高分子超薄膜エレクトレツト及びその製造方法
JP3030309B2 (ja) * 1994-03-09 2000-04-10 工業技術院長 薄膜製造装置
JP3158008B2 (ja) * 1995-03-02 2001-04-23 科学技術振興事業団 配向制御された有機薄膜及び製膜法
US5934786A (en) * 1995-09-21 1999-08-10 O'keefe; Donald L. Sealed lighting unit for clean-rooms and the like
TW324834B (en) * 1996-02-01 1998-01-11 Tokyo Electron Co Ltd Method for forming membrane
US5965679A (en) * 1996-09-10 1999-10-12 The Dow Chemical Company Polyphenylene oligomers and polymers
JP3162313B2 (ja) * 1997-01-20 2001-04-25 工業技術院長 薄膜製造方法および薄膜製造装置
US5853500A (en) * 1997-07-18 1998-12-29 Symetrix Corporation Method for fabricating thin films of barium strontium titanate without exposure to oxygen at high temperatures
US5995271A (en) * 1997-10-07 1999-11-30 Optical Coating Laboratory, Inc. Protective coating materials for electrochromic devices
US6599560B1 (en) * 1997-10-30 2003-07-29 Fsi International, Inc. Liquid coating device with barometric pressure compensation
US5869219A (en) * 1997-11-05 1999-02-09 Taiwan Semiconductor Manufacturing Co. Ltd. Method for depositing a polyimide film
US6177133B1 (en) * 1997-12-10 2001-01-23 Silicon Valley Group, Inc. Method and apparatus for adaptive process control of critical dimensions during spin coating process
US6342292B1 (en) * 1997-12-16 2002-01-29 Asahi Kasei Kabushiki Kaisha Organic thin film and process for producing the same
US6254936B1 (en) * 1998-09-14 2001-07-03 Silicon Valley Group, Inc. Environment exchange control for material on a wafer surface
NO310115B1 (no) 1999-09-03 2001-05-21 Norsk Hydro As Utstyr for smeltebehandling
US6440193B1 (en) 2001-05-21 2002-08-27 Alcoa Inc. Method and reactor for production of aluminum by carbothermic reduction of alumina

Also Published As

Publication number Publication date
KR100519244B1 (ko) 2005-10-07
AU771387B2 (en) 2004-03-18
CN1406173A (zh) 2003-03-26
JP3816803B2 (ja) 2006-08-30
NO20001025L (no) 2001-08-30
CA2401139C (en) 2007-01-02
KR20020075458A (ko) 2002-10-04
RU2213662C1 (ru) 2003-10-10
CA2401139A1 (en) 2001-09-07
AU3621701A (en) 2001-09-12
EP1272321B1 (de) 2004-04-28
JP2003525121A (ja) 2003-08-26
DE60103048T2 (de) 2005-04-28
ATE265298T1 (de) 2004-05-15
ES2219507T3 (es) 2004-12-01
EP1272321A1 (de) 2003-01-08
NO312180B1 (no) 2002-04-08
WO2001064413A1 (en) 2001-09-07
US20020160116A1 (en) 2002-10-31
NO20001025D0 (no) 2000-02-29
RU2002125874A (ru) 2004-02-20

Similar Documents

Publication Publication Date Title
DE60103048D1 (de) Verfahren zur verarbeitung von ultradünnen kunststofffolien
ATE442210T1 (de) Verfahren zur beschichtung von substraten mit kohlenstoffbasiertem material
WO2009019147A3 (en) Deposition from ionic liquids
DE69106091T2 (de) Verfahren zur Abscheidung eines dünnen Films.
ATE452751T1 (de) Ausbildung von dünnfilmen auf substraten unter verwendung eines porösen trägers
DE69911230D1 (de) Verfahren und vorrichtung zur beschichtung mit flüssigem oder superkritischen kohlendioxid
DE50305687D1 (de) Verfahren zur herstellung von polymerschichten
DE50014788D1 (de) Verfahren zur herstellung von oberflächenwellensensoren und oberflächenwellensensor
WO2002005315A3 (en) System and method for improving thin films by gas cluster ion be am processing
DE69913185D1 (de) Verfahren zur abscheidung eines organischen films
FR2776540B1 (fr) Recipient en matiere a effet barriere et procede et appareil pour sa fabrication
WO2007019279A3 (en) Method and composition for polishing a substrate
DE502006001151D1 (de) Verfahren zur Herstellung eines Verbundes
AU2002258673A1 (en) Dimensionally stable composite article and method of making the same
TW200641075A (en) Film, silica film and method of forming the same, composition for forming silica film, and electronic part
TW200515637A (en) Porous films and method of making the same
ATE522637T1 (de) Verfahren zur herstellung eines sputtertargets
DE69122069D1 (de) Verfahren zur Herstellung eines aufgedampften Films
WO2007130752A3 (en) Method of forming multi-layer films using corona treatments
DE60018211D1 (de) Verfahren zur Formung von Materialien auf einem planaren Substrat
TW200622024A (en) Copper(I) complexes for deposition of copper films by atomic layer deposition
TW200500327A (en) Volatile copper(I) complexes for deposition of copper films by atomic layer deposition
ATE133437T1 (de) Verfahren zur abscheidung einer an einem polymeren material befestigten siliziumoxydschicht
DE50100011D1 (de) Verfahren zur Herstellung von Polymerdispersionen mit hohem Feststoffgehalt
DE60012130D1 (de) Zusammensetzung und verfahren zur herstellung von substraten durch pulverformverfahren und damit hergestellte substrate

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee