DE60045744D1 - Für komplexe muster - Google Patents

Für komplexe muster

Info

Publication number
DE60045744D1
DE60045744D1 DE60045744T DE60045744T DE60045744D1 DE 60045744 D1 DE60045744 D1 DE 60045744D1 DE 60045744 T DE60045744 T DE 60045744T DE 60045744 T DE60045744 T DE 60045744T DE 60045744 D1 DE60045744 D1 DE 60045744D1
Authority
DE
Germany
Prior art keywords
features
phase shift
phase
structures
regions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60045744T
Other languages
German (de)
English (en)
Inventor
Christophe Pierrat
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Synopsys Inc
Original Assignee
Synopsys Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/669,359 external-priority patent/US6503666B1/en
Application filed by Synopsys Inc filed Critical Synopsys Inc
Application granted granted Critical
Publication of DE60045744D1 publication Critical patent/DE60045744D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Steroid Compounds (AREA)
DE60045744T 2000-07-05 2000-11-28 Für komplexe muster Expired - Lifetime DE60045744D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21593800P 2000-07-05 2000-07-05
US09/669,359 US6503666B1 (en) 2000-07-05 2000-09-26 Phase shift masking for complex patterns
PCT/US2000/042284 WO2002003140A1 (en) 2000-07-05 2000-11-28 Phase shift masking for complex patterns

Publications (1)

Publication Number Publication Date
DE60045744D1 true DE60045744D1 (de) 2011-04-28

Family

ID=26910506

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60045744T Expired - Lifetime DE60045744D1 (de) 2000-07-05 2000-11-28 Für komplexe muster

Country Status (6)

Country Link
EP (2) EP1299771B1 (cg-RX-API-DMAC7.html)
JP (1) JP4393063B2 (cg-RX-API-DMAC7.html)
CN (1) CN1218217C (cg-RX-API-DMAC7.html)
AT (1) ATE502321T1 (cg-RX-API-DMAC7.html)
AU (1) AU2001239698A1 (cg-RX-API-DMAC7.html)
DE (1) DE60045744D1 (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7858450B2 (en) * 2004-01-06 2010-12-28 Samsung Electronics Co., Ltd. Optic mask and manufacturing method of thin film transistor array panel using the same
KR100586549B1 (ko) * 2004-12-02 2006-06-08 주식회사 하이닉스반도체 포토 마스크 및 이를 이용한 패턴 제조 방법
KR100675882B1 (ko) * 2004-12-22 2007-02-02 주식회사 하이닉스반도체 다중투과 위상 마스크 및 이를 이용한 노광 방법
US8065638B2 (en) * 2009-01-30 2011-11-22 Synopsys, Inc. Incremental concurrent processing for efficient computation of high-volume layout data
WO2011051791A2 (en) 2009-10-30 2011-05-05 Synopsys, Inc. Method and system for lithography hotspot correction of a post-route layout

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5589305A (en) * 1990-11-29 1996-12-31 Kabushiki Kaisha Toshiba Method of fabricating a reticle
US5246800A (en) 1991-09-12 1993-09-21 Etec Systems, Inc. Discrete phase shift mask writing
DE69328220T2 (de) 1992-09-01 2000-08-24 Dai Nippon Printing Co., Ltd. Verfahren zur Herstellung einer Phasenschiebermaske oder eines Phasenschiebermasken-Rohlings
US5362584A (en) * 1993-04-02 1994-11-08 International Business Machines Corporation Phase-shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areas
US5496666A (en) * 1994-10-27 1996-03-05 Chartered Semiconductor Manufacturing Pte Ltd. Contact hole mask for semiconductor fabrication
US5472814A (en) 1994-11-17 1995-12-05 International Business Machines Corporation Orthogonally separated phase shifted and unphase shifted mask patterns for image improvement
US5523186A (en) * 1994-12-16 1996-06-04 International Business Machines Corporation Split and cover technique for phase shifting photolithography
JP2790127B2 (ja) * 1996-06-27 1998-08-27 日本電気株式会社 フォトマスク及びその製造方法
US5858580A (en) 1997-09-17 1999-01-12 Numerical Technologies, Inc. Phase shifting circuit manufacture method and apparatus
US5923566A (en) * 1997-03-25 1999-07-13 International Business Machines Corporation Phase shifted design verification routine
US6057063A (en) 1997-04-14 2000-05-02 International Business Machines Corporation Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith
JPH11109603A (ja) * 1997-10-06 1999-04-23 Mitsubishi Electric Corp フォトマスクおよび半導体装置の製造方法
US6096458A (en) 1998-08-05 2000-08-01 International Business Machines Corporation Methods for manufacturing photolithography masks utilizing interfering beams of radiation

Also Published As

Publication number Publication date
CN1218217C (zh) 2005-09-07
EP2322992B1 (en) 2013-07-24
EP2322992A1 (en) 2011-05-18
AU2001239698A1 (en) 2002-01-14
JP4393063B2 (ja) 2010-01-06
ATE502321T1 (de) 2011-04-15
EP1299771A1 (en) 2003-04-09
EP1299771B1 (en) 2011-03-16
JP2004502971A (ja) 2004-01-29
CN1454332A (zh) 2003-11-05

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