DE60045527D1 - Verfahren zur Herstellung einer integralen Linse für einen Hochenergieteilchenstrom - Google Patents

Verfahren zur Herstellung einer integralen Linse für einen Hochenergieteilchenstrom

Info

Publication number
DE60045527D1
DE60045527D1 DE60045527T DE60045527T DE60045527D1 DE 60045527 D1 DE60045527 D1 DE 60045527D1 DE 60045527 T DE60045527 T DE 60045527T DE 60045527 T DE60045527 T DE 60045527T DE 60045527 D1 DE60045527 D1 DE 60045527D1
Authority
DE
Germany
Prior art keywords
degree
integration
sublenses
stocks
bundle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60045527T
Other languages
English (en)
Inventor
Muradin Abubekirovich Kumakhov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of DE60045527D1 publication Critical patent/DE60045527D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/04—Re-forming tubes or rods
    • C03B23/047—Re-forming tubes or rods by drawing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/04—Re-forming tubes or rods
    • C03B23/047—Re-forming tubes or rods by drawing
    • C03B23/0473—Re-forming tubes or rods by drawing for forming constrictions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00—Radiation therapy
    • A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
    • A61N2005/1085—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy characterised by the type of particles applied to the patient
    • A61N2005/1091—Kilovoltage or orthovoltage range photons
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00—Radiation therapy
    • A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
    • A61N2005/1092—Details
    • A61N2005/1095—Elements inserted into the radiation path within the system, e.g. filters or wedges
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00—Radiation therapy
    • A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Eyeglasses (AREA)
  • Electron Beam Exposure (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Radiation-Therapy Devices (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
DE60045527T 1999-10-18 2000-05-30 Verfahren zur Herstellung einer integralen Linse für einen Hochenergieteilchenstrom Expired - Lifetime DE60045527D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
RU99121677/06A RU2164361C1 (ru) 1999-10-18 1999-10-18 Линза для управления излучением в виде потока нейтральных или заряженных частиц, способ изготовления таких линз и содержащее такие линзы аналитическое устройство, устройство для лучевой терапии и устройства для контактной и проекционной литографии

Publications (1)

Publication Number Publication Date
DE60045527D1 true DE60045527D1 (de) 2011-02-24

Family

ID=20225856

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60045527T Expired - Lifetime DE60045527D1 (de) 1999-10-18 2000-05-30 Verfahren zur Herstellung einer integralen Linse für einen Hochenergieteilchenstrom

Country Status (13)

Country Link
US (2) US6678348B1 (de)
EP (2) EP1170755A4 (de)
JP (1) JP2003512631A (de)
KR (1) KR100432511B1 (de)
CN (1) CN1144237C (de)
AT (1) ATE495528T1 (de)
AU (1) AU754593B2 (de)
CA (1) CA2354080C (de)
DE (1) DE60045527D1 (de)
HK (1) HK1040820B (de)
RU (1) RU2164361C1 (de)
UA (1) UA49111C2 (de)
WO (1) WO2001029845A1 (de)

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* Cited by examiner, † Cited by third party
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UA59495C2 (uk) * 2000-08-07 2003-09-15 Мурадін Абубєкіровіч Кумахов Рентгенівський вимірювально-випробувальний комплекс
WO2003024527A1 (fr) * 2001-09-19 2003-03-27 Muradin Abubekirovich Kumakhov Dispositif de radiotherapie
US7239787B2 (en) 2002-06-14 2007-07-03 Muradin Abubekirovich Kumakhov Device for shaping of an optical radiation flux
US7321654B2 (en) * 2003-06-03 2008-01-22 Mentor Technologies, Inc. Narrow band x-ray system and fabrication method thereof
US20040247073A1 (en) * 2003-06-03 2004-12-09 Cho Yong Min High resolution X-ray system
KR100789385B1 (ko) * 2005-01-26 2007-12-28 단국대학교 산학협력단 마이크로 모세관을 이용한 엑스선 광학 소자
NL1029645C2 (nl) * 2005-07-29 2007-01-30 Panalytical Bv Inrichting en werkwijze voor het uitvoeren van röntgenanalyse.
US7991116B2 (en) * 2005-08-04 2011-08-02 X-Ray Optical Systems, Inc. Monochromatic x-ray micro beam for trace element mapping
US7402813B2 (en) * 2005-12-13 2008-07-22 Spectrum Dynamics Llc Lens system for nuclear medicine gamma ray camera
EP1953537A1 (de) * 2007-01-30 2008-08-06 KEMMER, Josef, Dr. Vorrichtung zur Erfassung und/oder Leitung von Röntgenstrahlung unter Verwendung einer Röntgenoptik
DE102008030590A1 (de) 2007-06-29 2009-01-08 Carl Zeiss Surgical Gmbh Applikator zur Verwendung in einer Strahlentherapievorrichtung sowie Strahlentherapievorrichtung
US7742566B2 (en) * 2007-12-07 2010-06-22 General Electric Company Multi-energy imaging system and method using optic devices
EP2071583A1 (de) * 2007-12-10 2009-06-17 Unisantis FZE Abgestufte Linsen
JP2011053096A (ja) * 2009-09-02 2011-03-17 Japan Atomic Energy Agency 中性子光学素子
DE102009058581A1 (de) * 2009-12-17 2011-06-22 Carl Zeiss Surgical GmbH, 73447 Applikatoreinrichtung für die Strahlentherapie, Befestigungseinrichtung sowie Strahlentherapievorrichtung
US8587768B2 (en) * 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
FR2958858B1 (fr) * 2010-04-15 2012-06-29 Joel Kerjean Dispositif de guidage de photons pour appareil de radiotherapie
CN102000399B (zh) * 2010-12-23 2012-07-04 北京师范大学 微束x射线治疗谱仪、多毛细管x射线聚束系统及方法
CN102543243B (zh) * 2010-12-28 2016-07-13 Ge医疗系统环球技术有限公司 集成毛细管式平行x射线聚焦透镜
JP5684032B2 (ja) * 2011-04-08 2015-03-11 株式会社日立製作所 荷電粒子線分析装置および分析方法
US9248315B2 (en) * 2012-09-04 2016-02-02 Varian Medical Systems, Inc. Targeting method for microbeam radiosurgery
CN202905197U (zh) * 2012-10-09 2013-04-24 北京师范大学 用于聚焦同步辐射光源的光学器件
CN103698350B (zh) * 2013-12-26 2016-03-30 北京师范大学 一种x射线双谱仪
JP6426478B2 (ja) * 2014-01-31 2018-11-21 信越化学工業株式会社 ガラスロッドの加工方法および加工装置
JP6397690B2 (ja) * 2014-08-11 2018-09-26 株式会社日立ハイテクノロジーズ Ｘ線透過検査装置及び異物検出方法
CN104502376B (zh) * 2014-12-22 2018-07-06 北京师范大学 X射线纳米成像设备及成像分析系统
CA3026133C (en) 2016-05-31 2024-06-11 David W. Holdsworth Gamma probe and multimodal intraoperative imaging system
EP3421088A1 (de) * 2017-06-30 2019-01-02 RaySearch Laboratories AB Bestimmung einer verteilung von spots von varying grössen für ion beam therapie basiert auf benutzerkonfiguration
JP7280516B2 (ja) * 2020-09-30 2023-05-24 パルステック工業株式会社 Ｘ線回折測定装置
CN113126142B (zh) * 2021-04-16 2022-04-01 应急管理部国家自然灾害防治研究院 高能粒子探测器性能评估方法及系统
WO2024154237A1 (ja) * 2023-01-17 2024-07-25 浜松ホトニクス株式会社 放射線ビーム走査光学系及び検査装置

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US5001737A (en) * 1988-10-24 1991-03-19 Aaron Lewis Focusing and guiding X-rays with tapered capillaries
US5175755A (en) 1990-10-31 1992-12-29 X-Ray Optical System, Inc. Use of a kumakhov lens for x-ray lithography
CA2095222C (en) * 1990-10-31 2002-09-10 Muradin A. Kumakhov Device for controlling beams of particles, x-ray and gamma quanta and uses thereof
US5192869A (en) 1990-10-31 1993-03-09 X-Ray Optical Systems, Inc. Device for controlling beams of particles, X-ray and gamma quanta
US5497008A (en) * 1990-10-31 1996-03-05 X-Ray Optical Systems, Inc. Use of a Kumakhov lens in analytic instruments
JPH0582419A (ja) * 1991-09-20 1993-04-02 Fujitsu Ltd Ｘ線透過窓およびその製造方法
RU2059315C1 (ru) * 1992-03-23 1996-04-27 Саратовское научное объединение "САНОР" Способ изготовления рентгенооптических систем
RU2096353C1 (ru) 1994-02-28 1997-11-20 Мурадин Абубекирович Кумахов Способ изготовления поликапиллярной жесткой волоконно-оптической структуры или элемента и устройство для управления рентгеновским и другими видами излучения
US6271534B1 (en) * 1994-07-08 2001-08-07 Muradin Abubekirovich Kumakhov Device for producing the image of an object using a flux of neutral or charged particles, and an integrated lens for converting such flux of neutral or charged particles
EP0723272B1 (de) * 1994-07-08 2001-04-25 Muradin Abubekirovich Kumakhov Verfahren zur führung von neutral- und ladungsträgerstrahlen und eine vorrichtung zur durchführung des verfahrens
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US5684854A (en) 1996-08-12 1997-11-04 Siemens Medical System Inc Method and system for dynamically establishing field size coincidence

Also Published As

Publication number Publication date
CA2354080C (en) 2005-11-01
EP1564756A3 (de) 2007-03-07
HK1040820A1 (en) 2002-06-21
AU4961200A (en) 2001-04-30
US20030209677A1 (en) 2003-11-13
KR100432511B1 (ko) 2004-05-22
KR20010101254A (ko) 2001-11-14
UA49111C2 (uk) 2002-09-16
CA2354080A1 (en) 2001-04-26
ATE495528T1 (de) 2011-01-15
EP1564756B1 (de) 2011-01-12
CN1327596A (zh) 2001-12-19
JP2003512631A (ja) 2003-04-02
EP1170755A1 (de) 2002-01-09
EP1170755A4 (de) 2004-03-17
US6678348B1 (en) 2004-01-13
US6963072B2 (en) 2005-11-08
CN1144237C (zh) 2004-03-31
EP1564756A2 (de) 2005-08-17
AU754593B2 (en) 2002-11-21
RU2164361C1 (ru) 2001-03-20
WO2001029845A1 (fr) 2001-04-26
HK1040820B (zh) 2004-09-10

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