DE60043615D1 - NICHT-INVASIVES SYSTEM UND VERFAHREN ZUR DIAGNOSTIZIERUNG VON MöGLICHEN FEHLERN IN BAUGRUPPEN VON ANLAGEN ZUR HALBLEITERHERSTELLUNG - Google Patents
NICHT-INVASIVES SYSTEM UND VERFAHREN ZUR DIAGNOSTIZIERUNG VON MöGLICHEN FEHLERN IN BAUGRUPPEN VON ANLAGEN ZUR HALBLEITERHERSTELLUNGInfo
- Publication number
- DE60043615D1 DE60043615D1 DE60043615T DE60043615T DE60043615D1 DE 60043615 D1 DE60043615 D1 DE 60043615D1 DE 60043615 T DE60043615 T DE 60043615T DE 60043615 T DE60043615 T DE 60043615T DE 60043615 D1 DE60043615 D1 DE 60043615D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor manufacturing
- manufacturing equipment
- data signal
- assemblies
- transducer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
- G01H1/00—Measuring characteristics of vibrations in solids by using direct conduction to the detector
- G01H1/003—Measuring characteristics of vibrations in solids by using direct conduction to the detector of rotating machines
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Environmental & Geological Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Automation & Control Theory (AREA)
- Manufacturing & Machinery (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Measurement Of Mechanical Vibrations Or Ultrasonic Waves (AREA)
- Testing Of Devices, Machine Parts, Or Other Structures Thereof (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Elimination Of Static Electricity (AREA)
- Tests Of Electronic Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- General Factory Administration (AREA)
- Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/247,143 US6195621B1 (en) | 1999-02-09 | 1999-02-09 | Non-invasive system and method for diagnosing potential malfunctions of semiconductor equipment components |
PCT/US2000/003224 WO2000047953A1 (en) | 1999-02-09 | 2000-02-08 | A non-invasive system and method for diagnosing potential malfunctions of semiconductor equipment components |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60043615D1 true DE60043615D1 (de) | 2010-02-11 |
Family
ID=22933756
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60043615T Expired - Lifetime DE60043615D1 (de) | 1999-02-09 | 2000-02-08 | NICHT-INVASIVES SYSTEM UND VERFAHREN ZUR DIAGNOSTIZIERUNG VON MöGLICHEN FEHLERN IN BAUGRUPPEN VON ANLAGEN ZUR HALBLEITERHERSTELLUNG |
Country Status (6)
Country | Link |
---|---|
US (2) | US6195621B1 (de) |
EP (1) | EP1192421B1 (de) |
AT (1) | ATE453878T1 (de) |
AU (1) | AU3225300A (de) |
DE (1) | DE60043615D1 (de) |
WO (1) | WO2000047953A1 (de) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6556881B1 (en) * | 1999-09-09 | 2003-04-29 | Advanced Micro Devices, Inc. | Method and apparatus for integrating near real-time fault detection in an APC framework |
JP3609982B2 (ja) * | 2000-04-20 | 2005-01-12 | リオン株式会社 | 故障診断方法及びその装置 |
JP2002023839A (ja) * | 2000-07-13 | 2002-01-25 | Hitachi Ltd | 機器管理システムと機器管理方法及び監視装置、データベース装置とデータベースクライアント装置並びに記録媒体 |
WO2002089189A1 (fr) * | 2001-04-27 | 2002-11-07 | Tokyo Electron Limited | Procede et systeme de maintenance a distance |
US6537834B2 (en) * | 2001-07-24 | 2003-03-25 | Promos Technologies, Inc. | Method and apparatus for determining and assessing chamber inconsistency in a tool |
JP3601709B2 (ja) * | 2001-11-01 | 2004-12-15 | プロモス テクノロジーズ インコーポレイテッド | 信号振動についての警報方法 |
DE10205517A1 (de) * | 2002-02-08 | 2003-08-14 | Orga Kartensysteme Gmbh | Verfahren zur Erkennung von Beschädigungen an IC-Bauelementen |
US20050288898A1 (en) * | 2004-06-14 | 2005-12-29 | Canh Le | Systems and methods for analyzing machine failure |
US7173539B2 (en) * | 2004-09-30 | 2007-02-06 | Florida Power And Light Company | Condition assessment system and method |
US7838072B2 (en) * | 2005-01-26 | 2010-11-23 | Tokyo Electron Limited | Method and apparatus for monolayer deposition (MLD) |
US7444572B2 (en) * | 2005-09-01 | 2008-10-28 | Tokyo Electron Limited | Built-in self test for a thermal processing system |
US7165011B1 (en) | 2005-09-01 | 2007-01-16 | Tokyo Electron Limited | Built-in self test for a thermal processing system |
US7248975B2 (en) * | 2005-09-20 | 2007-07-24 | Tech Semiconductor Singapore Pte Ltd | Real time monitoring of particulate contamination in a wafer processing chamber |
JP6030278B2 (ja) * | 2006-03-16 | 2016-11-24 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 電子デバイス製造システムの操作を改善する方法及び装置 |
US20070221125A1 (en) * | 2006-03-24 | 2007-09-27 | Tokyo Electron Limited | Semiconductor processing system with wireless sensor network monitoring system incorporated therewith |
US8026113B2 (en) * | 2006-03-24 | 2011-09-27 | Tokyo Electron Limited | Method of monitoring a semiconductor processing system using a wireless sensor network |
US7406644B2 (en) * | 2006-03-30 | 2008-07-29 | Tokyo Electron Limited | Monitoring a thermal processing system |
US7302363B2 (en) * | 2006-03-31 | 2007-11-27 | Tokyo Electron Limited | Monitoring a system during low-pressure processes |
US7340377B2 (en) * | 2006-03-31 | 2008-03-04 | Tokyo Electron Limited | Monitoring a single-wafer processing system |
US7526699B2 (en) * | 2006-03-31 | 2009-04-28 | Tokyo Electron Limited | Method for creating a built-in self test (BIST) table for monitoring a monolayer deposition (MLD) system |
US7519885B2 (en) * | 2006-03-31 | 2009-04-14 | Tokyo Electron Limited | Monitoring a monolayer deposition (MLD) system using a built-in self test (BIST) table |
KR101560705B1 (ko) * | 2007-05-25 | 2015-10-16 | 어플라이드 머티어리얼스, 인코포레이티드 | 전자 디바이스 제조 시스템들을 조립하고 작동시키는 방법들 및 장치 |
CN101678407A (zh) * | 2007-05-25 | 2010-03-24 | 应用材料股份有限公司 | 用于减量系统的有效操作的方法与装置 |
US20090018688A1 (en) * | 2007-06-15 | 2009-01-15 | Applied Materials, Inc. | Methods and systems for designing and validating operation of abatement systems |
CN101835521A (zh) * | 2007-10-26 | 2010-09-15 | 应用材料公司 | 利用改进燃料线路的用于智能减废的方法与设备 |
CN102023100A (zh) * | 2010-04-19 | 2011-04-20 | 东莞市罗尔机电科技有限公司 | 设备故障预警系统及方法 |
US20110267190A1 (en) * | 2010-05-03 | 2011-11-03 | Irvine Sensors Corporation | Anti-Tampering Detection Using Target Circuit RF Signature |
US20120330577A1 (en) * | 2011-06-22 | 2012-12-27 | Honeywell International Inc. | Vibration severity analysis apparatus and method for rotating machinery |
BR102015011438B1 (pt) * | 2015-05-19 | 2020-08-18 | Universidade Federal De Santa Catarina | Sistema e método para identificar características de uma máquina elétrica |
DE102017204685B4 (de) * | 2017-03-21 | 2021-11-11 | Carl Zeiss Smt Gmbh | Verfahren zur Lokalisierung von Montagefehlern sowie Projektionsbelichtungsanlage |
TWI807790B (zh) * | 2019-06-21 | 2023-07-01 | 美商瓦特洛威電子製造公司 | 用於監測動態系統的情況之系統及方法 |
US11269003B2 (en) * | 2020-02-11 | 2022-03-08 | Nanya Technology Corporation | System and method for monitoring semiconductor manufacturing equipment via analysis unit |
DE102022115787A1 (de) * | 2022-06-24 | 2024-01-04 | Krohne Messtechnik Gmbh | Verfahren zum Betreiben eines magnetisch-induktiven Durchflussmessgeräts und ein entsprechendes magnetisch-induktives Durchflussmessgerät |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4184205A (en) * | 1977-11-25 | 1980-01-15 | Ird Mechanalysis, Inc. | Data acquisition system |
JPS55138634A (en) | 1979-04-16 | 1980-10-29 | Kansai Electric Power Co Inc:The | Fault diagnosis apparatus of apparatus |
US4402054A (en) * | 1980-10-15 | 1983-08-30 | Westinghouse Electric Corp. | Method and apparatus for the automatic diagnosis of system malfunctions |
US4380172A (en) | 1981-02-19 | 1983-04-19 | General Electric Company | On-line rotor crack detection |
JPS6021423A (ja) | 1983-07-15 | 1985-02-02 | Mitsubishi Electric Corp | 振動監視装置 |
US4520674A (en) | 1983-11-14 | 1985-06-04 | Technology For Energy Corporation | Vibration monitoring device |
US4885707A (en) | 1987-02-19 | 1989-12-05 | Dli Corporation | Vibration data collecting and processing apparatus and method |
US4805457A (en) | 1987-05-28 | 1989-02-21 | General Electric Company | Shaft to impeller integrity determination in assembled pumps by remote sensing |
US5251151A (en) | 1988-05-27 | 1993-10-05 | Research Foundation Of State Univ. Of N.Y. | Method and apparatus for diagnosing the state of a machine |
US4980844A (en) | 1988-05-27 | 1990-12-25 | Victor Demjanenko | Method and apparatus for diagnosing the state of a machine |
JP2631395B2 (ja) * | 1988-09-09 | 1997-07-16 | キヤノン株式会社 | 露光装置の制御方法 |
US4894644A (en) | 1988-10-04 | 1990-01-16 | General Electric Company | Tool break/wear detection using a tracking minimum of detected vibrational signal |
US5058434A (en) | 1990-02-27 | 1991-10-22 | Carl Schenck Ag | Process for early detection of damage to machine parts |
US5481481A (en) * | 1992-11-23 | 1996-01-02 | Architectural Engergy Corporation | Automated diagnostic system having temporally coordinated wireless sensors |
US5642296A (en) | 1993-07-29 | 1997-06-24 | Texas Instruments Incorporated | Method of diagnosing malfunctions in semiconductor manufacturing equipment |
US5808903A (en) * | 1995-09-12 | 1998-09-15 | Entek Scientific Corporation | Portable, self-contained data collection systems and methods |
US5610339A (en) | 1994-10-20 | 1997-03-11 | Ingersoll-Rand Company | Method for collecting machine vibration data |
US6119074A (en) * | 1998-05-20 | 2000-09-12 | Caterpillar Inc. | Method and apparatus of predicting a fault condition |
-
1999
- 1999-02-09 US US09/247,143 patent/US6195621B1/en not_active Expired - Lifetime
-
2000
- 2000-02-08 AT AT00910106T patent/ATE453878T1/de not_active IP Right Cessation
- 2000-02-08 AU AU32253/00A patent/AU3225300A/en not_active Abandoned
- 2000-02-08 EP EP00910106A patent/EP1192421B1/de not_active Expired - Lifetime
- 2000-02-08 DE DE60043615T patent/DE60043615D1/de not_active Expired - Lifetime
- 2000-02-08 WO PCT/US2000/003224 patent/WO2000047953A1/en active Application Filing
-
2001
- 2001-02-27 US US09/795,239 patent/US20010008993A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
AU3225300A (en) | 2000-08-29 |
WO2000047953A1 (en) | 2000-08-17 |
US20010008993A1 (en) | 2001-07-19 |
ATE453878T1 (de) | 2010-01-15 |
EP1192421A1 (de) | 2002-04-03 |
US6195621B1 (en) | 2001-02-27 |
EP1192421A4 (de) | 2006-04-19 |
EP1192421B1 (de) | 2009-12-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |