DE60043103D1 - Gerät und verfahren zur sekundärelektronen-mikroskopie mittels doppelten strahles - Google Patents

Gerät und verfahren zur sekundärelektronen-mikroskopie mittels doppelten strahles

Info

Publication number
DE60043103D1
DE60043103D1 DE60043103T DE60043103T DE60043103D1 DE 60043103 D1 DE60043103 D1 DE 60043103D1 DE 60043103 T DE60043103 T DE 60043103T DE 60043103 T DE60043103 T DE 60043103T DE 60043103 D1 DE60043103 D1 DE 60043103D1
Authority
DE
Germany
Prior art keywords
secondary electronic
electronic microscopy
double ray
ray
double
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60043103T
Other languages
English (en)
Inventor
Lee Veneklasen
David Adler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/354,948 external-priority patent/US6087659A/en
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Priority claimed from US09/579,867 external-priority patent/US6586733B1/en
Priority claimed from PCT/US2000/014583 external-priority patent/WO2000072355A1/en
Application granted granted Critical
Publication of DE60043103D1 publication Critical patent/DE60043103D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2538—Low energy electron microscopy [LEEM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/262—Non-scanning techniques

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE60043103T 1999-05-25 2000-05-25 Gerät und verfahren zur sekundärelektronen-mikroskopie mittels doppelten strahles Expired - Lifetime DE60043103D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US13574299P 1999-05-25 1999-05-25
US09/354,948 US6087659A (en) 1997-11-05 1999-07-16 Apparatus and method for secondary electron emission microscope
US09/579,867 US6586733B1 (en) 1999-05-25 2000-05-25 Apparatus and methods for secondary electron emission microscope with dual beam
PCT/US2000/014583 WO2000072355A1 (en) 1999-05-25 2000-05-25 Apparatus and methods for secondary electron emission microscopy with dual beam

Publications (1)

Publication Number Publication Date
DE60043103D1 true DE60043103D1 (de) 2009-11-19

Family

ID=41180684

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60043103T Expired - Lifetime DE60043103D1 (de) 1999-05-25 2000-05-25 Gerät und verfahren zur sekundärelektronen-mikroskopie mittels doppelten strahles

Country Status (2)

Country Link
JP (1) JP4759146B2 (de)
DE (1) DE60043103D1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101110224B1 (ko) * 2003-01-27 2012-02-15 가부시끼가이샤 도시바 샘플에서 반사된 전자들을 이용하여 샘플을 검사하는 맵핑 투영식 전자빔 장치
TWI473140B (zh) * 2008-04-11 2015-02-11 Ebara Corp 試料觀察方法與裝置，及使用該方法與裝置之檢查方法與裝置
WO2011151116A1 (en) * 2010-06-03 2011-12-08 Carl Zeiss Sms Gmbh A method for determining the performance of a photolithographic mask

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05205688A (ja) * 1992-01-28 1993-08-13 Toshiba Corp 走査型電子顕微鏡
JP3101114B2 (ja) * 1993-02-16 2000-10-23 日本電子株式会社 走査電子顕微鏡
JPH0714537A (ja) * 1993-06-22 1995-01-17 Hitachi Ltd 走査型電子顕微鏡による計測方法
JPH07153411A (ja) * 1993-11-29 1995-06-16 Nikon Corp 電子ビーム観察方法および装置
JPH10275583A (ja) * 1997-03-28 1998-10-13 Jeol Ltd 絶縁性物質を含む試料の分析装置
US5973323A (en) * 1997-11-05 1999-10-26 Kla-Tencor Corporation Apparatus and method for secondary electron emission microscope

Also Published As

Publication number Publication date
JP2003500821A (ja) 2003-01-07
JP4759146B2 (ja) 2011-08-31

Similar Documents

Publication Publication Date Title
DE60034121D1 (de) Verfahren und vorrichtung zur streuparameter-kalibrierung
DE60018733D1 (de) Vorrichtung und verfahren zur probenanalyse
DE60021077D1 (de) Vorrichtung und verfahren zur probenabgabe
DE69943380D1 (de) Verfahren und vorrichtung zur verzerrungskompensation eines funkgerätes
DE60138564D1 (de) Verfahren und vorrichtung zur austenitischen schwe
DE60132586D1 (de) Verfahren und vorrichtung zur abtastratenwandlung
DE60037008D1 (de) Verfahren und vorrichtung zur synchronisierung
DE60000406T2 (de) Vorrichtung und verfahren zur konfokalen mikroskopie
DE60117485D1 (de) Verfahren und Vorrichtung zur Pufferverwaltung
DE60138241D1 (de) Vorrichtung zur Kompensation einer Verzeichnung und Verfahren zur Kompensation einer Verzeichnung
DE60120093D1 (de) Bildgebende Vorrichtung und bildgebendes Verfahren
DE50012519D1 (de) Verfahren zur fahrwegvisualisierung und vorrichtung
DE60127971D1 (de) Vorrichtung und verfahren zur reduktion von strahllärm mittels hochfrequenter schwingungen
ATE275779T1 (de) Verfahren und vorrichtung zur aufwärtsplanung
DE50007073D1 (de) Verfahren und vorrichtung zur strahlformung
DE10085355T1 (de) Vorrichtung zur akustischen Verbesserung einer Umgebung und diesbezügliches Verfahren
DE60041652D1 (de) Verfahren und vorrichtung zur mehrkanal-harq-kommunikation
DE60040530D1 (de) Verfahren und vorrichtung zur elektrosprüh-massenspektrometrie
DE10195954T1 (de) Elektronikvorrichtung und Verfahren zur Herstellung einer Elektronikvorrichtung
DE59902261D1 (de) Verfahren und Einrichtung zur Zustandsschätzung
DE60029078D1 (de) Verfahren und Gerät zur automatischen Patientenpositionierung
DE60128641D1 (de) Verfahren und Gerät zur Bilderzeugung
DE60028581D1 (de) Verfahren und gerät zur entfernungsmessung
DE60138256D1 (de) Verzerrungsskompensationseinrichtung und Verfahren
DE10196323T1 (de) Verfahren und Vorrichtung zur Sicherung einer Erdbewegungsmaschine

Legal Events

Date Code Title Description
8364 No opposition during term of opposition