DE60004349D1 - Kathodisches vakuum-bogenverdampfungsverfahren für die herstellung von verschleissfesten beschichtungen - Google Patents

Kathodisches vakuum-bogenverdampfungsverfahren für die herstellung von verschleissfesten beschichtungen

Info

Publication number
DE60004349D1
DE60004349D1 DE60004349T DE60004349T DE60004349D1 DE 60004349 D1 DE60004349 D1 DE 60004349D1 DE 60004349 T DE60004349 T DE 60004349T DE 60004349 T DE60004349 T DE 60004349T DE 60004349 D1 DE60004349 D1 DE 60004349D1
Authority
DE
Germany
Prior art keywords
cathode
low voltage
elements
wear resistant
voltage arc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60004349T
Other languages
English (en)
Inventor
Pavel Holubar
Mojmir Jilek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shm S R O
Original Assignee
Shm S R O
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shm S R O filed Critical Shm S R O
Application granted granted Critical
Publication of DE60004349D1 publication Critical patent/DE60004349D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055Arc discharge
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3266Magnetic control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Glass Compositions (AREA)
DE60004349T 1999-03-24 2000-03-17 Kathodisches vakuum-bogenverdampfungsverfahren für die herstellung von verschleissfesten beschichtungen Expired - Lifetime DE60004349D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CZ19991054A CZ293777B6 (cs) 1999-03-24 1999-03-24 Otěruvzdorný povlak
PCT/CZ2000/000019 WO2000056946A1 (en) 1999-03-24 2000-03-17 Wear resistant coating

Publications (1)

Publication Number Publication Date
DE60004349D1 true DE60004349D1 (de) 2003-09-11

Family

ID=5462679

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60004349T Expired - Lifetime DE60004349D1 (de) 1999-03-24 2000-03-17 Kathodisches vakuum-bogenverdampfungsverfahren für die herstellung von verschleissfesten beschichtungen

Country Status (6)

Country Link
EP (1) EP1173629B1 (de)
AT (1) ATE246738T1 (de)
AU (1) AU3270500A (de)
CZ (1) CZ293777B6 (de)
DE (1) DE60004349D1 (de)
WO (1) WO2000056946A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10032399A1 (de) * 2000-07-06 2002-01-17 Jagenberg Papiertech Gmbh Refiner und Verfahren zum Oberflächenbehandeln eines Werkzeuges eines derartigen Refiners
DE10322292A1 (de) * 2003-05-16 2004-12-30 Hegla Fahrzeug- Und Maschinenbau Gmbh & Co Kg Verfahren und Vorrichtung zum Herstellen von Schneidwerkzeugen, sowie Schneidwerkzeug
JP4110175B2 (ja) * 2006-03-22 2008-07-02 株式会社神戸製鋼所 アークイオンプレーティング方法
EP2521159A1 (de) 2011-05-06 2012-11-07 Pivot a.s. Glimmentladungsvorrichtung und Verfahren mit seitlich rotierenden Lichtbogenkathoden
EP2746424B1 (de) 2012-12-21 2018-10-17 Oerlikon Surface Solutions AG, Pfäffikon Verdampfungsquelle
EP2778253B1 (de) 2013-02-26 2018-10-24 Oerlikon Surface Solutions AG, Pfäffikon Zylinderförmige Verdampfungsquelle
US9111734B2 (en) 2013-10-31 2015-08-18 General Electric Company Systems and method of coating an interior surface of an object
CZ201661A3 (cs) * 2016-02-05 2017-06-07 Shm, S. R. O. Způsob nanášení otěruvzdorných vrstev na bázi bóru a otěruvzdorná vrstva
AT15677U1 (de) * 2017-01-31 2018-04-15 Ceratizit Austria Gmbh Beschichtetes Werkzeug
CN114739342B (zh) * 2022-04-08 2023-08-11 河北光兴半导体技术有限公司 超薄玻璃应力层厚度的测量方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61195975A (ja) * 1985-02-26 1986-08-30 Sumitomo Electric Ind Ltd 多重被覆超硬合金
JP2793696B2 (ja) * 1990-05-17 1998-09-03 神鋼コベルコツール株式会社 耐摩耗性皮膜
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US5282944A (en) * 1992-07-30 1994-02-01 The United States Of America As Represented By The United States Department Of Energy Ion source based on the cathodic arc
DE4343354C2 (de) * 1993-12-18 2002-11-14 Bosch Gmbh Robert Verfahren zur Herstellung einer Hartstoffschicht
JP2840541B2 (ja) * 1994-05-13 1998-12-24 神鋼コベルコツール株式会社 耐摩耗性に優れた硬質皮膜、硬質皮膜被覆工具及び硬質皮膜被覆部材

Also Published As

Publication number Publication date
EP1173629B1 (de) 2003-08-06
ATE246738T1 (de) 2003-08-15
CZ9901054A3 (cs) 2000-11-15
WO2000056946A1 (en) 2000-09-28
AU3270500A (en) 2000-10-09
EP1173629A1 (de) 2002-01-23
CZ293777B6 (cs) 2004-07-14

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