DE59809935D1 - Versorgungssystem für chemikalien und dessen verwendung - Google Patents
Versorgungssystem für chemikalien und dessen verwendungInfo
- Publication number
- DE59809935D1 DE59809935D1 DE59809935T DE59809935T DE59809935D1 DE 59809935 D1 DE59809935 D1 DE 59809935D1 DE 59809935 T DE59809935 T DE 59809935T DE 59809935 T DE59809935 T DE 59809935T DE 59809935 D1 DE59809935 D1 DE 59809935D1
- Authority
- DE
- Germany
- Prior art keywords
- supply system
- chemicals
- useful
- system allows
- prepared directly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Catching Or Destruction (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19715974A DE19715974A1 (de) | 1997-04-17 | 1997-04-17 | Versorgungssystem für Chemikalien und dessen Verwendung |
PCT/EP1998/002035 WO1998047661A1 (de) | 1997-04-17 | 1998-04-08 | Versorgungssystem für chemikalien und dessen verwendung |
Publications (1)
Publication Number | Publication Date |
---|---|
DE59809935D1 true DE59809935D1 (de) | 2003-11-20 |
Family
ID=7826736
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19715974A Withdrawn DE19715974A1 (de) | 1997-04-17 | 1997-04-17 | Versorgungssystem für Chemikalien und dessen Verwendung |
DE59809935T Expired - Fee Related DE59809935D1 (de) | 1997-04-17 | 1998-04-08 | Versorgungssystem für chemikalien und dessen verwendung |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19715974A Withdrawn DE19715974A1 (de) | 1997-04-17 | 1997-04-17 | Versorgungssystem für Chemikalien und dessen Verwendung |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1009589B1 (de) |
JP (1) | JP2001520589A (de) |
AT (1) | ATE251969T1 (de) |
DE (2) | DE19715974A1 (de) |
TW (1) | TW392248B (de) |
WO (1) | WO1998047661A1 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6241586B1 (en) | 1998-10-06 | 2001-06-05 | Rodel Holdings Inc. | CMP polishing slurry dewatering and reconstitution |
US6447375B2 (en) * | 2000-04-19 | 2002-09-10 | Rodel Holdings Inc. | Polishing method using a reconstituted dry particulate polishing composition |
DE10060697B4 (de) * | 2000-12-07 | 2005-10-06 | Siltronic Ag | Doppelseiten-Polierverfahren mit reduzierter Kratzerrate und Vorrichtung zur Durchführung des Verfahrens |
US7778721B2 (en) | 2003-01-27 | 2010-08-17 | Applied Materials, Inc. | Small lot size lithography bays |
US7221993B2 (en) | 2003-01-27 | 2007-05-22 | Applied Materials, Inc. | Systems and methods for transferring small lot size substrate carriers between processing tools |
US7720557B2 (en) | 2003-11-06 | 2010-05-18 | Applied Materials, Inc. | Methods and apparatus for enhanced operation of substrate carrier handlers |
US7218983B2 (en) | 2003-11-06 | 2007-05-15 | Applied Materials, Inc. | Method and apparatus for integrating large and small lot electronic device fabrication facilities |
TWI316044B (en) | 2004-02-28 | 2009-10-21 | Applied Materials Inc | Methods and apparatus for material control system interface |
US7274971B2 (en) | 2004-02-28 | 2007-09-25 | Applied Materials, Inc. | Methods and apparatus for electronic device manufacturing system monitoring and control |
TWI290875B (en) | 2004-02-28 | 2007-12-11 | Applied Materials Inc | Methods and apparatus for transferring a substrate carrier within an electronic device manufacturing facility |
DE102009058436A1 (de) | 2009-12-16 | 2011-01-20 | Siltronic Ag | Verfahren zur beidseitigen Politur einer Halbleiterscheibe |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2082255A5 (de) * | 1970-03-09 | 1971-12-10 | Barragan Jacques | |
DE2336735A1 (de) * | 1973-07-19 | 1975-02-06 | Licentia Gmbh | Verfahren zum herstellen eines poliermittels fuer halbleiteroberflaechen |
US4678119A (en) * | 1982-10-12 | 1987-07-07 | Buehler Ltd. | Abrasive slurry supply system for use in metallographic sample preparation |
KR930008856B1 (ko) * | 1991-05-15 | 1993-09-16 | 금성일렉트론 주식회사 | 혼합용액의 일정비율 혼합장치 |
TW402542B (en) * | 1994-10-24 | 2000-08-21 | Motorola Inc | Improvements in timing and location for mixing polishing fluid in a process of polishing a semiconductor substrate |
-
1997
- 1997-04-17 DE DE19715974A patent/DE19715974A1/de not_active Withdrawn
-
1998
- 1998-04-08 WO PCT/EP1998/002035 patent/WO1998047661A1/de active IP Right Grant
- 1998-04-08 JP JP54493098A patent/JP2001520589A/ja not_active Ceased
- 1998-04-08 DE DE59809935T patent/DE59809935D1/de not_active Expired - Fee Related
- 1998-04-08 AT AT98922664T patent/ATE251969T1/de not_active IP Right Cessation
- 1998-04-08 EP EP98922664A patent/EP1009589B1/de not_active Expired - Lifetime
- 1998-04-13 TW TW087105568A patent/TW392248B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW392248B (en) | 2000-06-01 |
EP1009589A1 (de) | 2000-06-21 |
WO1998047661A1 (de) | 1998-10-29 |
DE19715974A1 (de) | 1998-10-22 |
ATE251969T1 (de) | 2003-11-15 |
JP2001520589A (ja) | 2001-10-30 |
EP1009589B1 (de) | 2003-10-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: BASF AG, 67063 LUDWIGSHAFEN, DE |
|
8327 | Change in the person/name/address of the patent owner |
Owner name: BASF SE, 67063 LUDWIGSHAFEN, DE |
|
8339 | Ceased/non-payment of the annual fee |