DE4091247T1 - - Google Patents
Info
- Publication number
- DE4091247T1 DE4091247T1 DE19904091247 DE4091247T DE4091247T1 DE 4091247 T1 DE4091247 T1 DE 4091247T1 DE 19904091247 DE19904091247 DE 19904091247 DE 4091247 T DE4091247 T DE 4091247T DE 4091247 T1 DE4091247 T1 DE 4091247T1
- Authority
- DE
- Germany
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
- G01J9/0246—Measuring optical wavelength
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
- H01S3/08009—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/139—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1394—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length by using an active reference, e.g. second laser, klystron or other standard frequency source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/0014—Monitoring arrangements not otherwise provided for
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Lasers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1181680A JP2688991B2 (ja) | 1989-07-14 | 1989-07-14 | 狭帯域発振エキシマレーザ |
JP1208762A JP2614768B2 (ja) | 1989-08-11 | 1989-08-11 | 波長検出装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE4091247T1 true DE4091247T1 (sv) | 1992-04-23 |
Family
ID=26500765
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19904091247 Withdrawn DE4091247T1 (sv) | 1989-07-14 | 1990-07-12 |
Country Status (3)
Country | Link |
---|---|
CA (1) | CA2063600A1 (sv) |
DE (1) | DE4091247T1 (sv) |
WO (1) | WO1991001579A1 (sv) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4401131A1 (de) * | 1994-01-17 | 1995-07-20 | Lambda Physik Gmbh | Laser zur Erzeugung schmalbandiger Emission |
DE102004010825A1 (de) * | 2004-02-27 | 2005-04-21 | Zeiss Carl Smt Ag | Verfahren und Vorrichtung zur Kohärenzgradbestimmung von Strahlung |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI725827B (zh) * | 2020-04-24 | 2021-04-21 | 力晶積成電子製造股份有限公司 | 影像感測模組 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5120691A (ja) * | 1974-08-13 | 1976-02-19 | Mitsubishi Electric Corp | Reezahatsushinki |
US4016504A (en) * | 1976-04-12 | 1977-04-05 | Molectron Corporation | Optical beam expander for dye laser |
US4173442A (en) * | 1977-05-27 | 1979-11-06 | The United States Of America As Represented By The Secretary Of Commerce | Apparatus and method for determination of wavelength |
JPS6046837B2 (ja) * | 1980-03-11 | 1985-10-18 | 日本電気株式会社 | レ−ザ装置 |
US4601036A (en) * | 1982-09-30 | 1986-07-15 | Honeywell Inc. | Rapidly tunable laser |
JPS63107177A (ja) * | 1986-10-24 | 1988-05-12 | Komatsu Ltd | レ−ザ光の波長検出装置 |
JPH01183873A (ja) * | 1988-01-18 | 1989-07-21 | Mitsubishi Electric Corp | レーザ波長の安定化方法及び波長安定化レーザ装置 |
JP2649378B2 (ja) * | 1988-04-27 | 1997-09-03 | 株式会社小松製作所 | 狭帯域発振エキシマレーザの波長異常検出装置 |
US4942583A (en) * | 1988-06-17 | 1990-07-17 | Hewlett-Packard Company | Misalignment-tolerant, grating-tuned external-cavity laser |
JPH0244219A (ja) * | 1988-08-04 | 1990-02-14 | Matsushita Electric Ind Co Ltd | 波長検出装置 |
JPH02121380A (ja) * | 1988-10-29 | 1990-05-09 | Toshiba Corp | 狭帯域レーザ装置 |
-
1990
- 1990-07-12 CA CA 2063600 patent/CA2063600A1/en not_active Abandoned
- 1990-07-12 WO PCT/JP1990/000900 patent/WO1991001579A1/ja active Application Filing
- 1990-07-12 DE DE19904091247 patent/DE4091247T1/de not_active Withdrawn
Non-Patent Citations (4)
Title |
---|
Adam Hilger, Bristol and New York, 1989, S. 237-239 * |
DE-B.: "Laser", Hrsg. W. Kleen, R. Müller, Springer-Verlag 1969, S. 219-221 * |
Firmen Publikation: "Lambda Highlights", No. 12, ugust 1988, und No. 14, Dezember 1988, jeweils S. 1 u. 2 * |
GB-B.: "The Physics and Technology of Laser Resonators", Ed. D.R: Hall, P.E. Jackson * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4401131A1 (de) * | 1994-01-17 | 1995-07-20 | Lambda Physik Gmbh | Laser zur Erzeugung schmalbandiger Emission |
DE4401131C2 (de) * | 1994-01-17 | 2003-07-03 | Lambda Physik Ag | Laser zur Erzeugung schmalbandiger und abstimmbarer Emission |
DE102004010825A1 (de) * | 2004-02-27 | 2005-04-21 | Zeiss Carl Smt Ag | Verfahren und Vorrichtung zur Kohärenzgradbestimmung von Strahlung |
Also Published As
Publication number | Publication date |
---|---|
WO1991001579A1 (fr) | 1991-02-07 |
CA2063600A1 (en) | 1991-01-15 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8110 | Request for examination paragraph 44 | ||
8130 | Withdrawal |