DE3889236T2 - Photopolymerisierbare Zusammensetzung. - Google Patents

Photopolymerisierbare Zusammensetzung.

Info

Publication number
DE3889236T2
DE3889236T2 DE3889236T DE3889236T DE3889236T2 DE 3889236 T2 DE3889236 T2 DE 3889236T2 DE 3889236 T DE3889236 T DE 3889236T DE 3889236 T DE3889236 T DE 3889236T DE 3889236 T2 DE3889236 T2 DE 3889236T2
Authority
DE
Germany
Prior art keywords
photopolymerizable composition
improved
compositions
plasticizer
stripping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3889236T
Other languages
English (en)
Other versions
DE3889236D1 (de
Inventor
Marilyn Tate
Daniel Felix Varnell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Inc
Original Assignee
Hercules LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hercules LLC filed Critical Hercules LLC
Application granted granted Critical
Publication of DE3889236D1 publication Critical patent/DE3889236D1/de
Publication of DE3889236T2 publication Critical patent/DE3889236T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/0325—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polysaccharides, e.g. cellulose
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/112—Cellulosic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/113—Binder containing with plasticizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
DE3889236T 1987-02-06 1988-02-05 Photopolymerisierbare Zusammensetzung. Expired - Lifetime DE3889236T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB878702732A GB8702732D0 (en) 1987-02-06 1987-02-06 Photopolymerisable composition

Publications (2)

Publication Number Publication Date
DE3889236D1 DE3889236D1 (de) 1994-06-01
DE3889236T2 true DE3889236T2 (de) 1994-08-11

Family

ID=10611844

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3889236T Expired - Lifetime DE3889236T2 (de) 1987-02-06 1988-02-05 Photopolymerisierbare Zusammensetzung.

Country Status (8)

Country Link
US (1) US4855212A (de)
EP (1) EP0278691B1 (de)
AT (1) ATE105089T1 (de)
AU (1) AU597788B2 (de)
CA (1) CA1332528C (de)
DE (1) DE3889236T2 (de)
GB (1) GB8702732D0 (de)
MX (1) MX167748B (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5456905A (en) * 1988-08-23 1995-10-10 Ultraset Limited Partnership Quick-drying nail coating method and composition
US5435994A (en) * 1988-08-23 1995-07-25 Ultraset Limited Partnership Quick-drying nail coating method and composition
US5416181A (en) * 1989-02-10 1995-05-16 Penford Products Company Reinforced films made from water soluble polymers
DE69227982T2 (de) * 1991-11-01 1999-05-12 Macdermid Imaging Technology Carboxyl-Gruppen enthaltende Weichmacher in photopolymerisierbaren Trockenfilmzusammensetzungen
JP3641116B2 (ja) * 1997-10-14 2005-04-20 東京応化工業株式会社 サンドブラスト用感光性組成物及びそれを用いた感光性フィルム
JP2000066391A (ja) * 1998-08-17 2000-03-03 Tokyo Ohka Kogyo Co Ltd サンドブラスト用感光性組成物及びそれを用いた感光性フィルム
US7208260B2 (en) 1998-12-31 2007-04-24 Hynix Semiconductor Inc. Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same
JP3769171B2 (ja) * 2000-05-17 2006-04-19 東京応化工業株式会社 フレキソ印刷版製造用多層感光材料
JP3827196B2 (ja) 2001-05-01 2006-09-27 東京応化工業株式会社 感光性絶縁ペースト組成物及びそれを用いた感光性フィルム
US20040087687A1 (en) * 2002-10-30 2004-05-06 Vantico A&T Us Inc. Photocurable compositions with phosphite viscosity stabilizers
US7470386B2 (en) * 2004-04-26 2008-12-30 Sipix Imaging, Inc. Roll-to-roll embossing tools and processes
US7507525B2 (en) 2005-05-10 2009-03-24 Fujifilm Corporation Polymerizable composition and lithographic printing plate precursor
JP6284891B2 (ja) * 2015-02-26 2018-02-28 富士フイルム株式会社 タッチパネル電極保護膜形成用組成物、転写フィルム、透明積層体、タッチパネル用電極の保護膜及びその形成方法、静電容量型入力装置、並びに、画像表示装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2927023A (en) * 1956-08-27 1960-03-01 Du Pont Photopolymerizable compositions
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US3769023A (en) * 1971-05-07 1973-10-30 Horizons Inc Light sensitive reproduction and electron beam sensitive material
US3820993A (en) * 1971-05-07 1974-06-28 Horizons Research Inc Light sensitive reproduction and electron beam sensitive material
CA987159A (en) * 1972-03-10 1976-04-13 Hercules Incorporated Photopolymer composition
US4316951A (en) * 1975-06-03 1982-02-23 E. I. Du Pont De Nemours And Company Multilayer photosensitive element with solvent-soluble layer
US4065314A (en) * 1975-06-09 1977-12-27 The Richardson Company Photoreactive compositions comprising polymers containing alkoxyaromaticglyoxy groups
DE2953553T1 (de) * 1979-02-26 1982-03-25 Xidex Corp Contrast colorant for photopolymerizable compositions
US4228232A (en) * 1979-02-27 1980-10-14 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing ethylenically unsaturated oligomers
US4268610A (en) * 1979-11-05 1981-05-19 Hercules Incorporated Photoresist formulations
US4293635A (en) * 1980-05-27 1981-10-06 E. I. Du Pont De Nemours And Company Photopolymerizable composition with polymeric binder
JPS5971048A (ja) * 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物

Also Published As

Publication number Publication date
EP0278691A3 (en) 1990-03-07
AU597788B2 (en) 1990-06-07
GB8702732D0 (en) 1987-03-11
EP0278691B1 (de) 1994-04-27
US4855212A (en) 1989-08-08
EP0278691A2 (de) 1988-08-17
MX167748B (es) 1993-04-12
CA1332528C (en) 1994-10-18
ATE105089T1 (de) 1994-05-15
DE3889236D1 (de) 1994-06-01
AU1139188A (en) 1988-08-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MACDERMID IMAGING TECHNOLOGY INC., WATERBURY, CONN

8328 Change in the person/name/address of the agent

Free format text: KUHNEN, WACKER & PARTNER, PATENT- UND RECHTSANWAELTE, 85354 FREISING

8339 Ceased/non-payment of the annual fee
8370 Indication related to discontinuation of the patent is to be deleted