DE3879973T2 - Wasserloesliche lichtempfindliche kunststoffzusammensetzung, kunststoff und druckplatte daraus. - Google Patents

Wasserloesliche lichtempfindliche kunststoffzusammensetzung, kunststoff und druckplatte daraus.

Info

Publication number
DE3879973T2
DE3879973T2 DE8888300308T DE3879973T DE3879973T2 DE 3879973 T2 DE3879973 T2 DE 3879973T2 DE 8888300308 T DE8888300308 T DE 8888300308T DE 3879973 T DE3879973 T DE 3879973T DE 3879973 T2 DE3879973 T2 DE 3879973T2
Authority
DE
Germany
Prior art keywords
plastic
water
pressure plate
soluble light
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8888300308T
Other languages
English (en)
Other versions
DE3879973D1 (de
Inventor
Koichi Kimoto
Yasushi Umeda
Chitoshi Kawaguchi
Toshitaka Kawanami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP881287A external-priority patent/JPS63177129A/ja
Priority claimed from JP881087A external-priority patent/JPH0810328B2/ja
Priority claimed from JP881187A external-priority patent/JPH0810329B2/ja
Priority claimed from JP881387A external-priority patent/JPH0810330B2/ja
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Application granted granted Critical
Publication of DE3879973D1 publication Critical patent/DE3879973D1/de
Publication of DE3879973T2 publication Critical patent/DE3879973T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE8888300308T 1987-01-17 1988-01-15 Wasserloesliche lichtempfindliche kunststoffzusammensetzung, kunststoff und druckplatte daraus. Expired - Fee Related DE3879973T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP881287A JPS63177129A (ja) 1987-01-17 1987-01-17 感光性樹脂組成物
JP881087A JPH0810328B2 (ja) 1987-01-17 1987-01-17 感光性樹脂組成物
JP881187A JPH0810329B2 (ja) 1987-01-17 1987-01-17 感光性樹脂組成物
JP881387A JPH0810330B2 (ja) 1987-01-17 1987-01-17 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
DE3879973D1 DE3879973D1 (de) 1993-05-13
DE3879973T2 true DE3879973T2 (de) 1993-07-15

Family

ID=27455028

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8888300308T Expired - Fee Related DE3879973T2 (de) 1987-01-17 1988-01-15 Wasserloesliche lichtempfindliche kunststoffzusammensetzung, kunststoff und druckplatte daraus.

Country Status (6)

Country Link
US (1) US5100763A (de)
EP (1) EP0276092B1 (de)
AU (1) AU600546B2 (de)
CA (1) CA1332212C (de)
DE (1) DE3879973T2 (de)
NZ (1) NZ223178A (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NZ223177A (en) * 1987-01-17 1990-01-29 Nippon Paint Co Ltd Water-developable photosensitive resin composition capable of hot melt molding and printing plate therefrom
GB8716378D0 (en) * 1987-07-11 1987-08-19 Autotype Int Ltd Photopolymerisable compositions
US5225315A (en) * 1991-09-19 1993-07-06 Dymax Corporation Water soluble formulation for masking and the like, and method utilizing the same
DE4203608A1 (de) * 1992-02-07 1993-08-12 Basf Lacke & Farben Verfahren zur photochemischen oder mechanischen herstellung flexibler druckformen
US5998534A (en) * 1998-06-19 1999-12-07 Ppg Industries Ohio, Inc. Water-soluble or water-dispersible addition copolymer
JP3933576B2 (ja) * 2000-10-13 2007-06-20 旭化成ケミカルズ株式会社 感光性樹脂凸版の現像方法及び現像装置
CN106279478B (zh) * 2015-06-29 2019-09-27 中国石油化工股份有限公司 制备减阻剂用稳定剂和页岩气压裂用减阻剂及其制备方法
KR102054030B1 (ko) * 2015-10-19 2020-01-08 주식회사 엘지화학 수지 조성물 및 이를 이용하여 제조된 블랙뱅크를 포함하는 디스플레이 장치

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL219906A (de) * 1956-08-14
JPS56131609A (en) * 1980-03-21 1981-10-15 Nippon Synthetic Chem Ind Co Ltd:The Photocurable liquid resin composition
DE3274156D1 (en) * 1981-12-10 1986-12-11 Toray Industries Photosensitive polymer composition
US4427759A (en) * 1982-01-21 1984-01-24 E. I. Du Pont De Nemours And Company Process for preparing an overcoated photopolymer printing plate
US4622088A (en) * 1984-12-18 1986-11-11 E. I. Du Pont De Nemours And Company Process for preparing photopolymer flexographic element with melt extrusion coated elastomeric surface layer
JPS61217036A (ja) * 1985-03-22 1986-09-26 Kuraray Co Ltd 水溶性感光性組成物
DE3541162A1 (de) * 1985-11-21 1987-05-27 Basf Ag Photoempfindliche aufzeichnungsmaterialien mit elastomeren pfropfcopolymerisat-bindemitteln sowie reliefformen daraus
NZ223177A (en) * 1987-01-17 1990-01-29 Nippon Paint Co Ltd Water-developable photosensitive resin composition capable of hot melt molding and printing plate therefrom
GB8716378D0 (en) * 1987-07-11 1987-08-19 Autotype Int Ltd Photopolymerisable compositions

Also Published As

Publication number Publication date
EP0276092A3 (en) 1989-07-26
EP0276092B1 (de) 1993-04-07
CA1332212C (en) 1994-10-04
AU1031188A (en) 1988-07-21
DE3879973D1 (de) 1993-05-13
NZ223178A (en) 1990-01-29
AU600546B2 (en) 1990-08-16
US5100763A (en) 1992-03-31
EP0276092A2 (de) 1988-07-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee