DE3854283D1 - Direkt-abbildendes monochromatisches Elektronenmikroskop. - Google Patents

Direkt-abbildendes monochromatisches Elektronenmikroskop.

Info

Publication number
DE3854283D1
DE3854283D1 DE3854283T DE3854283T DE3854283D1 DE 3854283 D1 DE3854283 D1 DE 3854283D1 DE 3854283 T DE3854283 T DE 3854283T DE 3854283 T DE3854283 T DE 3854283T DE 3854283 D1 DE3854283 D1 DE 3854283D1
Authority
DE
Germany
Prior art keywords
electron microscope
direct imaging
monochromatic electron
imaging monochromatic
direct
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3854283T
Other languages
English (en)
Other versions
DE3854283T2 (de
Inventor
Robert L Gerlach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Revera Inc
Original Assignee
Physical Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Physical Electronics Inc filed Critical Physical Electronics Inc
Application granted granted Critical
Publication of DE3854283D1 publication Critical patent/DE3854283D1/de
Publication of DE3854283T2 publication Critical patent/DE3854283T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
DE3854283T 1987-06-05 1988-06-03 Direkt-abbildendes monochromatisches Elektronenmikroskop. Expired - Lifetime DE3854283T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/058,437 US4810880A (en) 1987-06-05 1987-06-05 Direct imaging monochromatic electron microscope

Publications (2)

Publication Number Publication Date
DE3854283D1 true DE3854283D1 (de) 1995-09-14
DE3854283T2 DE3854283T2 (de) 1996-01-11

Family

ID=22016798

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3854283T Expired - Lifetime DE3854283T2 (de) 1987-06-05 1988-06-03 Direkt-abbildendes monochromatisches Elektronenmikroskop.

Country Status (4)

Country Link
US (1) US4810880A (de)
EP (1) EP0293924B1 (de)
JP (1) JP2685501B2 (de)
DE (1) DE3854283T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4882487A (en) * 1987-06-05 1989-11-21 The Perkin-Elmer Corporation Direct imaging monochromatic electron microscope
JP2523781B2 (ja) * 1988-04-28 1996-08-14 日本電子株式会社 飛行時間型／偏向二重収束型切換質量分析装置
US5315113A (en) * 1992-09-29 1994-05-24 The Perkin-Elmer Corporation Scanning and high resolution x-ray photoelectron spectroscopy and imaging
US5444242A (en) * 1992-09-29 1995-08-22 Physical Electronics Inc. Scanning and high resolution electron spectroscopy and imaging
US5506414A (en) * 1993-03-26 1996-04-09 Fisons Plc Charged-particle analyzer
US6051839A (en) 1996-06-07 2000-04-18 Arch Development Corporation Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes
JP3715992B2 (ja) * 1996-09-24 2005-11-16 株式会社日立製作所 荷電粒子線照射装置
SG74599A1 (en) * 1997-09-27 2000-08-22 Inst Of Material Res & Enginee Portable high resolution scanning electron microscope column using permanent magnet electron lenses
US6252412B1 (en) * 1999-01-08 2001-06-26 Schlumberger Technologies, Inc. Method of detecting defects in patterned substrates
DE60143751D1 (de) * 2000-04-24 2011-02-10 Fei Co Sammeln von sekundärelektronen durch die objektivl
US7449682B2 (en) * 2001-10-26 2008-11-11 Revera Incorporated System and method for depth profiling and characterization of thin films
DE10252129A1 (de) 2002-11-04 2004-05-27 Omicron Nano Technology Gmbh Energiefilter für elektrisch geladene Teilchen und Verwendung des Energiefilters
US6800852B2 (en) * 2002-12-27 2004-10-05 Revera Incorporated Nondestructive characterization of thin films using measured basis spectra
US6891158B2 (en) * 2002-12-27 2005-05-10 Revera Incorporated Nondestructive characterization of thin films based on acquired spectrum
EP1517353B1 (de) * 2003-09-11 2008-06-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH System zur Verschmälerung der Energieverteilung eines Teilchenstrahls für ein Teichenstrahlsystem
ITVA20030037A1 (it) * 2003-10-07 2005-04-08 Stmicroelettronics Srl Spettroscopio elettronico con emissione di elettroni indotta da fascio elettronico monocromatico.
US7411188B2 (en) 2005-07-11 2008-08-12 Revera Incorporated Method and system for non-destructive distribution profiling of an element in a film
US8013298B2 (en) * 2008-07-14 2011-09-06 National University Of Singapore Electrostatic electron spectrometry apparatus
JP5934513B2 (ja) * 2012-02-09 2016-06-15 日本電子株式会社 透過電子顕微鏡
DE102014019408B4 (de) 2014-12-22 2017-02-09 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Abbildende Energiefiltervorrichtung und Verfahren zu deren Betrieb

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3617741A (en) * 1969-09-02 1971-11-02 Hewlett Packard Co Electron spectroscopy system with a multiple electrode electron lens
GB1332207A (en) * 1971-05-07 1973-10-03 Ass Elect Ind Apparatus for charged particle spectroscopy
US3822382A (en) * 1971-08-17 1974-07-02 Jeol Ltd Apparatus for analyzing electron energy
GB1395201A (en) * 1972-09-04 1975-05-21 Nat Res Dev Magnetic lenses
US3777159A (en) * 1972-11-09 1973-12-04 Hewlett Packard Co Parallel entry detector system
DE2331091C3 (de) * 1973-06-19 1980-03-20 Leybold-Heraeus Gmbh, 5000 Koeln Einrichtung zur Bestimmung der Energie geladener Teilchen
US4048498A (en) * 1976-09-01 1977-09-13 Physical Electronics Industries, Inc. Scanning auger microprobe with variable axial aperture
GB1594465A (en) * 1977-03-23 1981-07-30 Nat Res Dev Electron beam apparatus
DE3236273A1 (de) * 1982-09-30 1984-04-05 Siemens AG, 1000 Berlin und 8000 München Spektrometerobjektiv mit parallelen objektiv- und spektrometerfeldern fuer die potentialmesstechnik

Also Published As

Publication number Publication date
US4810880A (en) 1989-03-07
JP2685501B2 (ja) 1997-12-03
EP0293924A2 (de) 1988-12-07
DE3854283T2 (de) 1996-01-11
JPS63318052A (ja) 1988-12-26
EP0293924B1 (de) 1995-08-09
EP0293924A3 (en) 1990-02-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: HIGH VOLTAGE ENGINEERING CORP., WAKEFIELD, MASS.,

8327 Change in the person/name/address of the patent owner

Owner name: REVERA INC. (N.D,GES.D.STAATES DELAWARE), CHANHASS