DE3850941D1 - Vakuumbeschichtungsanlage. - Google Patents

Vakuumbeschichtungsanlage.

Info

Publication number
DE3850941D1
DE3850941D1 DE3850941T DE3850941T DE3850941D1 DE 3850941 D1 DE3850941 D1 DE 3850941D1 DE 3850941 T DE3850941 T DE 3850941T DE 3850941 T DE3850941 T DE 3850941T DE 3850941 D1 DE3850941 D1 DE 3850941D1
Authority
DE
Germany
Prior art keywords
coating system
vacuum coating
vacuum
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3850941T
Other languages
English (en)
Other versions
DE3850941T2 (de
Inventor
Shintarou Bell-Maison Hattori
Takayuki Takahagi
Akira Tore Research C Ishitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Original Assignee
Research Development Corp of Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP30842887A external-priority patent/JPH01222045A/ja
Priority claimed from JP30842787A external-priority patent/JPH0266162A/ja
Priority claimed from JP30842687A external-priority patent/JPH0266161A/ja
Application filed by Research Development Corp of Japan filed Critical Research Development Corp of Japan
Application granted granted Critical
Publication of DE3850941D1 publication Critical patent/DE3850941D1/de
Publication of DE3850941T2 publication Critical patent/DE3850941T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE3850941T 1987-12-04 1988-12-05 Vakuumbeschichtungsanlage. Expired - Fee Related DE3850941T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP30842887A JPH01222045A (ja) 1987-12-04 1987-12-04 真空蒸着装置
JP30842787A JPH0266162A (ja) 1987-12-04 1987-12-04 真空蒸着装置
JP30842687A JPH0266161A (ja) 1987-12-04 1987-12-04 真空蒸着装置

Publications (2)

Publication Number Publication Date
DE3850941D1 true DE3850941D1 (de) 1994-09-08
DE3850941T2 DE3850941T2 (de) 1994-12-01

Family

ID=27338963

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3850941T Expired - Fee Related DE3850941T2 (de) 1987-12-04 1988-12-05 Vakuumbeschichtungsanlage.

Country Status (3)

Country Link
US (1) US5007372A (de)
EP (1) EP0319347B1 (de)
DE (1) DE3850941T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH054943A (ja) * 1990-08-30 1993-01-14 Sagami Chem Res Center 光学活性β，δ−ジケト酸エステル及びその還元体
FR2695944B1 (fr) * 1992-09-24 1994-11-18 Onera (Off Nat Aerospatiale) Appareil de dépôt chimique en phase vapeur activé par un plasma micro-ondes.
EP0595159B1 (de) * 1992-10-26 1997-12-29 Schott Glaswerke Verfahren und Vorrichtung zur Beschichtung der Innenfläche stark gewölbter im wesentlichen kalottenförmiger Substrate mittels CVD
US5356836A (en) * 1993-08-19 1994-10-18 Industrial Technology Research Institute Aluminum plug process
US5424097A (en) * 1993-09-30 1995-06-13 Specialty Coating Systems, Inc. Continuous vapor deposition apparatus
JPH0897147A (ja) * 1994-09-29 1996-04-12 Mitsubishi Electric Corp エピタキシャル結晶成長装置
US5536321A (en) * 1995-10-27 1996-07-16 Specialty Coating Systems, Inc. Parylene deposition apparatus including a post-pyrolysis filtering chamber and a deposition chamber inlet filter
US5556473A (en) * 1995-10-27 1996-09-17 Specialty Coating Systems, Inc. Parylene deposition apparatus including dry vacuum pump system and downstream cold trap
US5879808A (en) * 1995-10-27 1999-03-09 Alpha Metals, Inc. Parylene polymer layers
DE19628102A1 (de) * 1996-07-12 1998-01-15 Bayerische Motoren Werke Ag Vakuumbeschichtungsanlage mit einer Beschichtungskammer und zumindest einer Quellenkammer
US5806319A (en) * 1997-03-13 1998-09-15 Wary; John Method and apparatus for cryogenically cooling a deposition chamber
US6051276A (en) * 1997-03-14 2000-04-18 Alpha Metals, Inc. Internally heated pyrolysis zone
US5841005A (en) * 1997-03-14 1998-11-24 Dolbier, Jr.; William R. Parylene AF4 synthesis
US6036821A (en) * 1998-01-29 2000-03-14 International Business Machines Corporation Enhanced collimated sputtering apparatus and its method of use
WO2011065998A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
WO2011065999A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
US9416778B2 (en) * 2011-04-15 2016-08-16 Rutgers, The State University Of New Jersey Self-gettering differential pump
JP2016084517A (ja) * 2014-10-28 2016-05-19 東京エレクトロン株式会社 原料ガス供給装置及び成膜装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4076866A (en) * 1975-03-30 1978-02-28 Massachusetts Institute Of Technology Method of growing films by flash vaporization
JPS5391573A (en) * 1977-01-21 1978-08-11 Mitsubishi Electric Corp Molecular-beam epitaxial growth equipment
FR2549857B1 (fr) * 1983-07-26 1985-10-04 Allovon Michel Dispositif d'evaporation sous vide
JPS60108400A (ja) * 1983-11-15 1985-06-13 Toshiba Corp 分子線結晶成長装置
FR2562099B1 (fr) * 1984-03-30 1986-06-20 Commissariat Energie Atomique Cellule d'evaporation d'un compose liquide adaptee a l'epitaxie par jets moleculaires
JPS60210595A (ja) * 1984-03-31 1985-10-23 Shimadzu Corp 粒子線エピタキシヤル装置のシヤツタ機構
JPS61161709A (ja) * 1985-01-11 1986-07-22 Hitachi Ltd 分子線エピタキシ装置
JPS63215036A (ja) * 1987-03-04 1988-09-07 Hitachi Ltd 化合物半導体成長装置および成長方法

Also Published As

Publication number Publication date
DE3850941T2 (de) 1994-12-01
US5007372A (en) 1991-04-16
EP0319347A2 (de) 1989-06-07
EP0319347B1 (de) 1994-08-03
EP0319347A3 (en) 1990-08-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee