DE3789061D1 - Ultraviolett absorbierendes polymer-material. - Google Patents

Ultraviolett absorbierendes polymer-material.

Info

Publication number
DE3789061D1
DE3789061D1 DE88900085T DE3789061T DE3789061D1 DE 3789061 D1 DE3789061 D1 DE 3789061D1 DE 88900085 T DE88900085 T DE 88900085T DE 3789061 T DE3789061 T DE 3789061T DE 3789061 D1 DE3789061 D1 DE 3789061D1
Authority
DE
Germany
Prior art keywords
polymer material
absorbing polymer
ultraviolet absorbing
ultraviolet
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE88900085T
Other languages
English (en)
Other versions
DE3789061T2 (de
Inventor
Toru Terumo Kabushik Takahashi
Takeshi Terumo Kabus Shimomura
Masataka Murahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Terumo Corp
Original Assignee
Terumo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP21195787A external-priority patent/JPS63314218A/ja
Application filed by Terumo Corp filed Critical Terumo Corp
Publication of DE3789061D1 publication Critical patent/DE3789061D1/de
Application granted granted Critical
Publication of DE3789061T2 publication Critical patent/DE3789061T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155—Organic compounds therefor
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F246/00—Copolymers in which the nature of only the monomers in minority is defined
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/16—X-ray, infrared, or ultraviolet ray processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE3789061T 1986-12-09 1987-12-09 Ultraviolett absorbierendes polymer-material. Expired - Fee Related DE3789061T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP29147586 1986-12-09
JP1993887 1987-01-30
JP21195787A JPS63314218A (ja) 1986-12-09 1987-08-26 紫外線吸収高分子材料
PCT/JP1987/000954 WO1988004306A1 (en) 1986-12-09 1987-12-09 Ultraviolet-absorptive polymer material

Publications (2)

Publication Number Publication Date
DE3789061D1 true DE3789061D1 (de) 1994-03-24
DE3789061T2 DE3789061T2 (de) 1994-06-09

Family

ID=27282826

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3789061T Expired - Fee Related DE3789061T2 (de) 1986-12-09 1987-12-09 Ultraviolett absorbierendes polymer-material.

Country Status (3)

Country Link
EP (1) EP0343246B1 (de)
DE (1) DE3789061T2 (de)
WO (1) WO1988004306A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4961167A (en) * 1988-08-26 1990-10-02 Mitsubishi Denki Kabushiki Kaisha Substrate bias generator in a dynamic random access memory with auto/self refresh functions and a method of generating a substrate bias therein
JP2729850B2 (ja) * 1990-05-15 1998-03-18 富士写真フイルム株式会社 画像形成層
JP5544239B2 (ja) 2010-07-29 2014-07-09 富士フイルム株式会社 重合性組成物
CN110003377B (zh) * 2019-03-20 2021-01-12 深圳大学 聚合物及其制备方法及应用

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51851B1 (de) * 1970-03-09 1976-01-12
US4380643A (en) * 1981-08-24 1983-04-19 Asahi Glass Company, Ltd. Benzotriazole compound and homopolymer or copolymers thereof
JPS58111942A (ja) * 1981-12-25 1983-07-04 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JPS58163617A (ja) * 1982-03-24 1983-09-28 Fukui Kikai Kk 樹脂成形用プレス
JPS58178351A (ja) * 1982-04-14 1983-10-19 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
DE3312611A1 (de) * 1983-04-08 1984-10-11 Röhm GmbH, 6100 Darmstadt Verfahren zur herstellung uv-geschuetzter mehrschichtiger kunststoff-formkoerper
NZ208751A (en) * 1983-07-11 1987-04-30 Iolab Corp 2-hydroxy-5-acrylyloxyalkylphenyl-2h-benzotriazole derivatives and polymers and copolymers thereof and use as uv absorbing additives in polymer compositions
GB8501563D0 (en) * 1985-01-22 1985-02-20 Kodak Ltd Uv-absorbing polymers

Also Published As

Publication number Publication date
EP0343246A1 (de) 1989-11-29
DE3789061T2 (de) 1994-06-09
WO1988004306A1 (en) 1988-06-16
EP0343246B1 (de) 1994-02-09
EP0343246A4 (de) 1990-05-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee