DE3786699D1 - System zur untersuchung von mustern. - Google Patents

System zur untersuchung von mustern.

Info

Publication number
DE3786699D1
DE3786699D1 DE8787401052T DE3786699T DE3786699D1 DE 3786699 D1 DE3786699 D1 DE 3786699D1 DE 8787401052 T DE8787401052 T DE 8787401052T DE 3786699 T DE3786699 T DE 3786699T DE 3786699 D1 DE3786699 D1 DE 3786699D1
Authority
DE
Germany
Prior art keywords
examining patterns
examining
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787401052T
Other languages
English (en)
Other versions
DE3786699T2 (de
Inventor
Satoshi Iwata
Moritoshi Ando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP61107407A external-priority patent/JPS62263404A/ja
Priority claimed from JP61142940A external-priority patent/JPS62299710A/ja
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE3786699D1 publication Critical patent/DE3786699D1/de
Application granted granted Critical
Publication of DE3786699T2 publication Critical patent/DE3786699T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/0006—Industrial image inspection using a design-rule based approach
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G01N2021/95615—Inspecting patterns on the surface of objects using a comparative method with stored comparision signal
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30172—Centreline of tubular or elongated structure

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Image Processing (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
DE87401052T 1986-05-10 1987-05-07 System zur Untersuchung von Mustern. Expired - Fee Related DE3786699T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP61107407A JPS62263404A (ja) 1986-05-10 1986-05-10 パタ−ン検査装置
JP61142940A JPS62299710A (ja) 1986-06-20 1986-06-20 パタ−ン検査装置

Publications (2)

Publication Number Publication Date
DE3786699D1 true DE3786699D1 (de) 1993-09-02
DE3786699T2 DE3786699T2 (de) 1993-11-11

Family

ID=26447447

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87401052T Expired - Fee Related DE3786699T2 (de) 1986-05-10 1987-05-07 System zur Untersuchung von Mustern.

Country Status (3)

Country Link
US (1) US4830497A (de)
EP (1) EP0246145B1 (de)
DE (1) DE3786699T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01111281A (ja) * 1987-10-23 1989-04-27 Matsushita Electric Ind Co Ltd 部品認識方法
JPH0727725Y2 (ja) * 1988-11-18 1995-06-21 富士ゼロックス株式会社 画像編集装置
US5157762A (en) * 1990-04-10 1992-10-20 Gerber Systems Corporation Method and apparatus for providing a three state data base for use with automatic optical inspection systems
JP2696000B2 (ja) * 1991-02-08 1998-01-14 大日本スクリーン製造株式会社 プリント基板のパターン検査方法
US5448650A (en) * 1992-04-30 1995-09-05 International Business Machines Corporation Thin-film latent open optical detection with template-based feature extraction
DE69331433T2 (de) * 1992-10-22 2002-10-02 Advanced Interconnection Tech Einrichtung zur automatischen optischen Prüfung von Leiterplatten mit darin verlegten Drähten
US6072897A (en) * 1997-09-18 2000-06-06 Applied Materials, Inc. Dimension error detection in object
DE19825829C2 (de) * 1998-06-10 2000-07-27 Leica Microsystems Verfahren zur Bestimmung des Abstandes P einer Kante eines Strukturelementes auf einem Substrat
JP4071866B2 (ja) * 1998-07-31 2008-04-02 イビデン株式会社 配線パターン検査装置
IL133313A (en) * 1999-12-05 2004-12-15 Orbotech Ltd Adaptive tolerance reference inspection system
US7177458B1 (en) * 2000-09-10 2007-02-13 Orbotech Ltd. Reduction of false alarms in PCB inspection
US8588511B2 (en) * 2002-05-22 2013-11-19 Cognex Corporation Method and apparatus for automatic measurement of pad geometry and inspection thereof
JP4261466B2 (ja) * 2004-11-17 2009-04-30 株式会社日立製作所 自律移動装置、並びに物体及び自己位置検出システム
US11222160B2 (en) * 2019-06-07 2022-01-11 Synopsys, Inc. Mask rule checking for curvilinear masks for electronic circuits

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4661984A (en) * 1977-06-03 1987-04-28 Bentley William A Line inspection system
EP0054596B1 (de) * 1980-12-18 1985-05-29 International Business Machines Corporation Verfahren für die Inspektion und die automatische Sortierung von Objekten, die Konfigurationen mit dimensionellen Toleranzen aufweisen und platzabhängige Kriterien für die Verwerfung, Anlage und Schaltung dafür
US4500202A (en) * 1982-05-24 1985-02-19 Itek Corporation Printed circuit board defect detection of detecting maximum line width violations
US4578810A (en) * 1983-08-08 1986-03-25 Itek Corporation System for printed circuit board defect detection

Also Published As

Publication number Publication date
EP0246145A2 (de) 1987-11-19
EP0246145A3 (en) 1990-01-24
DE3786699T2 (de) 1993-11-11
EP0246145B1 (de) 1993-07-28
US4830497A (en) 1989-05-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee