DE3765520D1 - Kapillare aus siliziumkarbid. - Google Patents
Kapillare aus siliziumkarbid.Info
- Publication number
- DE3765520D1 DE3765520D1 DE8787116794T DE3765520T DE3765520D1 DE 3765520 D1 DE3765520 D1 DE 3765520D1 DE 8787116794 T DE8787116794 T DE 8787116794T DE 3765520 T DE3765520 T DE 3765520T DE 3765520 D1 DE3765520 D1 DE 3765520D1
- Authority
- DE
- Germany
- Prior art keywords
- capillar
- silicon carbide
- carbide
- silicon
- carbide capillar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title 1
- 229910010271 silicon carbide Inorganic materials 0.000 title 1
Classifications
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- H—ELECTRICITY
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- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
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- H01L24/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/002—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating specially adapted for particular articles or work
- B23K20/004—Wire welding
- B23K20/005—Capillary welding
- B23K20/007—Ball bonding
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
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Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical Vapour Deposition (AREA)
- Wire Bonding (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/933,007 US4772498A (en) | 1986-11-20 | 1986-11-20 | Silicon carbide capillaries |
Publications (1)
Publication Number | Publication Date |
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DE3765520D1 true DE3765520D1 (de) | 1990-11-15 |
Family
ID=25463276
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8787116794T Expired - Lifetime DE3765520D1 (de) | 1986-11-20 | 1987-11-13 | Kapillare aus siliziumkarbid. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4772498A (de) |
EP (1) | EP0268230B1 (de) |
JP (1) | JPS63137445A (de) |
KR (1) | KR880006770A (de) |
DE (1) | DE3765520D1 (de) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4978567A (en) * | 1988-03-31 | 1990-12-18 | Materials Technology Corporation, Subsidiary Of The Carbon/Graphite Group, Inc. | Wafer holding fixture for chemical reaction processes in rapid thermal processing equipment and method for making same |
GB9104984D0 (en) * | 1991-03-08 | 1991-04-24 | De Beers Ind Diamond | Lead bonding tool |
GB2285943B (en) * | 1994-01-28 | 1996-09-11 | Hewlett Packard Co | Bonding tool for electronic device |
US5605274A (en) * | 1995-11-13 | 1997-02-25 | General Motors Corporation | Controlled atmosphere braze furnace with free part entry |
US6180891B1 (en) | 1997-02-26 | 2001-01-30 | International Business Machines Corporation | Control of size and heat affected zone for fine pitch wire bonding |
US6651864B2 (en) * | 1999-02-25 | 2003-11-25 | Steven Frederick Reiber | Dissipative ceramic bonding tool tip |
US7124927B2 (en) * | 1999-02-25 | 2006-10-24 | Reiber Steven F | Flip chip bonding tool and ball placement capillary |
US7032802B2 (en) * | 1999-02-25 | 2006-04-25 | Reiber Steven F | Bonding tool with resistance |
US7389905B2 (en) | 1999-02-25 | 2008-06-24 | Reiber Steven F | Flip chip bonding tool tip |
US20060071050A1 (en) * | 1999-02-25 | 2006-04-06 | Reiber Steven F | Multi-head tab bonding tool |
US20080197172A1 (en) * | 1999-02-25 | 2008-08-21 | Reiber Steven F | Bonding Tool |
US20070131661A1 (en) * | 1999-02-25 | 2007-06-14 | Reiber Steven F | Solder ball placement system |
US20060261132A1 (en) * | 1999-02-25 | 2006-11-23 | Reiber Steven F | Low range bonding tool |
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JP2002047066A (ja) * | 2000-08-02 | 2002-02-12 | Tokai Carbon Co Ltd | SiC成形体およびその製造方法 |
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US7320425B2 (en) * | 2004-05-12 | 2008-01-22 | Kulicke And Soffa Industries, Inc. | Low-profile capillary for wire bonding |
US20060060145A1 (en) | 2004-09-17 | 2006-03-23 | Van Den Berg Jannes R | Susceptor with surface roughness for high temperature substrate processing |
US20060065634A1 (en) * | 2004-09-17 | 2006-03-30 | Van Den Berg Jannes R | Low temperature susceptor cleaning |
US20070085085A1 (en) * | 2005-08-08 | 2007-04-19 | Reiber Steven F | Dissipative pick and place tools for light wire and LED displays |
US20080197461A1 (en) * | 2007-02-15 | 2008-08-21 | Taiwan Semiconductor Manufacturing Co.,Ltd. | Apparatus for wire bonding and integrated circuit chip package |
US20080265005A1 (en) * | 2007-04-30 | 2008-10-30 | United Technologies Corporation | Brazing process incorporating graphitic preforms |
JP5153826B2 (ja) * | 2010-05-17 | 2013-02-27 | 日本ピラー工業株式会社 | 超純水用の炭化珪素質摺動部材 |
CN104619881A (zh) * | 2012-08-17 | 2015-05-13 | 株式会社Ihi | 耐热复合材料的制造方法及制造装置 |
US9165904B1 (en) * | 2014-06-17 | 2015-10-20 | Freescale Semiconductor, Inc. | Insulated wire bonding with EFO before second bond |
EP4379770A2 (de) * | 2015-02-06 | 2024-06-05 | Purdue Research Foundation | Sonden, systeme und kartuschen |
KR20180132545A (ko) | 2017-06-02 | 2018-12-12 | (주) 디에스테크노 | 식각 특성이 향상된 화학기상증착 실리콘 카바이드 벌크 |
KR20220008393A (ko) | 2018-06-01 | 2022-01-20 | (주) 디에스테크노 | 식각 특성이 향상된 화학기상증착 실리콘 카바이드 벌크 |
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US3472443A (en) * | 1966-04-12 | 1969-10-14 | Fansteel Inc | Weld tip guide and apparatus |
US4171477A (en) * | 1976-03-16 | 1979-10-16 | International Business Machines Corporation | Micro-surface welding |
US4427445A (en) * | 1981-08-03 | 1984-01-24 | Dart Industries, Inc. | Tungsten alloys containing A15 structure and method for making same |
US4515860A (en) * | 1982-09-10 | 1985-05-07 | Dart Industries Inc. | Self protecting carbon bodies and method for making same |
US4581295A (en) * | 1984-03-13 | 1986-04-08 | Aluminum Company Of America | Refractory assembly for containment of molten Al-Li alloys |
GB2165178A (en) * | 1984-10-05 | 1986-04-09 | Hitachi Ltd | Method and apparatus for wire bonding |
-
1986
- 1986-11-20 US US06/933,007 patent/US4772498A/en not_active Expired - Fee Related
-
1987
- 1987-11-13 DE DE8787116794T patent/DE3765520D1/de not_active Expired - Lifetime
- 1987-11-13 EP EP19870116794 patent/EP0268230B1/de not_active Expired - Lifetime
- 1987-11-17 JP JP62290448A patent/JPS63137445A/ja active Pending
- 1987-11-20 KR KR870013070A patent/KR880006770A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP0268230A3 (en) | 1988-08-31 |
EP0268230A2 (de) | 1988-05-25 |
EP0268230B1 (de) | 1990-10-10 |
US4772498A (en) | 1988-09-20 |
JPS63137445A (ja) | 1988-06-09 |
KR880006770A (ko) | 1988-07-25 |
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