DE3760291D1 - Printing plate - Google Patents

Printing plate

Info

Publication number
DE3760291D1
DE3760291D1 DE8787303167T DE3760291T DE3760291D1 DE 3760291 D1 DE3760291 D1 DE 3760291D1 DE 8787303167 T DE8787303167 T DE 8787303167T DE 3760291 T DE3760291 T DE 3760291T DE 3760291 D1 DE3760291 D1 DE 3760291D1
Authority
DE
Germany
Prior art keywords
printing plate
printing
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8787303167T
Other languages
English (en)
Inventor
Yoichi Mori
Shigeo Abiko
Mikio Tsuda
Chikara Ichijo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP12127786A external-priority patent/JPH0682212B2/ja
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Application granted granted Critical
Publication of DE3760291D1 publication Critical patent/DE3760291D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE8787303167T 1986-04-11 1987-04-10 Printing plate Expired DE3760291D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8224486 1986-04-11
JP12127786A JPH0682212B2 (ja) 1986-05-28 1986-05-28 水なし平版印刷用原版

Publications (1)

Publication Number Publication Date
DE3760291D1 true DE3760291D1 (en) 1989-08-03

Family

ID=26423260

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787303167T Expired DE3760291D1 (en) 1986-04-11 1987-04-10 Printing plate

Country Status (4)

Country Link
US (1) US4853313A (de)
EP (1) EP0242143B1 (de)
CA (1) CA1321315C (de)
DE (1) DE3760291D1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3715792A1 (de) * 1987-05-12 1988-11-24 Hoechst Ag Entwickler fuer wasserlos druckende offsetplatten
JPH02282258A (ja) * 1989-04-24 1990-11-19 Mitsubishi Kasei Corp 湿し水不要感光性平版印刷版
US5232813A (en) * 1990-01-31 1993-08-03 Fuji Photo Film Co., Ltd. Ps plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer
US5212048A (en) * 1990-11-21 1993-05-18 Presstek, Inc. Silicone coating formulations and planographic printing plates made therewith
DE4106357A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit 2-diazo-1,3-dicarbonyl-gruppen, verfahren zu deren herstellung und verwendung in einem positiv arbeitenden aufzeichnungsmaterial
DE4106356A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial
DE4426820A1 (de) * 1993-07-29 1995-02-02 Fuji Photo Film Co Ltd Bilderzeugungsmaterial und Bilderzeugungsverfahren
US5866294A (en) * 1993-10-26 1999-02-02 Toray Industries, Inc. Water-less quinonediazide lithographic raw plate
AU680700B2 (en) * 1993-10-26 1997-08-07 Toray Industries, Inc. Dry lithographic forme
GB9426204D0 (en) * 1994-12-23 1995-02-22 Horsell Plc Production of water-less lithographic plates
JPH09136398A (ja) 1995-10-02 1997-05-27 Howard W Demoore あらゆる輪転オフセット印刷機の第１の印刷ユニット又はそれに続くいずれかの印刷ユニットの湿し装置側から版胴及びブランケット胴上で同時に作動可能な引込み式印刷／コーティングユニット
US5651316A (en) 1995-10-02 1997-07-29 Howard W. DeMoore Retractable printing/coating unit operable on the plate and blanket cylinders simultaneously from the dampener side of the first printing unit or any consecutive printing unit of any rotary offset printing press
US5598777A (en) 1995-10-02 1997-02-04 Howard W. DeMoore Retractable printing/coating unit operable on the plate and blanket cylinders
CA2319125C (en) 1998-01-23 2004-07-13 Presstek, Inc. Laser-imageable printing members for wet lithographic printing
EP0938028A1 (de) * 1998-02-24 1999-08-25 Toray Industries, Inc. Druckplatten-Vorstufe für feuchtwasserfreie Flachdruckplatten
US6045963A (en) * 1998-03-17 2000-04-04 Kodak Polychrome Graphics Llc Negative-working dry planographic printing plate
EP1030784B1 (de) * 1998-09-21 2003-11-19 Presstek, INC. Lithographische druckplatten zum gebrauch in einem laser-bilderzeugungsgerät
DE19908528A1 (de) * 1999-02-26 2000-08-31 Agfa Gevaert Ag Strahlungsempfindliches Aufzeichnungsmaterial zur Herstellung von Wasserlos-Offsetdruckplatten
US6186067B1 (en) * 1999-09-30 2001-02-13 Presstek, Inc. Infrared laser-imageable lithographic printing members and methods of preparing and imaging such printing members
US6656661B2 (en) 2001-04-04 2003-12-02 Kodak Polychrome Graphics, Llc Waterless imageable element with crosslinked silicone layer
PL2416218T3 (pl) 2009-03-31 2014-07-31 Toray Industries Prekursor do bezwodnej litograficznej formy drukowej o bezpośrednim typie drukowania i sposób jego wytwarzania
JP5274599B2 (ja) * 2011-02-22 2013-08-28 富士フイルム株式会社 レーザー彫刻用レリーフ印刷版原版及びその製造方法、並びに、レリーフ印刷版及びその製版方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE564617A (de) * 1957-02-07
US3466172A (en) * 1967-01-13 1969-09-09 Ibm Method of using photographic vesicular and diazo films having diazo antihalation layers
DE1597597A1 (de) * 1967-09-14 1970-09-24 Wilhelm Guckert Verfahren zur Reduzierung der Unterstrahlungseffekte bei Kopierverfahren der graphischen Technik,insbesondere im Hinblick auf lichtempfindliche Schichten,die auf metallische Oberflaechen (Offsetdruckplatten- und Folien,Metallplatten fuer die Herstellung von Hochdruckklischees,kupferkaschiertes Isolationsm
BE755709A (fr) * 1969-10-29 1971-02-15 Shipley Co Procede d'application d'une reserve photographique sur un support et produit obtenu
US3728123A (en) * 1969-11-14 1973-04-17 Scott Paper Co Plate for dry planography
JPS5421089B2 (de) * 1973-05-29 1979-07-27
SU511560A1 (ru) * 1974-12-30 1976-04-25 Предприятие П/Я А-7850 Позитивный фоторезистор
GB2034911B (en) * 1978-10-26 1983-02-09 Toray Industries Dry planographic printing plate
SU773565A1 (ru) * 1979-01-23 1980-10-23 Всесоюзный научно-исследовательский и проектный институт химической промышленности Фотополимерна печатна форма
US4210569A (en) * 1979-03-19 1980-07-01 Bernatsek Vladislav V Polymeric adhesive antihalation composition for making metal-backed photopolymeric printing forms
FR2455305A1 (fr) * 1979-04-24 1980-11-21 Uk Poligrafichesky Instit Composition adhesive antihalo pour la preparation de cliches en photopolymeres sur supports metalliques
FR2457512A1 (fr) * 1979-05-22 1980-12-19 Uk Poligrafichesky Instit Composition adhesive-antihalo pour la preparation de cliches en photopolymeres sur supports metalliques
US4342820A (en) * 1980-12-10 1982-08-03 Toray Industries, Inc. Dry planographic printing plate and preparation thereof
JPS58133108A (ja) * 1982-01-30 1983-08-08 株式会社フジクラ ストレスコ−ンの切削方法
US4414314A (en) * 1982-02-26 1983-11-08 International Business Machines Corporation Resolution in optical lithography
JPS5917552A (ja) * 1982-07-21 1984-01-28 Toray Ind Inc 画像形成用積層体の処理方法
JPS5969751A (ja) * 1982-10-15 1984-04-20 Toray Ind Inc 画像形成用積層体および画像形成用積層体を用いる画像形成方法
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
JPS59226346A (ja) * 1983-06-07 1984-12-19 Fuotopori Ouka Kk プリント回路の製造方法
JPS60169852A (ja) * 1984-02-14 1985-09-03 Fuji Photo Film Co Ltd 湿し水不要ネガ型感光性平版印刷版の製版法
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive

Also Published As

Publication number Publication date
EP0242143A2 (de) 1987-10-21
EP0242143A3 (en) 1987-11-25
EP0242143B1 (de) 1989-06-28
CA1321315C (en) 1993-08-17
US4853313A (en) 1989-08-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition