DE3726686A1 - Elektrophotographisches aufzeichnungsmaterial - Google Patents

Elektrophotographisches aufzeichnungsmaterial

Info

Publication number
DE3726686A1
DE3726686A1 DE19873726686 DE3726686A DE3726686A1 DE 3726686 A1 DE3726686 A1 DE 3726686A1 DE 19873726686 DE19873726686 DE 19873726686 DE 3726686 A DE3726686 A DE 3726686A DE 3726686 A1 DE3726686 A1 DE 3726686A1
Authority
DE
Germany
Prior art keywords
layer
recording material
material according
thin
sic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19873726686
Other languages
German (de)
English (en)
Other versions
DE3726686C2 (enExample
Inventor
Shuji Yoshizawa
Tatsuya Ikezue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Intelligent Technology Co Ltd
Original Assignee
Toshiba Corp
Toshiba Automation Equipment Engineering Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP18832086A external-priority patent/JPS6343161A/ja
Priority claimed from JP18831986A external-priority patent/JPS6343160A/ja
Priority claimed from JP22799786A external-priority patent/JPS6383730A/ja
Application filed by Toshiba Corp, Toshiba Automation Equipment Engineering Ltd filed Critical Toshiba Corp
Publication of DE3726686A1 publication Critical patent/DE3726686A1/de
Application granted granted Critical
Publication of DE3726686C2 publication Critical patent/DE3726686C2/de
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08214—Silicon-based

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)
DE19873726686 1986-08-11 1987-08-11 Elektrophotographisches aufzeichnungsmaterial Granted DE3726686A1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP18832086A JPS6343161A (ja) 1986-08-11 1986-08-11 電子写真感光体
JP18831986A JPS6343160A (ja) 1986-08-11 1986-08-11 電子写真感光体
JP22799786A JPS6383730A (ja) 1986-09-29 1986-09-29 電子写真感光体

Publications (2)

Publication Number Publication Date
DE3726686A1 true DE3726686A1 (de) 1988-03-03
DE3726686C2 DE3726686C2 (enExample) 1990-02-01

Family

ID=27326023

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19873726686 Granted DE3726686A1 (de) 1986-08-11 1987-08-11 Elektrophotographisches aufzeichnungsmaterial

Country Status (2)

Country Link
US (1) US4804605A (enExample)
DE (1) DE3726686A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5610737A (en) * 1994-03-07 1997-03-11 Kabushiki Kaisha Toshiba Thin film transistor with source and drain regions having two semiconductor layers, one being fine crystalline silicon
DE19935046C2 (de) 1999-07-26 2001-07-12 Schott Glas Plasma-CVD-Verfahren und Vorrichtung zur Herstellung einer mikrokristallinen Si:H-Schicht auf einem Substrat sowie deren Verwendung
GB2464937B (en) * 2008-10-29 2013-06-19 Anna Goldsmith Improvements relating to stabilization of the supine lying posture

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0066812A2 (en) * 1981-05-29 1982-12-15 Kabushiki Kaisha Toshiba Electrophotographic photosensitive member
DE3525359A1 (de) * 1984-07-16 1986-01-16 Minolta Camera K.K., Osaka Lichtempfindliches element

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4492810A (en) * 1978-03-08 1985-01-08 Sovonics Solar Systems Optimized doped and band gap adjusted photoresponsive amorphous alloys and devices
JPH067270B2 (ja) * 1983-12-16 1994-01-26 株式会社日立製作所 電子写真用感光体
DE3546544C2 (enExample) * 1984-02-28 1990-02-15 Sharp K.K., Osaka, Jp
US4701395A (en) * 1985-05-20 1987-10-20 Exxon Research And Engineering Company Amorphous photoreceptor with high sensitivity to long wavelengths
US4642413A (en) * 1985-10-11 1987-02-10 Energy Conversion Devices, Inc. Power generating optical filter
JPH0772803B2 (ja) * 1986-01-10 1995-08-02 株式会社東芝 電子写真感光体
US4720444A (en) * 1986-07-31 1988-01-19 Xerox Corporation Layered amorphous silicon alloy photoconductive electrostatographic imaging members with p, n multijunctions

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0066812A2 (en) * 1981-05-29 1982-12-15 Kabushiki Kaisha Toshiba Electrophotographic photosensitive member
DE3525359A1 (de) * 1984-07-16 1986-01-16 Minolta Camera K.K., Osaka Lichtempfindliches element

Also Published As

Publication number Publication date
DE3726686C2 (enExample) 1990-02-01
US4804605A (en) 1989-02-14

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee