DE3683396D1 - Polyimidbildschicht, lichtempfindliche polyimidsaeurederivat und elektrophoretische anzeigezelle. - Google Patents

Polyimidbildschicht, lichtempfindliche polyimidsaeurederivat und elektrophoretische anzeigezelle.

Info

Publication number
DE3683396D1
DE3683396D1 DE8686200758T DE3683396T DE3683396D1 DE 3683396 D1 DE3683396 D1 DE 3683396D1 DE 8686200758 T DE8686200758 T DE 8686200758T DE 3683396 T DE3683396 T DE 3683396T DE 3683396 D1 DE3683396 D1 DE 3683396D1
Authority
DE
Germany
Prior art keywords
polyimide
light
acid derivative
electrophoretic display
image layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686200758T
Other languages
English (en)
Inventor
Der Zande Johan Maria Van
Lourens Minnema
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3683396D1 publication Critical patent/DE3683396D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003—Preparatory processes
    • C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • C08G73/1025—Preparatory processes from tetracarboxylic acids or derivatives and diamines polymerised by radiations
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0102—Constructional details, not otherwise provided for in this subclass
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/166—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect
    • G02F1/167—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect by electrophoresis
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/1675—Constructional details
    • G02F1/16756—Insulating layers

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Electrochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Molecular Biology (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polyamides (AREA)
DE8686200758T 1985-05-08 1986-05-02 Polyimidbildschicht, lichtempfindliche polyimidsaeurederivat und elektrophoretische anzeigezelle. Expired - Lifetime DE3683396D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8501304 1985-05-08

Publications (1)

Publication Number Publication Date
DE3683396D1 true DE3683396D1 (de) 1992-02-27

Family

ID=19845945

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686200758T Expired - Lifetime DE3683396D1 (de) 1985-05-08 1986-05-02 Polyimidbildschicht, lichtempfindliche polyimidsaeurederivat und elektrophoretische anzeigezelle.

Country Status (4)

Country Link
US (1) US4741988A (de)
EP (1) EP0202705B1 (de)
JP (1) JPH0830827B2 (de)
DE (1) DE3683396D1 (de)

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US5124238A (en) * 1988-09-06 1992-06-23 The Boeing Company Fabrication of microelectronics using photosensitive polyimides
JP2666985B2 (ja) * 1988-10-27 1997-10-22 株式会社シャンソン化粧品本舗 化粧料充填用容器
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US5053318A (en) * 1989-05-18 1991-10-01 Shipley Company Inc. Plasma processing with metal mask integration
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US5006488A (en) * 1989-10-06 1991-04-09 International Business Machines Corporation High temperature lift-off process
US5242551A (en) * 1991-03-28 1993-09-07 International Business Machines Corporation Electron induced transformation of an isoimide to an n-imide and uses thereof
US5177181A (en) * 1991-06-06 1993-01-05 Occidental Chemical Corporation Diamines and photosensitive polyimides made therefrom
JP2814442B2 (ja) * 1991-10-25 1998-10-22 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性ポリイミドプリカーサー組成物
FI93680C (fi) * 1992-05-07 1995-05-10 Outokumpu Instr Oy Ohutkalvon tukirakenne ja menetelmä sen valmistamiseksi
WO1996022597A1 (fr) * 1995-01-17 1996-07-25 Nippon Steel Chemical Co., Ltd. Stratifie
US6337761B1 (en) * 1999-10-01 2002-01-08 Lucent Technologies Inc. Electrophoretic display and method of making the same
US6930818B1 (en) * 2000-03-03 2005-08-16 Sipix Imaging, Inc. Electrophoretic display and novel process for its manufacture
US6672921B1 (en) * 2000-03-03 2004-01-06 Sipix Imaging, Inc. Manufacturing process for electrophoretic display
US6933098B2 (en) 2000-01-11 2005-08-23 Sipix Imaging Inc. Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
US6377757B2 (en) * 2000-01-31 2002-04-23 Minolta Co., Ltd. Image display method, image forming apparatus and reversible image display medium
US7557981B2 (en) * 2000-03-03 2009-07-07 Sipix Imaging, Inc. Electrophoretic display and process for its manufacture
US6833943B2 (en) * 2000-03-03 2004-12-21 Sipix Imaging, Inc. Electrophoretic display and novel process for its manufacture
US6831770B2 (en) * 2000-03-03 2004-12-14 Sipix Imaging, Inc. Electrophoretic display and novel process for its manufacture
US7408696B2 (en) 2000-03-03 2008-08-05 Sipix Imaging, Inc. Three-dimensional electrophoretic displays
US6829078B2 (en) * 2000-03-03 2004-12-07 Sipix Imaging Inc. Electrophoretic display and novel process for its manufacture
US6865012B2 (en) 2000-03-03 2005-03-08 Sipix Imaging, Inc. Electrophoretic display and novel process for its manufacture
US7158282B2 (en) * 2000-03-03 2007-01-02 Sipix Imaging, Inc. Electrophoretic display and novel process for its manufacture
US6788449B2 (en) * 2000-03-03 2004-09-07 Sipix Imaging, Inc. Electrophoretic display and novel process for its manufacture
US6885495B2 (en) * 2000-03-03 2005-04-26 Sipix Imaging Inc. Electrophoretic display with in-plane switching
US20070237962A1 (en) * 2000-03-03 2007-10-11 Rong-Chang Liang Semi-finished display panels
US20030048522A1 (en) * 2001-09-13 2003-03-13 Rong-Chang Liang Three-dimensional electrophoretic displays
US7715088B2 (en) * 2000-03-03 2010-05-11 Sipix Imaging, Inc. Electrophoretic display
US7233429B2 (en) * 2000-03-03 2007-06-19 Sipix Imaging, Inc. Electrophoretic display
US6947202B2 (en) * 2000-03-03 2005-09-20 Sipix Imaging, Inc. Electrophoretic display with sub relief structure for high contrast ratio and improved shear and/or compression resistance
US7052571B2 (en) * 2000-03-03 2006-05-30 Sipix Imaging, Inc. Electrophoretic display and process for its manufacture
US8282762B2 (en) * 2001-01-11 2012-10-09 Sipix Imaging, Inc. Transmissive or reflective liquid crystal display and process for its manufacture
US6795138B2 (en) * 2001-01-11 2004-09-21 Sipix Imaging, Inc. Transmissive or reflective liquid crystal display and novel process for its manufacture
US6753067B2 (en) * 2001-04-23 2004-06-22 Sipix Imaging, Inc. Microcup compositions having improved flexure resistance and release properties
US20020188053A1 (en) 2001-06-04 2002-12-12 Sipix Imaging, Inc. Composition and process for the sealing of microcups in roll-to-roll display manufacturing
US7205355B2 (en) * 2001-06-04 2007-04-17 Sipix Imaging, Inc. Composition and process for the manufacture of an improved electrophoretic display
US8361356B2 (en) * 2001-06-04 2013-01-29 Sipix Imaging, Inc. Composition and process for the sealing of microcups in roll-to-roll display manufacturing
WO2003007066A2 (en) * 2001-07-09 2003-01-23 E Ink Corporation Electro-optical display having a lamination adhesive layer
TW527529B (en) * 2001-07-27 2003-04-11 Sipix Imaging Inc An improved electrophoretic display with color filters
US7038670B2 (en) * 2002-08-16 2006-05-02 Sipix Imaging, Inc. Electrophoretic display with dual mode switching
TW550529B (en) * 2001-08-17 2003-09-01 Sipix Imaging Inc An improved electrophoretic display with dual-mode switching
US7492505B2 (en) 2001-08-17 2009-02-17 Sipix Imaging, Inc. Electrophoretic display with dual mode switching
TW539928B (en) * 2001-08-20 2003-07-01 Sipix Imaging Inc An improved transflective electrophoretic display
TWI308231B (en) * 2001-08-28 2009-04-01 Sipix Imaging Inc Electrophoretic display
TW573204B (en) * 2001-09-12 2004-01-21 Sipix Imaging Inc An improved electrophoretic display with gating electrodes
TWI229763B (en) 2001-10-29 2005-03-21 Sipix Imaging Inc An improved electrophoretic display with holding electrodes
US7972472B2 (en) * 2002-04-24 2011-07-05 Sipix Imaging, Inc. Process for forming a patterned thin film structure for in-mold decoration
TWI268813B (en) * 2002-04-24 2006-12-21 Sipix Imaging Inc Process for forming a patterned thin film conductive structure on a substrate
US7261920B2 (en) * 2002-04-24 2007-08-28 Sipix Imaging, Inc. Process for forming a patterned thin film structure on a substrate
TWI240842B (en) * 2002-04-24 2005-10-01 Sipix Imaging Inc Matrix driven electrophoretic display with multilayer back plane
US7156945B2 (en) * 2002-04-24 2007-01-02 Sipix Imaging, Inc. Process for forming a patterned thin film structure for in-mold decoration
US8002948B2 (en) * 2002-04-24 2011-08-23 Sipix Imaging, Inc. Process for forming a patterned thin film structure on a substrate
US7038656B2 (en) * 2002-08-16 2006-05-02 Sipix Imaging, Inc. Electrophoretic display with dual-mode switching
US7271947B2 (en) 2002-08-16 2007-09-18 Sipix Imaging, Inc. Electrophoretic display with dual-mode switching
TWI297089B (en) * 2002-11-25 2008-05-21 Sipix Imaging Inc A composition for the preparation of microcups used in a liquid crystal display, a liquid crystal display comprising two or more layers of microcup array and process for its manufacture
US8023071B2 (en) * 2002-11-25 2011-09-20 Sipix Imaging, Inc. Transmissive or reflective liquid crystal display
JP4849640B2 (ja) * 2004-04-08 2012-01-11 サムスン エルシーディー ネザーランズ アール アンド ディー センター ビー．ブイ． ディスプレイデバイス
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Also Published As

Publication number Publication date
US4741988A (en) 1988-05-03
JPS61264324A (ja) 1986-11-22
EP0202705A1 (de) 1986-11-26
JPH0830827B2 (ja) 1996-03-27
EP0202705B1 (de) 1992-01-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8339 Ceased/non-payment of the annual fee