DE3681889D1 - Lichtempfindliche kunststoffzusammensetzung und verfahren zur herstellung von farbfiltern damit. - Google Patents
Lichtempfindliche kunststoffzusammensetzung und verfahren zur herstellung von farbfiltern damit.Info
- Publication number
- DE3681889D1 DE3681889D1 DE8686309364T DE3681889T DE3681889D1 DE 3681889 D1 DE3681889 D1 DE 3681889D1 DE 8686309364 T DE8686309364 T DE 8686309364T DE 3681889 T DE3681889 T DE 3681889T DE 3681889 D1 DE3681889 D1 DE 3681889D1
- Authority
- DE
- Germany
- Prior art keywords
- color filter
- light sensitive
- plastic composition
- producing color
- sensitive plastic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
- G03C7/04—Additive processes using colour screens; Materials therefor; Preparing or processing such materials
- G03C7/06—Manufacture of colour screens
- G03C7/10—Manufacture of colour screens with regular areas of colour, e.g. bands, lines, dots
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60267220A JPS62127735A (ja) | 1985-11-29 | 1985-11-29 | 感光性樹脂組成物及びこれを用いたカラ−フイルタ−の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3681889D1 true DE3681889D1 (de) | 1991-11-14 |
Family
ID=17441802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8686309364T Expired - Lifetime DE3681889D1 (de) | 1985-11-29 | 1986-12-01 | Lichtempfindliche kunststoffzusammensetzung und verfahren zur herstellung von farbfiltern damit. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4820619A (de) |
EP (1) | EP0225192B1 (de) |
JP (1) | JPS62127735A (de) |
KR (1) | KR900002189B1 (de) |
DE (1) | DE3681889D1 (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3677019D1 (de) * | 1986-11-21 | 1991-02-21 | Agfa Gevaert Nv | Oberflaechenaktives polymer. |
EP0329791B1 (de) * | 1987-07-28 | 1995-01-11 | Nippon Kayaku Kabushiki Kaisha | Photoempfindliche harzzusammensetzung und farbfilter |
JPH01128064A (ja) * | 1987-11-12 | 1989-05-19 | Chisso Corp | 光硬化性樹脂組成物 |
EP0326112B1 (de) * | 1988-01-29 | 1994-09-14 | Toppan Printing Co., Ltd. | Elektrodenstruktur für Anzeigevorrichtungen und ihr Herstellungsverfahren |
US4937175A (en) * | 1989-01-23 | 1990-06-26 | The Dow Chemical Company | Free radically initiated process |
NL9000389A (nl) * | 1990-02-19 | 1991-09-16 | Philips Nv | Inrichting met kleurfilter. |
US5230972A (en) * | 1990-08-10 | 1993-07-27 | Samsung Electronics Co., Ltd. | Method of manufacturing a color filter |
DE69425862T2 (de) * | 1993-11-17 | 2001-05-03 | At & T Corp | Verfahren zur Herstellung einer Vorrichtung unter Benutzung einer lichtempfindlichen Zusammensetzung |
US5641595A (en) * | 1996-01-16 | 1997-06-24 | Industrial Technology Research Institute | Manufacture of color filters by incremental exposure method |
US5631111A (en) * | 1996-01-19 | 1997-05-20 | Industrial Technology Research Institute | Method for producing color filters |
JP3824285B2 (ja) * | 1997-03-14 | 2006-09-20 | 富士写真フイルム株式会社 | 感放射線性着色組成物 |
US6147730A (en) * | 1998-11-30 | 2000-11-14 | International Business Machines Corporation | Color filters formed sequentially with intervening protective films for flat panel displays |
KR20010052472A (ko) * | 1999-03-31 | 2001-06-25 | 가케히 데츠오 | 감광성 화합물 및 감광성 조성물 |
JP4532785B2 (ja) * | 2001-07-11 | 2010-08-25 | キヤノン株式会社 | 構造体の製造方法、および液体吐出ヘッドの製造方法 |
TWI242108B (en) * | 2001-07-27 | 2005-10-21 | Sumitomo Chemical Co | Colored photosensitive resin composition |
US6535341B1 (en) * | 2001-11-07 | 2003-03-18 | Stanford Miller | Color light filter and process of manufacturing a color light filter |
TW588571B (en) * | 2002-05-24 | 2004-05-21 | Sanyo Electric Co | Electroluminescence display device |
JP2004198717A (ja) * | 2002-12-18 | 2004-07-15 | Showa Denko Kk | カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いるカーボンブラック分散液組成物 |
US7495721B2 (en) * | 2004-12-20 | 2009-02-24 | Xerox Corporation | Methods of printing filter material to fabricate color filter |
JP4730429B2 (ja) * | 2008-12-03 | 2011-07-20 | ソニー株式会社 | 固体撮像装置、および、その製造方法、カメラ |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU454526A1 (ru) * | 1971-12-31 | 1974-12-25 | Предприятие П/Я Х-5476 | Негативный фоторезист |
JPS5072702A (de) * | 1973-10-31 | 1975-06-16 | ||
AU3870478A (en) * | 1977-08-09 | 1980-02-14 | Somar Mfg | High energy radiation cruable resist material |
DE2860609D1 (en) * | 1977-10-14 | 1981-04-30 | Ciba Geigy Ag | Bis-azido-phthalic acid derivatives and process for their preparation |
JPS56137347A (en) * | 1980-03-29 | 1981-10-27 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition for dry development |
JPS56162744A (en) * | 1980-05-19 | 1981-12-14 | Hitachi Ltd | Formation of fine pattern |
JPS5744143A (en) * | 1980-08-29 | 1982-03-12 | Tokyo Ohka Kogyo Co Ltd | Composition and method for forming micropattern |
JPH0612453B2 (ja) * | 1982-05-17 | 1994-02-16 | 積水フアインケミカル株式会社 | 光硬化性樹脂組成物 |
JPS59155412A (ja) * | 1982-11-12 | 1984-09-04 | Matsushita Electric Ind Co Ltd | 染色用感光性樹脂 |
EP0119719B1 (de) * | 1983-03-03 | 1987-05-06 | Toray Industries, Inc. | Strahlungsempfindliche Polymermasse |
JPS60114575A (ja) * | 1983-11-28 | 1985-06-21 | Tokyo Ohka Kogyo Co Ltd | 乾式パタ−ン形成方法 |
JPS60115222A (ja) * | 1983-11-28 | 1985-06-21 | Tokyo Ohka Kogyo Co Ltd | 微細パタ−ン形成方法 |
US4614701A (en) * | 1984-09-28 | 1986-09-30 | Sekisui Fine Chemical Co., Ltd. | Photocurable diazo or azide composition with acrylic copolymer having hydroxy and amino groups on separate acrylic monomer units |
-
1985
- 1985-11-29 JP JP60267220A patent/JPS62127735A/ja active Pending
-
1986
- 1986-11-21 US US06/933,215 patent/US4820619A/en not_active Expired - Fee Related
- 1986-11-27 KR KR1019860010140A patent/KR900002189B1/ko not_active IP Right Cessation
- 1986-12-01 EP EP86309364A patent/EP0225192B1/de not_active Expired - Lifetime
- 1986-12-01 DE DE8686309364T patent/DE3681889D1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0225192A3 (en) | 1988-03-30 |
KR900002189B1 (ko) | 1990-04-02 |
JPS62127735A (ja) | 1987-06-10 |
KR870005271A (ko) | 1987-06-05 |
EP0225192B1 (de) | 1991-10-09 |
US4820619A (en) | 1989-04-11 |
EP0225192A2 (de) | 1987-06-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |