DE364902T1 - Herstellungsverfahren von amorphen supergitter-legierungen. - Google Patents

Herstellungsverfahren von amorphen supergitter-legierungen.

Info

Publication number
DE364902T1
DE364902T1 DE198989119081T DE89119081T DE364902T1 DE 364902 T1 DE364902 T1 DE 364902T1 DE 198989119081 T DE198989119081 T DE 198989119081T DE 89119081 T DE89119081 T DE 89119081T DE 364902 T1 DE364902 T1 DE 364902T1
Authority
DE
Germany
Prior art keywords
manufacturing
super grid
grid alloys
amorphous
amorphous super
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE198989119081T
Other languages
English (en)
Inventor
Koji Sendai-Shi Miyagi Jp Hashimoto
Hideaki Taihaku-Ku Sendai-Shi Jp Yoshioka
Katsuhiko Asami
Asahi Sendai-Shi Miyagi Jp Kawashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YKK Corp
Original Assignee
Yoshida Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yoshida Kogyo KK filed Critical Yoshida Kogyo KK
Publication of DE364902T1 publication Critical patent/DE364902T1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE198989119081T 1988-10-15 1989-10-13 Herstellungsverfahren von amorphen supergitter-legierungen. Pending DE364902T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63260021A JPH02107757A (ja) 1988-10-15 1988-10-15 アモルファス超格子合金の作製法

Publications (1)

Publication Number Publication Date
DE364902T1 true DE364902T1 (de) 1990-11-08

Family

ID=17342207

Family Applications (2)

Application Number Title Priority Date Filing Date
DE68921838T Expired - Fee Related DE68921838T2 (de) 1988-10-15 1989-10-13 Herstellungsverfahren von amorphen Supergitter-Legierungen.
DE198989119081T Pending DE364902T1 (de) 1988-10-15 1989-10-13 Herstellungsverfahren von amorphen supergitter-legierungen.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE68921838T Expired - Fee Related DE68921838T2 (de) 1988-10-15 1989-10-13 Herstellungsverfahren von amorphen Supergitter-Legierungen.

Country Status (7)

Country Link
US (1) US5015352A (de)
EP (1) EP0364902B1 (de)
JP (1) JPH02107757A (de)
AU (1) AU613530B2 (de)
BR (1) BR8905316A (de)
CA (1) CA2000171C (de)
DE (2) DE68921838T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU620155B2 (en) * 1988-10-15 1992-02-13 Koji Hashimoto Amorphous aluminum alloys
EP0600303B1 (de) * 1992-12-01 2002-02-06 Matsushita Electric Industrial Co., Ltd. Verfahren zur Herstellung einer elektrischen Dünnschicht
US5472592A (en) * 1994-07-19 1995-12-05 American Plating Systems Electrolytic plating apparatus and method
US6395156B1 (en) 2001-06-29 2002-05-28 Super Light Wave Corp. Sputtering chamber with moving table producing orbital motion of target for improved uniformity
FR2905707B1 (fr) * 2006-09-08 2009-01-23 Centre Nat Rech Scient Procede pour deposer sur un substrat une couche mince d'alliage metallique et alliage metallique sous forme de couche mince.
US20140174907A1 (en) * 2012-12-21 2014-06-26 Intermolecular, Inc. High Deposition Rate Chamber with Co-Sputtering Capabilities

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2111534A (en) * 1981-12-16 1983-07-06 Energy Conversion Devices Inc Making photoresponsive amorphous alloys and devices by reactive plasma sputtering
JPS5974648A (ja) * 1982-10-22 1984-04-27 Hitachi Ltd スパツタ装置
EP0122047B1 (de) * 1983-03-11 1988-06-01 Exxon Research And Engineering Company Vielschichtiges, amorphes Halbleitermaterial
JPS6052574A (ja) * 1983-09-02 1985-03-25 Hitachi Ltd 連続スパツタ装置
US4591417A (en) * 1983-12-27 1986-05-27 Ford Motor Company Tandem deposition of cermets
JPS6119774A (ja) * 1984-07-06 1986-01-28 Anelva Corp スパツタリング装置
JPS61238958A (ja) * 1985-04-15 1986-10-24 Hitachi Ltd 複合薄膜形成法及び装置
JPS61250163A (ja) * 1985-04-26 1986-11-07 Nippon Telegr & Teleph Corp <Ntt> 多層薄膜の製造方法および装置
US4701395A (en) * 1985-05-20 1987-10-20 Exxon Research And Engineering Company Amorphous photoreceptor with high sensitivity to long wavelengths
JPS6379951A (ja) * 1986-09-22 1988-04-09 Showa Denko Kk 磁性金属多層膜およびその製造方法

Also Published As

Publication number Publication date
AU4265189A (en) 1990-04-26
DE68921838T2 (de) 1995-11-02
JPH02107757A (ja) 1990-04-19
BR8905316A (pt) 1990-05-22
CA2000171A1 (en) 1990-04-15
AU613530B2 (en) 1991-08-01
US5015352A (en) 1991-05-14
CA2000171C (en) 1999-08-24
DE68921838D1 (de) 1995-04-27
EP0364902B1 (de) 1995-03-22
EP0364902A1 (de) 1990-04-25

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