DE3613112A1 - Einrichtung zum messen der magnetischen eigenschaften von durch sputtern oder bedampfen aufgebrachten schichten waehrend des bearbeitungsvorganges - Google Patents
Einrichtung zum messen der magnetischen eigenschaften von durch sputtern oder bedampfen aufgebrachten schichten waehrend des bearbeitungsvorgangesInfo
- Publication number
- DE3613112A1 DE3613112A1 DE19863613112 DE3613112A DE3613112A1 DE 3613112 A1 DE3613112 A1 DE 3613112A1 DE 19863613112 DE19863613112 DE 19863613112 DE 3613112 A DE3613112 A DE 3613112A DE 3613112 A1 DE3613112 A1 DE 3613112A1
- Authority
- DE
- Germany
- Prior art keywords
- coil
- magnetic
- sputtering
- changes
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 11
- 238000003754 machining Methods 0.000 title claims description 3
- 238000000151 deposition Methods 0.000 title abstract 2
- 239000000696 magnetic material Substances 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims abstract description 6
- 239000003990 capacitor Substances 0.000 claims abstract description 3
- 239000000758 substrate Substances 0.000 claims description 13
- 238000005259 measurement Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 230000035699 permeability Effects 0.000 claims description 4
- 229910001004 magnetic alloy Inorganic materials 0.000 claims description 3
- 238000010025 steaming Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 238000005019 vapor deposition process Methods 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 4
- 238000001704 evaporation Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010410 dusting Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003534 oscillatory effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/72—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating magnetic variables
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/12—Measuring magnetic properties of articles or specimens of solids or fluids
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/85—Coating a support with a magnetic layer by vapour deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Analytical Chemistry (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Metallurgy (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19863613112 DE3613112A1 (de) | 1986-04-18 | 1986-04-18 | Einrichtung zum messen der magnetischen eigenschaften von durch sputtern oder bedampfen aufgebrachten schichten waehrend des bearbeitungsvorganges |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19863613112 DE3613112A1 (de) | 1986-04-18 | 1986-04-18 | Einrichtung zum messen der magnetischen eigenschaften von durch sputtern oder bedampfen aufgebrachten schichten waehrend des bearbeitungsvorganges |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3613112A1 true DE3613112A1 (de) | 1987-10-22 |
| DE3613112C2 DE3613112C2 (enrdf_load_stackoverflow) | 1989-02-09 |
Family
ID=6298986
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19863613112 Granted DE3613112A1 (de) | 1986-04-18 | 1986-04-18 | Einrichtung zum messen der magnetischen eigenschaften von durch sputtern oder bedampfen aufgebrachten schichten waehrend des bearbeitungsvorganges |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE3613112A1 (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5454920A (en) * | 1992-01-13 | 1995-10-03 | Nec Corporation | Sputtering method and apparatus for optimum saturation magnetostriction |
| DE19951015C1 (de) * | 1999-10-22 | 2001-01-25 | Bosch Gmbh Robert | Verfahren zur Charakterisierung von Metallelektroden keramischer Sensorelemente |
| EP1361292A1 (de) * | 2002-05-10 | 2003-11-12 | Siemens Aktiengesellschaft | Verfahren zur In-situ-Schichtdickenbestimmung |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2630780A (en) * | 1946-12-21 | 1953-03-10 | Falck Hakan Fredrik | Device for depositing thin metallic layers |
| DE2828651A1 (de) * | 1977-07-01 | 1979-01-18 | Hitachi Ltd | Vakuum-bedampfungseinrichtung |
| DE3004149A1 (de) * | 1980-02-05 | 1981-08-13 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur reproduzierbaren herstellung metallischer schichten |
-
1986
- 1986-04-18 DE DE19863613112 patent/DE3613112A1/de active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2630780A (en) * | 1946-12-21 | 1953-03-10 | Falck Hakan Fredrik | Device for depositing thin metallic layers |
| DE2828651A1 (de) * | 1977-07-01 | 1979-01-18 | Hitachi Ltd | Vakuum-bedampfungseinrichtung |
| DE3004149A1 (de) * | 1980-02-05 | 1981-08-13 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur reproduzierbaren herstellung metallischer schichten |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5454920A (en) * | 1992-01-13 | 1995-10-03 | Nec Corporation | Sputtering method and apparatus for optimum saturation magnetostriction |
| DE19951015C1 (de) * | 1999-10-22 | 2001-01-25 | Bosch Gmbh Robert | Verfahren zur Charakterisierung von Metallelektroden keramischer Sensorelemente |
| EP1361292A1 (de) * | 2002-05-10 | 2003-11-12 | Siemens Aktiengesellschaft | Verfahren zur In-situ-Schichtdickenbestimmung |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3613112C2 (enrdf_load_stackoverflow) | 1989-02-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8320 | Willingness to grant licenses declared (paragraph 23) | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: GRUNDIG E.M.V. ELEKTRO-MECHANISCHE VERSUCHSANSTALT |
|
| 8339 | Ceased/non-payment of the annual fee | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: GRUNDIG AG, 90762 FUERTH, DE |