DE3605916C2 - - Google Patents

Info

Publication number
DE3605916C2
DE3605916C2 DE19863605916 DE3605916A DE3605916C2 DE 3605916 C2 DE3605916 C2 DE 3605916C2 DE 19863605916 DE19863605916 DE 19863605916 DE 3605916 A DE3605916 A DE 3605916A DE 3605916 C2 DE3605916 C2 DE 3605916C2
Authority
DE
Germany
Prior art keywords
substrate
metal layer
layer
thin metal
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19863605916
Other languages
German (de)
English (en)
Other versions
DE3605916A1 (de
Inventor
Heinz Prof. Dr.Rer.Nat. 5100 Aachen De Beneking
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Telefunken Electronic GmbH
Licentia Patent Verwaltungs GmbH
Original Assignee
Telefunken Electronic GmbH
Licentia Patent Verwaltungs GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Telefunken Electronic GmbH, Licentia Patent Verwaltungs GmbH filed Critical Telefunken Electronic GmbH
Priority to DE19863605916 priority Critical patent/DE3605916A1/de
Publication of DE3605916A1 publication Critical patent/DE3605916A1/de
Application granted granted Critical
Publication of DE3605916C2 publication Critical patent/DE3605916C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G03F7/2039—X-ray radiation

Landscapes

  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE19863605916 1986-02-25 1986-02-25 Verfahren zur kontrasterhoehung bei der roentgenstrahl-lithographie und anordnung zur durchfuehrung des verfahrens Granted DE3605916A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19863605916 DE3605916A1 (de) 1986-02-25 1986-02-25 Verfahren zur kontrasterhoehung bei der roentgenstrahl-lithographie und anordnung zur durchfuehrung des verfahrens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19863605916 DE3605916A1 (de) 1986-02-25 1986-02-25 Verfahren zur kontrasterhoehung bei der roentgenstrahl-lithographie und anordnung zur durchfuehrung des verfahrens

Publications (2)

Publication Number Publication Date
DE3605916A1 DE3605916A1 (de) 1987-09-10
DE3605916C2 true DE3605916C2 (https=) 1988-08-11

Family

ID=6294827

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19863605916 Granted DE3605916A1 (de) 1986-02-25 1986-02-25 Verfahren zur kontrasterhoehung bei der roentgenstrahl-lithographie und anordnung zur durchfuehrung des verfahrens

Country Status (1)

Country Link
DE (1) DE3605916A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0682604B2 (ja) * 1987-08-04 1994-10-19 三菱電機株式会社 Ｘ線マスク

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4194233A (en) * 1978-01-30 1980-03-18 Rockwell International Corporation Mask apparatus for fine-line lithography

Also Published As

Publication number Publication date
DE3605916A1 (de) 1987-09-10

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Legal Events

Date Code Title Description
OM8 Search report available as to paragraph 43 lit. 1 sentence 1 patent law
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee