DE3586049D1 - Hochtemperaturbestaendiger selektiv entwicklungsfaehiger schutzlack. - Google Patents

Hochtemperaturbestaendiger selektiv entwicklungsfaehiger schutzlack.

Info

Publication number
DE3586049D1
DE3586049D1 DE8585309413T DE3586049T DE3586049D1 DE 3586049 D1 DE3586049 D1 DE 3586049D1 DE 8585309413 T DE8585309413 T DE 8585309413T DE 3586049 T DE3586049 T DE 3586049T DE 3586049 D1 DE3586049 D1 DE 3586049D1
Authority
DE
Germany
Prior art keywords
selective
resistant
temperature
protective lacquer
developable protective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585309413T
Other languages
English (en)
Inventor
Sam Richard Turner
Conrad Gerard Houle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of DE3586049D1 publication Critical patent/DE3586049D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE8585309413T 1984-12-28 1985-12-23 Hochtemperaturbestaendiger selektiv entwicklungsfaehiger schutzlack. Expired - Fee Related DE3586049D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US68730684A 1984-12-28 1984-12-28

Publications (1)

Publication Number Publication Date
DE3586049D1 true DE3586049D1 (de) 1992-06-17

Family

ID=24759927

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585309413T Expired - Fee Related DE3586049D1 (de) 1984-12-28 1985-12-23 Hochtemperaturbestaendiger selektiv entwicklungsfaehiger schutzlack.

Country Status (4)

Country Link
EP (1) EP0187517B1 (de)
JP (1) JPS61162039A (de)
CA (1) CA1254432A (de)
DE (1) DE3586049D1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1255142A (en) * 1985-03-11 1989-06-06 Edward C. Fredericks Method and composition of matter for improving conductor resolution in microelectronic circuits
US5462840A (en) * 1987-09-16 1995-10-31 Hoechst Celanese Corporation Use of poly(35-disubstituted 4-hydroxystyrene/N-substituted maleimide for forming a negative image
US4927956A (en) * 1987-09-16 1990-05-22 Hoechst Celanese Corporation 3,5-disubstituted-4-acetoxystyrene and process for its production
DE3820699A1 (de) * 1988-06-18 1989-12-21 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US5342727A (en) * 1988-10-21 1994-08-30 Hoechst Celanese Corp. Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition
JP2746413B2 (ja) * 1989-04-10 1998-05-06 東洋合成工業株式会社 遠紫外光用ホトレジスト組成物
DE3940911A1 (de) * 1989-12-12 1991-06-13 Hoechst Ag Verfahren zur herstellung negativer kopien
DE4002397A1 (de) * 1990-01-27 1991-08-01 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4003025A1 (de) * 1990-02-02 1991-08-08 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE4004719A1 (de) * 1990-02-15 1991-08-22 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE69422590T2 (de) * 1993-11-08 2000-08-24 At & T Corp Verfahren zur Herstellung einer Vorrichtung
DE19507618A1 (de) * 1995-03-04 1996-09-05 Hoechst Ag Polymere und diese enthaltendes lichtempfindliches Gemisch
WO1998001791A1 (fr) * 1996-07-10 1998-01-15 Nippon Zeon Co., Ltd. Composition de photoresine positive
DE19803564A1 (de) 1998-01-30 1999-08-05 Agfa Gevaert Ag Polymere mit Einheiten aus N-substituiertem Maleimid und deren Verwendung in strahlungsempfindlichen Gemischen
JP4458389B2 (ja) 2000-05-01 2010-04-28 コダック株式会社 感光性組成物および感光性平版印刷版
JP2012068357A (ja) 2010-09-22 2012-04-05 Eastman Kodak Co 平版印刷版原版
JP6213135B2 (ja) * 2013-10-17 2017-10-18 東ソー株式会社 ｔｒａｎｓ−スチルベン−Ｎ−置換マレイミド共重合体及びそれを用いた位相差フィルム
KR102104807B1 (ko) * 2015-08-19 2020-04-27 후지필름 가부시키가이샤 패턴 형성 방법, 전자 디바이스의 제조 방법, 및 레지스트 조성물

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2462101A1 (de) * 1974-08-02 1976-04-29 Siemens Ag Verfahren zur herstellung strahlungsempfindlicher, loeslicher polymerer verbindungen
US4174326A (en) * 1975-06-18 1979-11-13 Ciba-Geigy Corporation Imidyl compounds
ATE9931T1 (de) * 1979-05-18 1984-11-15 Ciba-Geigy Ag Lichtvernetzbare copolymere, sie enthaltendes lichtempfindliches aufzeichnungsmaterial, seine verwendung zur herstellung photographischer abbildungen und verfahren zur herstellung von photographischen abbildungen.
EP0140273B1 (de) * 1983-11-01 1991-09-11 Hoechst Celanese Corporation Tief UV-empfindliche positive Photolackzusammensetzung, lichtempfindliches Element und dasselbe enthaltendes gegen Hitze widerstandsfähiges photochemisches Bild
US4524121A (en) * 1983-11-21 1985-06-18 Rohm And Haas Company Positive photoresists containing preformed polyglutarimide polymer
ATE68272T1 (de) * 1984-06-01 1991-10-15 Rohm & Haas Lichtempfindliche beschichtungszusammensetzung, aus diesem hergestellte thermisch stabile beschichtungen und verfahren zur herstellung von thermisch stabilen polymerbildern.

Also Published As

Publication number Publication date
JPS61162039A (ja) 1986-07-22
EP0187517A2 (de) 1986-07-16
CA1254432A (en) 1989-05-23
EP0187517B1 (de) 1992-05-13
EP0187517A3 (en) 1987-10-28

Similar Documents

Publication Publication Date Title
NO165939C (no) Brannalarmsystem.
NO852548L (no) Brannalarmsystem.
DE3579569D1 (de) Entfaltbarer reflektor.
FI851114L (fi) Lagringsstabila, snabbt soederfallande farmaceutiska aktivaemnespresstycken.
FI850993A0 (fi) Utryckningsfordon, speciellt tankslaeckningsfordon foer flygfaelt.
FI851937A0 (fi) Utryckningsfordon, saerskilt brandbil.
FI851505A0 (fi) Valsanordning, speciellt foer en kalander.
DE3586049D1 (de) Hochtemperaturbestaendiger selektiv entwicklungsfaehiger schutzlack.
FI841948A0 (fi) Kanna, speciellt termoskanna.
FI852196L (fi) Mjukgoerande, builderaemnehaltig tvaettmedelskomposition.
FI852087A0 (fi) Glidytsbelaeggning foer skida, speciellt terraengskida.
FI851383A0 (fi) Polyfosfat innehaollande, flytande tvaettmedelskomposition foer tvaettinraettningar.
FI851935L (fi) Utryckningsfordon, saosom brandbil.
FI840878A (fi) Ventilations-/vaermevaexlarsystem foer djurskydd, saerskilt broilerhoenshus.
FI852088L (fi) Enhetliga, styva, fristaoende, gasgenomslaeppliga, laogtemperaturbundna sandkornsformar.
FI854385A0 (fi) Foer engaongsbruk avsett, vaetskeabsorberande alster.
FI851743L (fi) Saekerhetsfoerslutningskork, saerskilt foer flaskor foer farmaceutiskt bruk.
FI851206A0 (fi) Isoleringskaerl, saerskilt termoskanna.
FI843996A0 (fi) Kluvet braensle-element foer kaernreaktor, isynnerhet foer kokvattenreaktor.
FI853032L (fi) Foerberedd installationsenhet, saerskilt sanitetsenhet.
FI851980A0 (fi) Behaollare foer livsmedel, saerskilt soetsaker, anvaendbar saosom sparboessa.
NO158887C (no) Sikkerhetsline.
FI844605A0 (fi) Faeststycke foer prydnadsskivor, exempelvis spegelglasrutor.
FI841778A0 (fi) Tvaettvante, saerskilt foer sjukhusbruk.
FI851408A0 (fi) Backslagsventil, speciellt skivbackslagsventil.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee