DE3578581D1 - Verfahren zur herstellung von siliciumimid und dessen weiterberarbeitung zu siliciumnitrid. - Google Patents

Verfahren zur herstellung von siliciumimid und dessen weiterberarbeitung zu siliciumnitrid.

Info

Publication number
DE3578581D1
DE3578581D1 DE8585308944T DE3578581T DE3578581D1 DE 3578581 D1 DE3578581 D1 DE 3578581D1 DE 8585308944 T DE8585308944 T DE 8585308944T DE 3578581 T DE3578581 T DE 3578581T DE 3578581 D1 DE3578581 D1 DE 3578581D1
Authority
DE
Germany
Prior art keywords
imide
produce
silicon nitride
silicium
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8585308944T
Other languages
English (en)
Inventor
Takeshi Isoda
Mikiro Arai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tonen General Sekiyu KK
Original Assignee
Toa Nenryo Kogyyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toa Nenryo Kogyyo KK filed Critical Toa Nenryo Kogyyo KK
Application granted granted Critical
Publication of DE3578581D1 publication Critical patent/DE3578581D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/087—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/068—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/82—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/88—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by thermal analysis data, e.g. TGA, DTA, DSC

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Products (AREA)
DE8585308944T 1985-12-09 1985-12-09 Verfahren zur herstellung von siliciumimid und dessen weiterberarbeitung zu siliciumnitrid. Expired - Lifetime DE3578581D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP85308944A EP0225412B1 (de) 1985-12-09 1985-12-09 Verfahren zur Herstellung von Siliciumimid und dessen Weiterberarbeitung zu Siliciumnitrid

Publications (1)

Publication Number Publication Date
DE3578581D1 true DE3578581D1 (de) 1990-08-09

Family

ID=8194469

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585308944T Expired - Lifetime DE3578581D1 (de) 1985-12-09 1985-12-09 Verfahren zur herstellung von siliciumimid und dessen weiterberarbeitung zu siliciumnitrid.

Country Status (3)

Country Link
EP (1) EP0225412B1 (de)
AT (1) ATE54293T1 (de)
DE (1) DE3578581D1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0228189B1 (de) * 1985-12-23 1992-06-17 Ford Motor Company Limited Verfahren zur Herstellung von Siliziumnitridpulver
DE4031070A1 (de) * 1990-10-02 1992-04-09 Bayer Ag Siliciumdiimid, verfahren zu dessen herstellung sowie daraus erhaltenes siliciumnitrid
CN114433246A (zh) * 2022-01-11 2022-05-06 中科合成油技术股份有限公司 高分散的锚定于氮化硅的过渡金属催化剂及其制备方法和应用

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3959446A (en) * 1974-03-01 1976-05-25 The United States Of America As Represented By The Secretary Of The Air Force Synthesis of high purity, alpha phase silicon nitride powder
JPS54145400A (en) * 1978-05-08 1979-11-13 Ube Ind Ltd Production of metal nitride powder
JPS5595605A (en) * 1979-01-10 1980-07-21 Toyo Soda Mfg Co Ltd High purity silicon nitride and production thereof

Also Published As

Publication number Publication date
EP0225412A1 (de) 1987-06-16
EP0225412B1 (de) 1990-07-04
ATE54293T1 (de) 1990-07-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee