DE3578013D1 - Negativ arbeitende trockendruckplatte und verfahren zur herstellung. - Google Patents

Negativ arbeitende trockendruckplatte und verfahren zur herstellung.

Info

Publication number
DE3578013D1
DE3578013D1 DE8585102838T DE3578013T DE3578013D1 DE 3578013 D1 DE3578013 D1 DE 3578013D1 DE 8585102838 T DE8585102838 T DE 8585102838T DE 3578013 T DE3578013 T DE 3578013T DE 3578013 D1 DE3578013 D1 DE 3578013D1
Authority
DE
Germany
Prior art keywords
production
printing plate
negative working
dry printing
working dry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585102838T
Other languages
English (en)
Inventor
Hiroshi Takahashi
Yasuhisa Narutomi
Yoshimasa Aotani
Keisuke Shiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE3578013D1 publication Critical patent/DE3578013D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
DE8585102838T 1984-03-14 1985-03-12 Negativ arbeitende trockendruckplatte und verfahren zur herstellung. Expired - Fee Related DE3578013D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59048307A JPS60192948A (ja) 1984-03-14 1984-03-14 湿し水不要ネガ型感光性平版印刷版および製版方法

Publications (1)

Publication Number Publication Date
DE3578013D1 true DE3578013D1 (de) 1990-07-05

Family

ID=12799760

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585102838T Expired - Fee Related DE3578013D1 (de) 1984-03-14 1985-03-12 Negativ arbeitende trockendruckplatte und verfahren zur herstellung.

Country Status (5)

Country Link
US (1) US4642283A (de)
EP (1) EP0154980B1 (de)
JP (1) JPS60192948A (de)
CA (1) CA1277170C (de)
DE (1) DE3578013D1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8601096A (nl) * 1986-04-29 1987-11-16 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak.
US4826752A (en) * 1986-06-25 1989-05-02 Fuji Photo Film Co., Ltd. Dry photosensitive lithographic plate comprising a silicon rubber layer containing an aromatic aminosilane
JPS6314140A (ja) * 1986-07-04 1988-01-21 Konica Corp 感光性組成物および感光性平版印刷版
JP2507341B2 (ja) * 1986-08-22 1996-06-12 東レ株式会社 水なし平版印刷版用現像液
DE3628719A1 (de) * 1986-08-23 1988-02-25 Hoechst Ag Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck
DE3628720A1 (de) * 1986-08-23 1988-02-25 Hoechst Ag Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck
DE3715792A1 (de) * 1987-05-12 1988-11-24 Hoechst Ag Entwickler fuer wasserlos druckende offsetplatten
DE3729035A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial
IL89790A (en) * 1988-04-01 2002-05-23 Johns Hopking University Sequences of nucleic acids encoding and cells producing CR1 protein and methods for its production and purification
JPH02282257A (ja) * 1989-04-24 1990-11-19 Mitsubishi Kasei Corp 湿し水不要感光性平版印刷版
US5225309A (en) * 1990-02-08 1993-07-06 Konica Corporation Light-sensitive litho printing plate with cured diazo primer layer, diazo resin/salt light-sensitive layer containing a coupler and silicone rubber overlayer
EP0441638B1 (de) * 1990-02-08 1999-10-13 Konica Corporation Lichtempfindliche lithographische Druckplatte
US5260166A (en) * 1992-03-04 1993-11-09 Graphic Controls Corporation Seamless, trilaminate, photopolymer cylindrical printing plate and method of manufacture
DE69424405T2 (de) * 1993-10-26 2001-01-11 Toray Industries Wasserlose lithographische druckplatte
US5866294A (en) * 1993-10-26 1999-02-02 Toray Industries, Inc. Water-less quinonediazide lithographic raw plate
JP3278280B2 (ja) * 1994-03-08 2002-04-30 富士写真フイルム株式会社 感光性平版印刷版
US6742453B1 (en) 1998-07-30 2004-06-01 Mark Alan Borski Printing sleeves and methods for producing same
WO2008038550A1 (fr) * 2006-09-25 2008-04-03 Hitachi Chemical Company, Ltd. Composition sensible au rayonnement, procédé de formation d'un film de protection à base de silice, film de protection à base de silice, appareil et élément comportant un film de protection à base de silice et agent photosensibilisant destiné à isoler un film

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2551133A (en) * 1946-08-29 1951-05-01 Du Pont Photographic light-sensitive diazo element
US2974042A (en) * 1956-06-23 1961-03-07 Keuffel & Esser Co Diazotype reproduction process
US3086861A (en) * 1960-07-01 1963-04-23 Gen Aniline & Film Corp Printing plates comprising ink receptive azo dye surfaces
US3149972A (en) * 1960-08-16 1964-09-22 Gen Aniline & Film Corp Diazo and resinous coupler printing plates for photomechanical reproduction
US3404005A (en) * 1963-10-01 1968-10-01 Ind Dyestuff Company Diazo light-sensitive composition and element
US3373021A (en) * 1964-01-29 1968-03-12 Harris Intertype Corp Presensitized positive working lithographic plate
JPS5539825B2 (de) * 1972-05-12 1980-10-14
US4108664A (en) * 1976-11-01 1978-08-22 Gaf Corporation Light-sensitive negative-working film containing a diazo oxide sensitizer and a p-toluenesulfonyl halide or a 2,4-dihalo-S-triazine
NZ194648A (en) * 1979-08-20 1982-12-07 Vickers Ltd Producing lithographic printing plate from radiation sensitive plate plate finishing composition
JPS5917552A (ja) * 1982-07-21 1984-01-28 Toray Ind Inc 画像形成用積層体の処理方法

Also Published As

Publication number Publication date
JPS60192948A (ja) 1985-10-01
CA1277170C (en) 1990-12-04
EP0154980B1 (de) 1990-05-30
US4642283A (en) 1987-02-10
JPH0356625B2 (de) 1991-08-28
EP0154980A1 (de) 1985-09-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee