DE3576243D1 - Halbleiteranordnung mit einem bipolar-transistor und mit einem fet mit isolierendem gate. - Google Patents

Halbleiteranordnung mit einem bipolar-transistor und mit einem fet mit isolierendem gate.

Info

Publication number
DE3576243D1
DE3576243D1 DE8585201381T DE3576243T DE3576243D1 DE 3576243 D1 DE3576243 D1 DE 3576243D1 DE 8585201381 T DE8585201381 T DE 8585201381T DE 3576243 T DE3576243 T DE 3576243T DE 3576243 D1 DE3576243 D1 DE 3576243D1
Authority
DE
Germany
Prior art keywords
fet
bipolar transistor
semiconductor arrangement
insulating gate
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8585201381T
Other languages
English (en)
Inventor
David James Coe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3576243D1 publication Critical patent/DE3576243D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
    • H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
    • H03K17/567—Circuits characterised by the use of more than one type of semiconductor device, e.g. BIMOS, composite devices such as IGBT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • H01L27/0705—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
    • H01L27/0711—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors
    • H01L27/0716—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors in combination with vertical bipolar transistors and diodes, or capacitors, or resistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
  • Logic Circuits (AREA)
DE8585201381T 1984-09-19 1985-09-03 Halbleiteranordnung mit einem bipolar-transistor und mit einem fet mit isolierendem gate. Expired - Lifetime DE3576243D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08423690A GB2164790A (en) 1984-09-19 1984-09-19 Merged bipolar and field effect transistors

Publications (1)

Publication Number Publication Date
DE3576243D1 true DE3576243D1 (de) 1990-04-05

Family

ID=10566949

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585201381T Expired - Lifetime DE3576243D1 (de) 1984-09-19 1985-09-03 Halbleiteranordnung mit einem bipolar-transistor und mit einem fet mit isolierendem gate.

Country Status (5)

Country Link
US (1) US4729007A (de)
EP (1) EP0180255B1 (de)
JP (1) JPH0656881B2 (de)
DE (1) DE3576243D1 (de)
GB (1) GB2164790A (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2190539A (en) * 1986-05-16 1987-11-18 Philips Electronic Associated Semiconductor devices
JPH0654796B2 (ja) * 1986-07-14 1994-07-20 株式会社日立製作所 複合半導体装置
US4847671A (en) * 1987-05-19 1989-07-11 General Electric Company Monolithically integrated insulated gate semiconductor device
KR900001062B1 (ko) * 1987-09-15 1990-02-26 강진구 반도체 바이 씨 모오스 장치의 제조방법
US4830973A (en) * 1987-10-06 1989-05-16 Motorola, Inc. Merged complementary bipolar and MOS means and method
US5117274A (en) * 1987-10-06 1992-05-26 Motorola, Inc. Merged complementary bipolar and MOS means and method
IT1217323B (it) * 1987-12-22 1990-03-22 Sgs Microelettronica Spa Struttura integrata di transistor bipolare di potenza di alta tensione e di transistor mos di potenza di bassa tensione nella configurazione"emitter switching"e relativo processo di fabbricazione
US4998156A (en) * 1988-03-25 1991-03-05 General Electric Company Structure for a complementary-symmetry COMFET pair
US5247200A (en) * 1989-02-16 1993-09-21 Kabushiki Kaisha Toshiba MOSFET input type BiMOS IC device
DE3941932A1 (de) * 1989-12-19 1991-06-20 Eupec Gmbh & Co Kg Verfahren zum herstellen von anodenseitigen kurzschluessen in thyristoren
JPH0421211A (ja) * 1990-05-16 1992-01-24 Toshiba Corp 半導体素子の駆動方法およびその駆動装置
JPH0795597B2 (ja) * 1990-08-18 1995-10-11 三菱電機株式会社 サイリスタおよびその製造方法
JPH04280475A (ja) * 1991-03-08 1992-10-06 Fuji Electric Co Ltd 半導体スイッチング装置
US6004840A (en) * 1994-04-15 1999-12-21 Kabushiki Kaisha Toshiba Method of fabricating a semiconductor device comprising a MOS portion and a bipolar portion
DE69528683T2 (de) * 1994-04-15 2003-06-12 Toshiba Kawasaki Kk Halbleiterbauteil und Verfahren zur Herstellung desselben
US5913130A (en) * 1996-06-12 1999-06-15 Harris Corporation Method for fabricating a power device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3663869A (en) * 1971-01-26 1972-05-16 Westinghouse Electric Corp Bipolar-unipolar transistor structure
JPS5773964A (en) * 1980-10-27 1982-05-08 Oki Electric Ind Co Ltd Semiconductor integrated circuit device
FR2505102B1 (fr) * 1981-04-29 1986-01-24 Radiotechnique Compelec Amplificateur de type darlington forme d'un transistor a effet de champ et d'un transistor bipolaire, et sa realisation en structure semi-conductrice integree
US4441117A (en) * 1981-07-27 1984-04-03 Intersil, Inc. Monolithically merged field effect transistor and bipolar junction transistor
US5014102A (en) * 1982-04-01 1991-05-07 General Electric Company MOSFET-gated bipolar transistors and thyristors with both turn-on and turn-off capability having single-polarity gate input signal
DE3470632D1 (en) * 1983-02-03 1988-05-26 Fairchild Camera Instr Co High voltage mos/bipolar power transistor apparatus
US4611235A (en) * 1984-06-04 1986-09-09 General Motors Corporation Thyristor with turn-off FET

Also Published As

Publication number Publication date
EP0180255B1 (de) 1990-02-28
GB2164790A (en) 1986-03-26
JPS6177355A (ja) 1986-04-19
GB8423690D0 (en) 1984-10-24
JPH0656881B2 (ja) 1994-07-27
EP0180255A2 (de) 1986-05-07
US4729007A (en) 1988-03-01
EP0180255A3 (en) 1986-11-20

Similar Documents

Publication Publication Date Title
DE3576243D1 (de) Halbleiteranordnung mit einem bipolar-transistor und mit einem fet mit isolierendem gate.
DE3689445D1 (de) Schutzschaltung für einen Bipolartransistor mit isoliertem Gate.
DE3688222T2 (de) Halbleitereinrichtung mit bipolarem transistor und isolierschicht-feldeffekttransistor.
DE3382717D1 (de) Torschaltung mit Feldeffekt- und Bipolartransistoren.
DE3686971D1 (de) Lateraler transistor mit isoliertem gate mit latch-up-festigkeit.
DE3578271D1 (de) Feldeffekttransistor mit einem schottky-gate und herstellungsverfahren dafuer.
KR860004483A (ko) 헤테로 접합 바이폴라 트랜지스터
DE69021177T2 (de) Halbleiteranordnung mit isolierter Gateelektrode.
DE3576612D1 (de) Halbleiteranordnung mit mos-transistoren.
DE3381811D1 (de) Feldeffekttransistor mit isoliertem gate mit einem gate aus silizium.
KR860006138A (ko) 헤테로 접합 전계 효과 트랜지스터
DE3889610D1 (de) Halbleiteranordnung mit einem Trench-Bipolartransistor.
DE3787484T2 (de) Verdrahtungsentwurf für bipolare und unipolare Transistoren mit isoliertem Gate.
DE3782748D1 (de) Feldeffekttransistor mit isoliertem gate.
DE3579182D1 (de) Halbleiteranordnung mit einem treiberschaltungselement und einem ausgangstransistor.
DE3785483T2 (de) Halbleiteranordnung mit einem Bipolartransistor und Feldeffekttransistoren.
EP0184047A3 (en) Field-effect transistor with self-aligned gate and method for its manufacture
DE3687494T3 (de) Signalverarbeitungsanordnung mit einem Feldeffekttransistor und bipolaren Transistoren.
GB2162999B (en) Manufacturing insulated gate field effect transistors
EP0338312A3 (en) Insulated gate bipolar transistor
DE3686180T2 (de) Vertikaler mos-transistor mit peripherer schaltung.
DE3481796D1 (de) Feldeffekttransistor mit isolierter gateelektrode.
DE3671582D1 (de) Halbleiteranordnung mit einem schutztransistor.
DE3677627D1 (de) Halbleiteranordnung mit isoliertem gate.
DE3780895D1 (de) Komplementaerer feldeffekt-transistor mit isoliertem gate.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8339 Ceased/non-payment of the annual fee