DE3563754D1 - Method for coating optical substrates with antireflective coatings that can be etched - Google Patents

Method for coating optical substrates with antireflective coatings that can be etched

Info

Publication number
DE3563754D1
DE3563754D1 DE8585401784T DE3563754T DE3563754D1 DE 3563754 D1 DE3563754 D1 DE 3563754D1 DE 8585401784 T DE8585401784 T DE 8585401784T DE 3563754 T DE3563754 T DE 3563754T DE 3563754 D1 DE3563754 D1 DE 3563754D1
Authority
DE
Germany
Prior art keywords
enclosure
chromium
coating
chromium oxide
extinction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8585401784T
Other languages
English (en)
Inventor
Michel Letellier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DME
Original Assignee
DME
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DME filed Critical DME
Application granted granted Critical
Publication of DE3563754D1 publication Critical patent/DE3563754D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Laminated Bodies (AREA)
DE8585401784T 1984-09-19 1985-09-16 Method for coating optical substrates with antireflective coatings that can be etched Expired DE3563754D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8414369A FR2570392B1 (fr) 1984-09-19 1984-09-19 Procede de depot sur substrats optiques de couches antireflechissantes susceptibles d'etre gravees

Publications (1)

Publication Number Publication Date
DE3563754D1 true DE3563754D1 (en) 1988-08-18

Family

ID=9307861

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585401784T Expired DE3563754D1 (en) 1984-09-19 1985-09-16 Method for coating optical substrates with antireflective coatings that can be etched

Country Status (5)

Country Link
US (1) US4676992A (de)
EP (1) EP0178969B1 (de)
AT (1) ATE35697T1 (de)
DE (1) DE3563754D1 (de)
FR (1) FR2570392B1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU6705094A (en) * 1993-04-16 1994-11-08 Libbey-Owens-Ford Co. Method and apparatus for coating a glass substrate
US6231992B1 (en) 1998-09-04 2001-05-15 Yazaki Corporation Partial reflector
JP4447755B2 (ja) * 2000-08-28 2010-04-07 独立行政法人産業技術総合研究所 ＺｎＯ系酸化物半導体層の成長方法およびそれを用いた半導体発光素子の製法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE835203C (de) * 1948-10-02 1952-03-27 Physikalisches Untersuchungsla Verfahren zur genauen Bemessung der Schichtdicken beim Aufbringen reflexvermindernder Schichten auf optische Elemente durch Vakuumverdampfung oder Kathodenzerstaeubung
US2904452A (en) * 1956-04-16 1959-09-15 Heraeus Gmbh W C Oxide coating
US3208873A (en) * 1962-01-05 1965-09-28 Ibm Method and apparatus for depositing films of refractory metal oxides and refractory metals
FR1449361A (fr) * 1964-08-28 1966-08-12 Balzers Patent Beteilig Ag Procédé pour accroître la robustesse de la liaison entre des couches minces de matière
US3698928A (en) * 1967-11-14 1972-10-17 Fairchild Camera Instr Co Multilayer antireflective absorption film
US3808035A (en) * 1970-12-09 1974-04-30 M Stelter Deposition of single or multiple layers on substrates from dilute gas sweep to produce optical components, electro-optical components, and the like
JPS539060B1 (de) * 1971-05-24 1978-04-03
CH625054A5 (de) * 1976-12-27 1981-08-31 Balzers Hochvakuum
US4107349A (en) * 1977-08-12 1978-08-15 The United States Of America As Represented By The Secretary Of The Army Method of adjusting the frequency of piezoelectric resonators
US4172356A (en) * 1977-10-27 1979-10-30 Westland Industries, Inc. Yard rake
JPS57104141A (en) * 1980-12-22 1982-06-29 Dainippon Printing Co Ltd Photomask and photomask substrate
US4430366A (en) * 1981-02-04 1984-02-07 Minnesota Mining And Manufacturing Company Metal/metal oxide coating
JPS6053745B2 (ja) * 1981-07-31 1985-11-27 アルバツク成膜株式会社 二元蒸着によつて不均質光学的薄膜を形成する方法

Also Published As

Publication number Publication date
ATE35697T1 (de) 1988-07-15
EP0178969B1 (de) 1988-07-13
FR2570392B1 (fr) 1987-01-02
US4676992A (en) 1987-06-30
EP0178969A1 (de) 1986-04-23
FR2570392A1 (fr) 1986-03-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee