DE3561056D1 - Novel fluorine-containing acrylic acid derivative and polymer thereof - Google Patents
Novel fluorine-containing acrylic acid derivative and polymer thereofInfo
- Publication number
- DE3561056D1 DE3561056D1 DE8585108518T DE3561056T DE3561056D1 DE 3561056 D1 DE3561056 D1 DE 3561056D1 DE 8585108518 T DE8585108518 T DE 8585108518T DE 3561056 T DE3561056 T DE 3561056T DE 3561056 D1 DE3561056 D1 DE 3561056D1
- Authority
- DE
- Germany
- Prior art keywords
- polymer
- acrylic acid
- acid derivative
- containing acrylic
- novel fluorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/52—Amides or imides
- C08F20/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
- C08F20/60—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C57/00—Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms
- C07C57/52—Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms containing halogen
- C07C57/54—Halogenated acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/22—Esters containing halogen
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59142986A JPH0621109B2 (ja) | 1984-07-09 | 1984-07-09 | 含フツ素アクリル酸エステル |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3561056D1 true DE3561056D1 (en) | 1988-01-07 |
Family
ID=15328271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8585108518T Expired DE3561056D1 (en) | 1984-07-09 | 1985-07-09 | Novel fluorine-containing acrylic acid derivative and polymer thereof |
Country Status (5)
Country | Link |
---|---|
US (3) | US4943653A (de) |
EP (1) | EP0168032B1 (de) |
JP (1) | JPH0621109B2 (de) |
CA (1) | CA1260939A (de) |
DE (1) | DE3561056D1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3673068D1 (de) * | 1985-05-25 | 1990-09-06 | Hoechst Ag | Alpha-fluoracrylsaeureester und deren polymere. |
JPH0696485B2 (ja) * | 1987-08-28 | 1994-11-30 | ダイキン工業株式会社 | 歯科用材料 |
JPH0751695B2 (ja) * | 1987-09-28 | 1995-06-05 | ダイキン工業株式会社 | 生体材料用接着剤組成物 |
JP2686366B2 (ja) * | 1993-11-30 | 1997-12-08 | ファイザー・インコーポレーテッド | キラルテトラロンの製造方法 |
US6849377B2 (en) | 1998-09-23 | 2005-02-01 | E. I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
WO2000017712A1 (en) | 1998-09-23 | 2000-03-30 | E.I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
JP2000188503A (ja) | 1998-12-22 | 2000-07-04 | Yokowo Co Ltd | 携帯無線機用アンテナ |
KR100571453B1 (ko) * | 1999-12-15 | 2006-04-17 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 고분자 화합물, 화학 증폭 레지스트 재료 및 패턴 형성 방법 |
JP2002226435A (ja) * | 2001-02-07 | 2002-08-14 | Daikin Ind Ltd | 含フッ素化合物 |
JP3962893B2 (ja) | 2001-02-09 | 2007-08-22 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1445618A (fr) * | 1965-05-31 | 1966-07-15 | Centre Nat Rech Scient | Procédé pour l'obtention d'esters alpha-fluoracryliques, notamment d'alpha-fluoracrylate de butyle |
FR2444022A1 (fr) * | 1978-12-15 | 1980-07-11 | Onera (Off Nat Aerospatiale) | Monomere acrylique |
JPS59227908A (ja) * | 1983-06-10 | 1984-12-21 | Daikin Ind Ltd | 光学繊維プラスチック系さや材 |
-
1984
- 1984-07-09 JP JP59142986A patent/JPH0621109B2/ja not_active Expired - Fee Related
-
1985
- 1985-06-28 CA CA000485798A patent/CA1260939A/en not_active Expired
- 1985-07-09 DE DE8585108518T patent/DE3561056D1/de not_active Expired
- 1985-07-09 EP EP85108518A patent/EP0168032B1/de not_active Expired
-
1987
- 1987-02-26 US US07/020,133 patent/US4943653A/en not_active Expired - Lifetime
-
1989
- 1989-05-24 US US07/356,206 patent/US5117035A/en not_active Expired - Lifetime
- 1989-09-13 US US07/406,545 patent/US5112973A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA1260939A (en) | 1989-09-26 |
JPS6121110A (ja) | 1986-01-29 |
EP0168032A1 (de) | 1986-01-15 |
JPH0621109B2 (ja) | 1994-03-23 |
EP0168032B1 (de) | 1987-11-25 |
US4943653A (en) | 1990-07-24 |
US5117035A (en) | 1992-05-26 |
US5112973A (en) | 1992-05-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |