DE3521549A1 - Verfahren zur messung und/oder regelung eines teilchenstromes - Google Patents

Verfahren zur messung und/oder regelung eines teilchenstromes

Info

Publication number
DE3521549A1
DE3521549A1 DE19853521549 DE3521549A DE3521549A1 DE 3521549 A1 DE3521549 A1 DE 3521549A1 DE 19853521549 DE19853521549 DE 19853521549 DE 3521549 A DE3521549 A DE 3521549A DE 3521549 A1 DE3521549 A1 DE 3521549A1
Authority
DE
Germany
Prior art keywords
particle
substrate
source
particle flow
regulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19853521549
Other languages
German (de)
English (en)
Other versions
DE3521549C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Karl-Heinz 7907 Langenau Hieber
Helmut Dipl.-Phys. 7929 Gerstetten Jorke
Horst Ing.(grad.) 7904 Erbach Kibbel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mercedes Benz Group AG
Original Assignee
Licentia Patent Verwaltungs GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Licentia Patent Verwaltungs GmbH filed Critical Licentia Patent Verwaltungs GmbH
Priority to DE19853521549 priority Critical patent/DE3521549A1/de
Publication of DE3521549A1 publication Critical patent/DE3521549A1/de
Application granted granted Critical
Publication of DE3521549C2 publication Critical patent/DE3521549C2/de
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
DE19853521549 1985-06-15 1985-06-15 Verfahren zur messung und/oder regelung eines teilchenstromes Granted DE3521549A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19853521549 DE3521549A1 (de) 1985-06-15 1985-06-15 Verfahren zur messung und/oder regelung eines teilchenstromes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19853521549 DE3521549A1 (de) 1985-06-15 1985-06-15 Verfahren zur messung und/oder regelung eines teilchenstromes

Publications (2)

Publication Number Publication Date
DE3521549A1 true DE3521549A1 (de) 1986-12-18
DE3521549C2 DE3521549C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-02-25

Family

ID=6273400

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19853521549 Granted DE3521549A1 (de) 1985-06-15 1985-06-15 Verfahren zur messung und/oder regelung eines teilchenstromes

Country Status (1)

Country Link
DE (1) DE3521549A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1773242B2 (de) * 1967-04-21 1974-01-10 Battelle Development Corp., Columbus, Ohio (V.St.A.) Mißgerät zur Ermittlung und Regelung der Verdampfungsgeschwindigkeit von im Vakuum verdampften Substanzen

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1773242B2 (de) * 1967-04-21 1974-01-10 Battelle Development Corp., Columbus, Ohio (V.St.A.) Mißgerät zur Ermittlung und Regelung der Verdampfungsgeschwindigkeit von im Vakuum verdampften Substanzen

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP 58-1 30 272 A, Pat. Abstr. JP C-192, 27.10.83, Vol. 7, No. 242 *

Also Published As

Publication number Publication date
DE3521549C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-02-25

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8320 Willingness to grant licences declared (paragraph 23)
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: DAIMLER-BENZ AKTIENGESELLSCHAFT, 70567 STUTTGART,

8327 Change in the person/name/address of the patent owner

Owner name: DAIMLERCHRYSLER AG, 70567 STUTTGART, DE

8339 Ceased/non-payment of the annual fee