DE3481127D1 - Photocopolymerisierbare massen auf basis von epoxiden, polyolen und einem substituierten cycloaliphatischen monoepoxid als reaktivem verduenner. - Google Patents
Photocopolymerisierbare massen auf basis von epoxiden, polyolen und einem substituierten cycloaliphatischen monoepoxid als reaktivem verduenner.Info
- Publication number
- DE3481127D1 DE3481127D1 DE8484101196T DE3481127T DE3481127D1 DE 3481127 D1 DE3481127 D1 DE 3481127D1 DE 8484101196 T DE8484101196 T DE 8484101196T DE 3481127 T DE3481127 T DE 3481127T DE 3481127 D1 DE3481127 D1 DE 3481127D1
- Authority
- DE
- Germany
- Prior art keywords
- photocopolymerizable
- epoxies
- polyols
- reactive thinner
- substituted cycloaliphatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004593 Epoxy Substances 0.000 title 1
- 229920005862 polyol Polymers 0.000 title 1
- 150000003077 polyols Chemical class 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
- C08G59/145—Compounds containing one epoxy group
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Emergency Medicine (AREA)
- General Chemical & Material Sciences (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46457183A | 1983-02-07 | 1983-02-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3481127D1 true DE3481127D1 (de) | 1990-03-01 |
Family
ID=23844446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8484101196T Expired - Lifetime DE3481127D1 (de) | 1983-02-07 | 1984-02-06 | Photocopolymerisierbare massen auf basis von epoxiden, polyolen und einem substituierten cycloaliphatischen monoepoxid als reaktivem verduenner. |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0119425B1 (enExample) |
| JP (1) | JPS59147018A (enExample) |
| CA (1) | CA1243147A (enExample) |
| DE (1) | DE3481127D1 (enExample) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61128245A (ja) * | 1984-11-27 | 1986-06-16 | Konishiroku Photo Ind Co Ltd | 写真用支持体の製造法 |
| CA1289803C (en) * | 1985-10-28 | 1991-10-01 | Robert J. Cox | Photoresist composition and printed circuit boards and packages made therewith |
| DE3806745A1 (de) * | 1988-03-02 | 1989-09-14 | Henkel Kgaa | Lichtinduziert dunkelhaertende klebstoffe |
| WO1996013538A2 (en) * | 1994-10-31 | 1996-05-09 | Minnesota Mining And Manufacturing Company | Visible-light curable epoxy system with enhanced depth of cure |
| US5856373A (en) * | 1994-10-31 | 1999-01-05 | Minnesota Mining And Manufacturing Company | Dental visible light curable epoxy system with enhanced depth of cure |
| WO1998029470A1 (en) * | 1996-12-30 | 1998-07-09 | Daicel Chemical Industries, Ltd. | Polyester elastomers, processes for preparing the same, and compositions of the same |
| DE19753461A1 (de) | 1997-12-02 | 1999-06-10 | Espe Dental Ag | Lagerstabile kationisch polymerisierende Zubereitungen mit verbessertem Härtungsverhalten |
| US6918487B2 (en) | 2003-02-12 | 2005-07-19 | Graphic Packaging International, Inc. | Dispensing system for double stack carton |
| US7614497B2 (en) | 2003-10-15 | 2009-11-10 | Graphic Packaging International, Inc. | Display/vending carton |
| EP2199856B1 (en) | 2008-12-18 | 2013-08-07 | Agfa Graphics N.V. | Cationic radiation curable compositions |
| US9310676B2 (en) | 2009-08-21 | 2016-04-12 | Basf Se | Apparatus and method for a sub microscopic and optically variable image carrying device |
| JP5519685B2 (ja) * | 2009-10-09 | 2014-06-11 | 日本化薬株式会社 | 硬化性樹脂組成物、及びその硬化物 |
| JP5850863B2 (ja) | 2010-02-24 | 2016-02-03 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | 潜在性酸及びそれらの使用 |
| TW201335295A (zh) | 2011-11-30 | 2013-09-01 | 西克帕控股公司 | 經標記之塗層組成物及其認證之方法 |
| RU2598279C9 (ru) | 2012-08-01 | 2016-11-27 | Сикпа Холдинг Са | Оптически переменные защитные нити и ленты |
| PT2912125T (pt) | 2012-10-29 | 2017-01-03 | Sicpa Holding Sa | Revestimentos protetores para documentos de segurança |
| JP5939963B2 (ja) * | 2012-11-22 | 2016-06-29 | 日本化薬株式会社 | 感光性樹脂組成物、レジスト積層体及びそれらの硬化物 |
| JP5939965B2 (ja) * | 2012-11-22 | 2016-06-29 | 日本化薬株式会社 | 感光性樹脂組成物、レジスト積層体及びそれらの硬化物 |
| JP5939964B2 (ja) * | 2012-11-22 | 2016-06-29 | 日本化薬株式会社 | 感光性樹脂組成物、レジスト積層体及びそれらの硬化物 |
| JP6021180B2 (ja) * | 2012-11-22 | 2016-11-09 | 日本化薬株式会社 | 感光性樹脂組成物、レジスト積層体及びそれらの硬化物 |
| DE102013211047B4 (de) | 2013-06-13 | 2015-04-30 | MTU Aero Engines AG | Verfahren zum Verschließen von Kühlluftbohrungen |
| CN107207456B (zh) | 2015-02-02 | 2021-05-04 | 巴斯夫欧洲公司 | 潜酸及其用途 |
| TW201703879A (zh) | 2015-06-02 | 2017-02-01 | 西克帕控股有限公司 | 用於生產光學效應層之製程 |
| MX2020012221A (es) | 2018-05-15 | 2021-01-29 | Sicpa Holding Sa | Caracteristicas de seguridad legibles por maquina. |
| TWI829917B (zh) | 2019-05-28 | 2024-01-21 | 瑞士商西克帕控股有限公司 | 安全性墨水以及機器可讀式安全性特徵 |
| FR3131585B1 (fr) * | 2021-12-30 | 2025-02-28 | Arkema France | Époxydes cycloaliphatiques polymériques |
| AR130228A1 (es) | 2022-08-23 | 2024-11-20 | Sicpa Holding Sa | Composición de tinta de seguridad y característica de seguridad legible por máquina derivada de la misma |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4256828A (en) * | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
| JPS608246B2 (ja) * | 1980-11-03 | 1985-03-01 | ユニオン・カ−バイド・コ−ポレ−シヨン | 硬化し得るエポキシ樹脂含有組成物 |
-
1984
- 1984-01-19 CA CA000445640A patent/CA1243147A/en not_active Expired
- 1984-02-06 JP JP1853084A patent/JPS59147018A/ja active Granted
- 1984-02-06 DE DE8484101196T patent/DE3481127D1/de not_active Expired - Lifetime
- 1984-02-06 EP EP84101196A patent/EP0119425B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6340442B2 (enExample) | 1988-08-11 |
| CA1243147A (en) | 1988-10-11 |
| EP0119425B1 (en) | 1990-01-24 |
| JPS59147018A (ja) | 1984-08-23 |
| EP0119425A1 (en) | 1984-09-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8363 | Opposition against the patent | ||
| 8331 | Complete revocation |