DE3477022D1 - Laser induced chemical etching of metals with excimer lasers - Google Patents

Laser induced chemical etching of metals with excimer lasers

Info

Publication number
DE3477022D1
DE3477022D1 DE8484115012T DE3477022T DE3477022D1 DE 3477022 D1 DE3477022 D1 DE 3477022D1 DE 8484115012 T DE8484115012 T DE 8484115012T DE 3477022 T DE3477022 T DE 3477022T DE 3477022 D1 DE3477022 D1 DE 3477022D1
Authority
DE
Germany
Prior art keywords
metals
chemical etching
laser induced
excimer lasers
induced chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484115012T
Other languages
English (en)
Inventor
Lee Chen
John Robert Lankard
Gangadhara Swami Mathad
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3477022D1 publication Critical patent/DE3477022D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
    • C23F4/02—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00 by evaporation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/027—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
DE8484115012T 1984-01-24 1984-12-11 Laser induced chemical etching of metals with excimer lasers Expired DE3477022D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/573,452 US4490211A (en) 1984-01-24 1984-01-24 Laser induced chemical etching of metals with excimer lasers

Publications (1)

Publication Number Publication Date
DE3477022D1 true DE3477022D1 (en) 1989-04-13

Family

ID=24292051

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484115012T Expired DE3477022D1 (en) 1984-01-24 1984-12-11 Laser induced chemical etching of metals with excimer lasers

Country Status (4)

Country Link
US (1) US4490211A (de)
EP (1) EP0149779B1 (de)
JP (1) JPS60187026A (de)
DE (1) DE3477022D1 (de)

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GB9207054D0 (en) * 1992-03-31 1992-05-13 Gillette Co Methods of manufacturing perforated foils
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US5364493A (en) * 1993-05-06 1994-11-15 Litel Instruments Apparatus and process for the production of fine line metal traces
JP2951215B2 (ja) * 1993-09-10 1999-09-20 レイセオン・カンパニー 位相マスクレーザによる微細なパターンの電子相互接続構造の製造方法
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US5800724A (en) * 1996-02-14 1998-09-01 Fort James Corporation Patterned metal foil laminate and method for making same
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US6730237B2 (en) * 2001-06-22 2004-05-04 International Business Machines Corporation Focused ion beam process for removal of copper
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US7244474B2 (en) 2004-03-26 2007-07-17 Applied Materials, Inc. Chemical vapor deposition plasma process using an ion shower grid
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US8058156B2 (en) 2004-07-20 2011-11-15 Applied Materials, Inc. Plasma immersion ion implantation reactor having multiple ion shower grids
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JP4269295B2 (ja) * 2007-02-20 2009-05-27 セイコーエプソン株式会社 微細構造体の製造方法
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JP5710645B2 (ja) * 2010-12-17 2015-04-30 タツモ株式会社 パターニング方法
US8501613B2 (en) * 2011-07-07 2013-08-06 Taiwan Semiconductor Manufacturing Company, Ltd. UBM etching methods for eliminating undercut
US9576810B2 (en) 2013-10-03 2017-02-21 Applied Materials, Inc. Process for etching metal using a combination of plasma and solid state sources
CN109374596B (zh) * 2018-11-08 2021-09-10 天津大学 基于激光诱导击穿光谱的便携式烟气重金属元素检测系统

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US3364087A (en) * 1964-04-27 1968-01-16 Varian Associates Method of using laser to coat or etch substrate
US3772496A (en) * 1971-10-26 1973-11-13 Western Electric Co Methods of forming a conductive path using an oxygen plasma to reduce reflectivity prior to laser machining
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US4490211A (en) * 1984-01-24 1984-12-25 International Business Machines Corporation Laser induced chemical etching of metals with excimer lasers

Also Published As

Publication number Publication date
EP0149779A3 (en) 1986-08-13
EP0149779A2 (de) 1985-07-31
EP0149779B1 (de) 1989-03-08
JPS60187026A (ja) 1985-09-24
US4490211A (en) 1984-12-25

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Legal Events

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8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee