DE3475838D1 - Radiation-sensitive polymer composition - Google Patents

Radiation-sensitive polymer composition

Info

Publication number
DE3475838D1
DE3475838D1 DE8484305564T DE3475838T DE3475838D1 DE 3475838 D1 DE3475838 D1 DE 3475838D1 DE 8484305564 T DE8484305564 T DE 8484305564T DE 3475838 T DE3475838 T DE 3475838T DE 3475838 D1 DE3475838 D1 DE 3475838D1
Authority
DE
Germany
Prior art keywords
radiation
polymer composition
sensitive polymer
sensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484305564T
Other languages
English (en)
Inventor
Gentaro Ohbayashi
Susumu Umemoto
Hiroo Hiramoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Application granted granted Critical
Publication of DE3475838D1 publication Critical patent/DE3475838D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
DE8484305564T 1983-08-17 1984-08-16 Radiation-sensitive polymer composition Expired DE3475838D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58149169A JPS6042425A (ja) 1983-08-17 1983-08-17 化学線感応性重合体組成物

Publications (1)

Publication Number Publication Date
DE3475838D1 true DE3475838D1 (en) 1989-02-02

Family

ID=15469302

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484305564T Expired DE3475838D1 (en) 1983-08-17 1984-08-16 Radiation-sensitive polymer composition

Country Status (5)

Country Link
US (1) US4783391A (de)
EP (1) EP0137655B1 (de)
JP (1) JPS6042425A (de)
DE (1) DE3475838D1 (de)
SG (1) SG28789G (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4822718A (en) * 1982-09-30 1989-04-18 Brewer Science, Inc. Light absorbing coating
US4950583A (en) * 1986-09-17 1990-08-21 Brewer Science Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith
JPH02294649A (ja) * 1989-05-09 1990-12-05 Toray Ind Inc 化学線感応性重合体組成物
JP2890491B2 (ja) * 1989-07-04 1999-05-17 東レ株式会社 化学線感応性重合体組成物
JP2949813B2 (ja) * 1989-09-19 1999-09-20 東レ株式会社 化学線感応性重合体組成物
EP0431971B1 (de) * 1989-12-07 1995-07-19 Kabushiki Kaisha Toshiba Lichtempfindliche Zusammensetzung und harzumhüllte Halbleiteranordnung
US5310862A (en) * 1991-08-20 1994-05-10 Toray Industries, Inc. Photosensitive polyimide precursor compositions and process for preparing same
JP2814442B2 (ja) * 1991-10-25 1998-10-22 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性ポリイミドプリカーサー組成物
JP3687988B2 (ja) 1993-09-03 2005-08-24 日立化成工業株式会社 ｉ線ステッパ用感光性樹脂組成物
US6071667A (en) * 1995-04-13 2000-06-06 Hitachi Chemical Co., Ltd. Photosensitive resin composition containing a photosensitive polyamide resin

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA594690A (en) * 1960-03-22 Max Wagner Hans Aryl azides and colloidal material for lithography
DE1597614B2 (de) * 1967-07-07 1977-06-23 Hoechst Ag, 6000 Frankfurt Lichtempfindliche kopiermasse
US4191573A (en) * 1974-10-09 1980-03-04 Fuji Photo Film Co., Ltd. Photosensitive positive image forming process with two photo-sensitive layers
JPS51149021A (en) * 1974-12-28 1976-12-21 Fuji Yakuhin Kogyo Kk Water soluble photosensitive resin composition
JPS5952822B2 (ja) * 1978-04-14 1984-12-21 東レ株式会社 耐熱性感光材料
DE2948324C2 (de) * 1978-12-01 1993-01-14 Hitachi, Ltd., Tokio/Tokyo Lichtempfindliches Gemisch, enthaltend eine Bisazidverbindung, und Verfahren zur Bildung von Mustern
JPS56167139A (en) * 1980-05-27 1981-12-22 Daikin Ind Ltd Sensitive material
JPS57102926A (en) * 1980-12-17 1982-06-26 Hitachi Ltd Light- or radiation-sensitive polymer composition
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
JPS5867724A (ja) * 1981-10-19 1983-04-22 Hitachi Ltd 感光性重合体組成物
JPS57168942A (en) * 1981-04-13 1982-10-18 Hitachi Ltd Photosensitive polymer composition
KR880002518B1 (ko) * 1981-07-15 1988-11-26 미다가쓰시께 방사선 감응성 조성물
JPS58223149A (ja) * 1982-06-22 1983-12-24 Toray Ind Inc 感光性ポリイミド用現像液
JPH0658534B2 (ja) * 1983-03-03 1994-08-03 東レ株式会社 化学線感応性重合体組成物
EP0119719B1 (de) * 1983-03-03 1987-05-06 Toray Industries, Inc. Strahlungsempfindliche Polymermasse

Also Published As

Publication number Publication date
US4783391A (en) 1988-11-08
EP0137655A3 (en) 1985-09-18
JPS6042425A (ja) 1985-03-06
EP0137655B1 (de) 1988-12-28
SG28789G (en) 1989-12-22
JPH0124415B2 (de) 1989-05-11
EP0137655A2 (de) 1985-04-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee