DE3370078D1 - Process for fabricating integrated optics - Google Patents

Process for fabricating integrated optics

Info

Publication number
DE3370078D1
DE3370078D1 DE8383110986T DE3370078T DE3370078D1 DE 3370078 D1 DE3370078 D1 DE 3370078D1 DE 8383110986 T DE8383110986 T DE 8383110986T DE 3370078 T DE3370078 T DE 3370078T DE 3370078 D1 DE3370078 D1 DE 3370078D1
Authority
DE
Germany
Prior art keywords
integrated optics
fabricating integrated
fabricating
optics
integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383110986T
Other languages
English (en)
Inventor
Kenji Osaka Works Of Okamato
Yoshikazu Osaka Work Nishiwaki
Shunji Osaka Works Of Matsuoka
Yozo Osaka Works Of Nishiura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP19415082A external-priority patent/JPS5983111A/ja
Priority claimed from JP19481782A external-priority patent/JPS5984205A/ja
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE3370078D1 publication Critical patent/DE3370078D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/124—Geodesic lenses or integrated gratings

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
DE8383110986T 1982-11-04 1983-11-03 Process for fabricating integrated optics Expired DE3370078D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP19415082A JPS5983111A (ja) 1982-11-04 1982-11-04 光集積回路作製法
JP19481782A JPS5984205A (ja) 1982-11-06 1982-11-06 光集積回路作製法

Publications (1)

Publication Number Publication Date
DE3370078D1 true DE3370078D1 (en) 1987-04-09

Family

ID=26508339

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383110986T Expired DE3370078D1 (en) 1982-11-04 1983-11-03 Process for fabricating integrated optics

Country Status (3)

Country Link
US (1) US4517280A (de)
EP (1) EP0110184B1 (de)
DE (1) DE3370078D1 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62140485A (ja) * 1985-12-16 1987-06-24 Hitachi Ltd 半導体構造体およびその製造方法
US4787690A (en) * 1986-03-24 1988-11-29 Siemens Aktiengesellschaft Cut-off filter for integrated optics
GB2191304B (en) * 1986-06-03 1990-01-04 Stc Plc Integrated optical channel waveguides
US5007709A (en) * 1987-12-28 1991-04-16 Matsushita Electric Industrial Co., Ltd. Diffraction grating and manufacturing method thereof
KR950008384B1 (ko) * 1992-12-10 1995-07-28 삼성전자주식회사 패턴의 형성방법
US5413884A (en) * 1992-12-14 1995-05-09 American Telephone And Telegraph Company Grating fabrication using electron beam lithography
FR2743192B1 (fr) * 1995-12-28 1998-02-06 Alcatel Optronics Procede pour integrer un reseau de bragg localise dans un semi-conducteur
US6255038B1 (en) * 1996-06-10 2001-07-03 Optical Switch Corporation Process for modulating interferometric lithography patterns to record selected discrete patterns in photoresist
US20020028390A1 (en) 1997-09-22 2002-03-07 Mohammad A. Mazed Techniques for fabricating and packaging multi-wavelength semiconductor laser array devices (chips) and their applications in system architectures
DE10059268C1 (de) * 2000-11-29 2002-08-22 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Herstellung eines Koppelgitters für einen Wellenleiter
WO2004019080A2 (en) * 2002-08-26 2004-03-04 University Of Delaware Method for fabricating optical devices in photonic crystal structures
KR20050051652A (ko) * 2002-08-28 2005-06-01 유니버시티 오브 피츠버그 제어된 대칭과 정렬을 갖는 자기-편제 나노포어 어레이
US7005235B2 (en) * 2002-12-04 2006-02-28 Taiwan Semiconductor Manufacturing Co., Ltd. Method and systems to print contact hole patterns
US8110345B2 (en) * 2002-12-04 2012-02-07 Taiwan Semiconductor Manufacturing Company, Ltd. High resolution lithography system and method
BR0215865B1 (pt) * 2002-12-05 2011-04-05 dispositivo de contagem.
US20050074698A1 (en) * 2003-10-07 2005-04-07 Intel Corporation Composite optical lithography method for patterning lines of significantly different widths
US20050073671A1 (en) * 2003-10-07 2005-04-07 Intel Corporation Composite optical lithography method for patterning lines of substantially equal width
US7142282B2 (en) 2003-10-17 2006-11-28 Intel Corporation Device including contacts
US20050085085A1 (en) * 2003-10-17 2005-04-21 Yan Borodovsky Composite patterning with trenches
US20050088633A1 (en) * 2003-10-24 2005-04-28 Intel Corporation Composite optical lithography method for patterning lines of unequal width
KR100668611B1 (ko) * 2004-10-04 2007-01-16 엘지전자 주식회사 파장필터 하부 클래딩층의 패턴 제작을 위한 몰드 및도파로형 파장필터의 제작방법
WO2006085741A1 (en) * 2005-02-09 2006-08-17 Stichting Dutch Polymer Institute Process for preparing a polymeric relief structure
US8008213B2 (en) * 2008-09-30 2011-08-30 Sandisk 3D Llc Self-assembly process for memory array
EP2187254A1 (de) 2008-11-18 2010-05-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Elektrisch schaltbares optisches Gitter mit DFB-Laser-Eigenschaften, dieses umfassender DFB-Laser, und zugehöriges Herstellungsverfahren

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB896934A (en) * 1959-05-21 1962-05-23 Ass Elect Ind Improvements relating to diffraction gratings
DE1798372A1 (de) * 1967-03-28 1972-08-10 Rudolph Dietbert Dipl Phys Verfahren zur Herstellung von Reflexions- und Transmissionsgittern
US3733258A (en) * 1971-02-03 1973-05-15 Rca Corp Sputter-etching technique for recording holograms or other fine-detail relief patterns in hard durable materials
DE2248338A1 (de) * 1972-10-02 1974-04-18 Siemens Ag Verfahren zur herstellung von dielektrischen optischen lichtleiterbahnen
US3961102A (en) * 1974-09-13 1976-06-01 Cornwell Research Foundation, Inc. Scanning electron microscope fabrication of optical gratings
GB1574910A (en) * 1976-04-07 1980-09-10 Rca Corp Fabrication of diffractive subtractive filter embossing master
FR2399736A1 (fr) * 1977-08-05 1979-03-02 Thomson Csf Procede de fabrication d'une structure electro-optique comportant une electrode integree et composant optoelectronique utilisant ladite structure
US4241109A (en) * 1979-04-30 1980-12-23 Bell Telephone Laboratories, Incorporated Technique for altering the profile of grating relief patterns
JPS56161582A (en) * 1980-05-14 1981-12-11 Sony Corp Production of in-line hologram lens
US4321282A (en) * 1981-02-06 1982-03-23 Bell Telephone Laboratories, Incorporated Surface gratings and a method of increasing their spatial frequency
US4426440A (en) * 1982-11-18 1984-01-17 The United States Of America As Represented By The Secretary Of The Army Integrated optical grating device by thermal SiO2 growth on Si

Also Published As

Publication number Publication date
EP0110184B1 (de) 1987-03-04
US4517280A (en) 1985-05-14
EP0110184A1 (de) 1984-06-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee