DE3364516D1 - Photosensitive composition and pattern forming process using same - Google Patents

Photosensitive composition and pattern forming process using same

Info

Publication number
DE3364516D1
DE3364516D1 DE8383107030T DE3364516T DE3364516D1 DE 3364516 D1 DE3364516 D1 DE 3364516D1 DE 8383107030 T DE8383107030 T DE 8383107030T DE 3364516 T DE3364516 T DE 3364516T DE 3364516 D1 DE3364516 D1 DE 3364516D1
Authority
DE
Germany
Prior art keywords
same
forming process
pattern forming
photosensitive composition
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383107030T
Other languages
English (en)
Inventor
Hajime Morishita
Motoo Akagi
Saburo Nonogaki
Nobuaki Hayashi
Shoichi Uchino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE3364516D1 publication Critical patent/DE3364516D1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
    • H01J29/18—Luminescent screens
    • H01J29/20—Luminescent screens characterised by the luminescent material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
    • H01J29/18—Luminescent screens
    • H01J29/22—Luminescent screens characterised by the binder or adhesive for securing the luminescent material to its support, e.g. vessel
    • H01J29/225—Luminescent screens characterised by the binder or adhesive for securing the luminescent material to its support, e.g. vessel photosensitive adhesive
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/28—Processing photosensitive materials; Apparatus therefor for obtaining powder images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Luminescent Compositions (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE8383107030T 1982-08-11 1983-07-18 Photosensitive composition and pattern forming process using same Expired DE3364516D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57138534A JPS5929245A (ja) 1982-08-11 1982-08-11 感光性組成物及びそれを用いたパタ−ン形成方法

Publications (1)

Publication Number Publication Date
DE3364516D1 true DE3364516D1 (en) 1986-08-21

Family

ID=15224396

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383107030T Expired DE3364516D1 (en) 1982-08-11 1983-07-18 Photosensitive composition and pattern forming process using same

Country Status (5)

Country Link
US (1) US4510226A (de)
EP (1) EP0100920B1 (de)
JP (1) JPS5929245A (de)
KR (1) KR870001192B1 (de)
DE (1) DE3364516D1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61258242A (ja) * 1985-04-17 1986-11-15 Hitachi Ltd 感光性組成物及びそれを用いたパタ−ン形成方法
EP0616702B1 (de) * 1991-12-12 2001-05-30 E.I. Du Pont De Nemours And Company Wässrig entwickelbares, tonbares aufzeichnungselement
KR100450213B1 (ko) * 1997-07-29 2004-12-03 삼성에스디아이 주식회사 포토레지스트조성물

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1760780A (en) * 1927-09-06 1930-05-27 Kalle & Co Ag Light-sensitive layers and process of preparing them
DE1572058A1 (de) * 1964-12-30 1970-03-05 Keuffel & Esser Co Reprographisches Verfahren
ZA6705261B (de) * 1966-09-02
AT296345B (de) * 1968-12-09 1972-02-10 Kalle Ag Lichtempfindliches Kopiermaterial zum Herstellen einer Druckform
FI71851C (fi) * 1977-04-13 1987-02-09 Hitachi Ltd Foerfarande foer bildande av ett pulverbelaeggningsskikt enligt moenster pao en bildyta av ett faergbildroer.
GB2005855A (en) * 1977-10-03 1979-04-25 Polychrome Corp Lithographic imaging composition having improved image visibility
JPS579036A (en) * 1980-06-20 1982-01-18 Hitachi Ltd Formation of pattern by using photosensitive compound
KR850001415B1 (ko) * 1980-07-04 1985-09-30 가부시기가이샤 히다찌 세이사꾸쇼 감광성 조성물(感光性組成物)
JPS5772140A (en) * 1980-10-22 1982-05-06 Hitachi Ltd Photosensitive composition and formation of pattern

Also Published As

Publication number Publication date
JPS5929245A (ja) 1984-02-16
US4510226A (en) 1985-04-09
EP0100920B1 (de) 1986-07-16
KR840006099A (ko) 1984-11-21
KR870001192B1 (ko) 1987-06-16
EP0100920A1 (de) 1984-02-22

Similar Documents

Publication Publication Date Title
GB8334034D0 (en) Forming pattern pieces
DE3272511D1 (en) Pattern forming apparatus
GB8501765D0 (en) Exposure apparatus
EP0122398A3 (en) Pattern forming material and method for forming pattern therewith
DE3370700D1 (en) Photosensitive composition
GB8411412D0 (en) Forming resist pattern
GB2078762B (en) Printing compositions and process
GB8302027D0 (en) Colour image forming process
DE3463856D1 (en) Image-forming process
DE3067020D1 (en) Photosensitive composition and pattern-forming method
EP0136421A3 (en) Microlithographic process
DE3377301D1 (en) Photomask
ZA836151B (en) Post-exposure process
EP0164598A3 (en) Photosensitive resin composition and process for forming photo-resist pattern using the same
GB8416447D0 (en) Process
DE3465637D1 (en) Image-forming process
DE3169809D1 (en) Photosensitive composition and pattern forming process using same
GB2126508B (en) Forming apparatus
GB8322786D0 (en) Patterns
GB8302573D0 (en) Benzothienylallylamines process
DE3364516D1 (en) Photosensitive composition and pattern forming process using same
GB2118731B (en) Electrophotographic process
DE3273273D1 (en) Method of forming pattern
GB8410828D0 (en) Eye-beautifying mask
GB8719664D0 (en) Exposure method

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee