DE3361442D1 - Photosensitive polymer composition - Google Patents

Photosensitive polymer composition

Info

Publication number
DE3361442D1
DE3361442D1 DE8383300029T DE3361442T DE3361442D1 DE 3361442 D1 DE3361442 D1 DE 3361442D1 DE 8383300029 T DE8383300029 T DE 8383300029T DE 3361442 T DE3361442 T DE 3361442T DE 3361442 D1 DE3361442 D1 DE 3361442D1
Authority
DE
Germany
Prior art keywords
polymer composition
photosensitive polymer
photosensitive
composition
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383300029T
Other languages
English (en)
Inventor
Junichi Fujikawa
Hiroshi C O Toray Hokue Mataki
Chiaki Tanaka
Shinobu Nakashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Application granted granted Critical
Publication of DE3361442D1 publication Critical patent/DE3361442D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE8383300029T 1982-01-06 1983-01-05 Photosensitive polymer composition Expired DE3361442D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57000669A JPS58117537A (ja) 1982-01-06 1982-01-06 感光性樹脂組成物

Publications (1)

Publication Number Publication Date
DE3361442D1 true DE3361442D1 (en) 1986-01-23

Family

ID=11480146

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383300029T Expired DE3361442D1 (en) 1982-01-06 1983-01-05 Photosensitive polymer composition

Country Status (4)

Country Link
US (1) US4464456A (de)
EP (1) EP0085472B1 (de)
JP (1) JPS58117537A (de)
DE (1) DE3361442D1 (de)

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CH662356A5 (fr) * 1985-04-04 1987-09-30 Firmenich & Cie Article pour la diffusion de vapeurs assaississantes a base de resine polyamide et polyether.
EP0273113B1 (de) * 1986-12-26 1991-01-23 Toray Industries, Inc. Lichtempfindliche Photopolymerzusammensetzung und Druckplatte
DE68906723T2 (de) * 1988-06-10 1994-01-20 Asahi Chemical Ind Thermoplastisches Elastomer und darauf basierende lichtempfindliche Harzzusammensetzung und Druckplattenvorläufer, der die Zusammensetzung enthält.
IT1226148B (it) * 1988-07-04 1990-12-19 Ausimont Spa Copoliesteri termoplastici segmentati aventi proprieta' elastomeriche.
AU637578B2 (en) * 1988-08-08 1993-06-03 Dsm N.V. Photocurable compositions and method of investment casting
GB2235927B (en) * 1989-09-14 1992-10-21 Asahi Chemical Ind A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same
US5482995A (en) * 1989-10-19 1996-01-09 Elf Atochem S.A. Grafted block copolymers, process for their manufacture and use of these copolymers
US5238783A (en) * 1990-04-16 1993-08-24 Toray Industries, Inc. Photosensitive polymer composition for water developable flexographic printing plate
US5484502A (en) * 1990-08-03 1996-01-16 Ford Motor Company UV-hard coat transfer
JP3362797B2 (ja) 1993-04-30 2003-01-07 東洋紡績株式会社 印刷原版用感光性樹脂積層体
DE19536808A1 (de) * 1995-10-02 1997-04-03 Basf Lacke & Farben Verfahren zur Herstellung von photopolymeren Hochdruckplatten
DE19536806A1 (de) * 1995-10-02 1997-04-03 Basf Lacke & Farben Verfahren zur Herstellung von photopolymeren Tiefdruckplatten
US20040009535A1 (en) 1998-11-27 2004-01-15 Celltech R&D, Inc. Compositions and methods for increasing bone mineralization
US7572631B2 (en) * 2000-02-24 2009-08-11 Invitrogen Corporation Activation and expansion of T cells
US7541184B2 (en) 2000-02-24 2009-06-02 Invitrogen Corporation Activation and expansion of cells
WO2003067221A2 (en) * 2002-02-08 2003-08-14 Xcyte Therapies, Inc. Compositions and methods for restoring immune responsiveness in patients with immunological defects
US7592429B2 (en) 2005-05-03 2009-09-22 Ucb Sa Sclerostin-binding antibody
US8003108B2 (en) 2005-05-03 2011-08-23 Amgen Inc. Sclerostin epitopes
WO2007015114A1 (en) * 2005-08-01 2007-02-08 Savvas Savvakis Internal combustion engine
JP2007224093A (ja) * 2006-02-21 2007-09-06 Tokyo Ohka Kogyo Co Ltd 接着層形成用組成物、及びこれを用いた凸版印刷版、並びに凸版印刷版の製造方法
DE602007009954D1 (de) 2006-03-22 2010-12-02 Viral Logic Systems Technology Verfahren zur identifizierung von polypeptid-targets
EP1999514B1 (de) * 2006-03-30 2018-10-03 Ciba Holding Inc. Lichtempfindliche resistzusammensetzung für farbfilter zur verwendung für anzeigevorrichtungen mit elektronischem papier
US8377448B2 (en) * 2006-05-15 2013-02-19 The Board Of Trustees Of The Leland Standford Junior University CD47 related compositions and methods for treating immunological diseases and disorders
US20080131431A1 (en) * 2006-05-15 2008-06-05 Viral Logic Systems Technology Corp. CD47 related compositions and methods for treating immunological diseases and disorders
CL2007002567A1 (es) 2006-09-08 2008-02-01 Amgen Inc Proteinas aisladas de enlace a activina a humana.
US20100036091A1 (en) 2006-11-10 2010-02-11 Amgen Inc. Antibody-based diagnostics and therapeutics
US7982016B2 (en) 2007-09-10 2011-07-19 Amgen Inc. Antigen binding proteins capable of binding thymic stromal lymphopoietin
JP5332566B2 (ja) * 2008-12-05 2013-11-06 東洋紡株式会社 水現像性凸版印刷用感光性樹脂組成物及びそれから得られる水現像性凸版印刷用感光性樹脂原版
EP2512600A2 (de) 2009-12-18 2012-10-24 Amgen Inc. Wise-bindemittel und epitope
KR102033185B1 (ko) 2011-06-17 2019-10-16 유니버시티 오브 테네시 리서치 파운데이션 그룹 a 스트렙토콕쿠스 다가 백신
KR102055958B1 (ko) 2011-12-22 2019-12-13 글리코미메틱스, 인크. E-셀렉틴 길항제 화합물, 조성물, 및 이용 방법
EP2847219A1 (de) 2012-05-07 2015-03-18 Amgen Inc. Anti-erythropoietin-antikörper
WO2014004549A2 (en) 2012-06-27 2014-01-03 Amgen Inc. Anti-mesothelin binding proteins
US9867841B2 (en) 2012-12-07 2018-01-16 Glycomimetics, Inc. Compounds, compositions and methods using E-selectin antagonists for mobilization of hematopoietic cells
SG11201505960VA (en) 2013-02-01 2015-08-28 Santa Maria Biotherapeutics Inc Administration of an anti-activin-a compound to a subject
US20160025749A1 (en) 2013-03-11 2016-01-28 Amgen Inc. Protein formulations
CN108139669B (zh) * 2015-09-28 2021-02-26 东洋纺株式会社 凸版印刷原版用感光性树脂组合物以及用其得到的凸版印刷原版
JP7105786B2 (ja) 2017-01-31 2022-07-25 フリント グループ ジャーマニー ゲーエムベーハー 低官能化され部分ケン化されたポリ酢酸ビニルを含む放射線硬化性混合物
WO2019072701A1 (de) 2017-10-10 2019-04-18 Flint Group Germany Gmbh Reliefvorläufer mit geringem cupping und fluting
EP4027200A1 (de) 2017-12-08 2022-07-13 Flint Group Germany GmbH Verfahren zur kennzeichnung eines reliefvorläufers zur herstellung einer reliefstruktur
EP3629089A1 (de) 2018-09-26 2020-04-01 Flint Group Germany GmbH Verfahren zur thermischen entwicklung von reliefvorläufern
JP2022531113A (ja) 2019-04-30 2022-07-06 ギガジェン，インコーポレイティッド 組換えポリクローナルタンパク質およびその使用方法
US20220227888A1 (en) 2019-06-07 2022-07-21 Amgen Inc. Bispecific binding constructs with selectively cleavable linkers
EP3835869A1 (de) 2019-12-12 2021-06-16 Flint Group Germany GmbH Fotopolymerisierbarer reliefvorläufer mit einstellbaren oberflächeneigenschaften
AU2021283933A1 (en) 2020-06-04 2023-01-05 Amgen Inc. Bispecific binding constructs
WO2021253002A1 (en) 2020-06-12 2021-12-16 Gigagen, Inc. Recombinant polyclonal proteins targeting covid-19 and methods of use thereof
WO2022031834A1 (en) 2020-08-05 2022-02-10 Gigagen, Inc. Recombinant polyclonal proteins targeting zika and methods of use thereof
NL2027002B1 (en) 2020-11-27 2022-07-04 Flint Group Germany Gmbh Photosensitive composition
NL2027003B1 (en) 2020-11-27 2022-07-04 Flint Group Germany Gmbh Photosensitive composition
MX2023006573A (es) 2020-12-03 2023-06-19 Amgen Inc Constructos de inmunoglobulina con multiples dominios de union.
WO2024118785A2 (en) 2022-11-30 2024-06-06 Regeneron Pharmaceuticals, Inc. Tlr7 agonists and antibody-drug-conjugates thereof

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4842049A (de) * 1971-09-28 1973-06-19
FR2273021B1 (de) * 1974-05-31 1977-03-11 Ato Chimie
JPS5950051B2 (ja) * 1978-12-13 1984-12-06 東レ株式会社 感光性ポリアミド樹脂組成物
DE2967026D1 (en) * 1978-12-01 1984-07-05 Toray Industries Light-sensitive polyamide resin composition
JPS5574537A (en) * 1978-12-01 1980-06-05 Toray Ind Inc Photosensitive polyamide resin composition
JPS5579437A (en) * 1978-12-11 1980-06-14 Toray Ind Inc Photosensitive polyamide resin composition
DE2930343A1 (de) * 1979-07-26 1981-02-19 Huels Chemische Werke Ag Formmasse aus einem hochmolekularen linearen polyester
DE2936976C2 (de) * 1979-09-13 1986-09-18 Hüls AG, 4370 Marl Verfahren zur Herstellung von Polyether(ester)amiden
JPS56129212A (en) * 1980-03-13 1981-10-09 Toray Ind Inc Photosensitive polyamide resin composition

Also Published As

Publication number Publication date
EP0085472A1 (de) 1983-08-10
EP0085472B1 (de) 1985-12-11
JPS58117537A (ja) 1983-07-13
US4464456A (en) 1984-08-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee