DE3335658C2 - - Google Patents
Info
- Publication number
- DE3335658C2 DE3335658C2 DE3335658A DE3335658A DE3335658C2 DE 3335658 C2 DE3335658 C2 DE 3335658C2 DE 3335658 A DE3335658 A DE 3335658A DE 3335658 A DE3335658 A DE 3335658A DE 3335658 C2 DE3335658 C2 DE 3335658C2
- Authority
- DE
- Germany
- Prior art keywords
- scanning
- light beam
- slit
- marks
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001514 detection method Methods 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 10
- 238000007493 shaping process Methods 0.000 claims description 9
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 13
- 230000003287 optical effect Effects 0.000 description 11
- 238000012545 processing Methods 0.000 description 10
- 230000008859 change Effects 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57173674A JPS5963504A (ja) | 1982-10-02 | 1982-10-02 | 位置合わせ信号検出装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3335658A1 DE3335658A1 (de) | 1984-04-05 |
| DE3335658C2 true DE3335658C2 (en, 2012) | 1992-02-06 |
Family
ID=15964992
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19833335658 Granted DE3335658A1 (de) | 1982-10-02 | 1983-09-30 | Verfahren und vorrichtung zur automatischen ausrichtung von objekten |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4563094A (en, 2012) |
| JP (1) | JPS5963504A (en, 2012) |
| DE (1) | DE3335658A1 (en, 2012) |
| GB (1) | GB2131196B (en, 2012) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4794648A (en) * | 1982-10-25 | 1988-12-27 | Canon Kabushiki Kaisha | Mask aligner with a wafer position detecting device |
| JP2530587B2 (ja) * | 1983-11-26 | 1996-09-04 | 株式会社ニコン | 位置決め装置 |
| JPS60163110A (ja) * | 1984-02-06 | 1985-08-26 | Canon Inc | 位置合わせ装置 |
| US4663534A (en) * | 1984-03-08 | 1987-05-05 | Canon Kabushiki Kaisha | Position detecting device utilizing selective outputs of the photodetector for accurate alignment |
| US4801808A (en) * | 1984-07-27 | 1989-01-31 | Canon Kabushiki Kaisha | Alignment and exposure apparatus having an objective lens system capable of observing a mark on an exposure optical holding member to permit alignment of a mask relative to the exposure optical system |
| US4937459A (en) * | 1984-11-16 | 1990-06-26 | Canon Kabushiki Kaisha | Alignment signal detecting device |
| US4737032A (en) * | 1985-08-26 | 1988-04-12 | Cyberware Laboratory, Inc. | Surface mensuration sensor |
| US4697087A (en) * | 1986-07-31 | 1987-09-29 | The Perkin-Elmer Corporation | Reverse dark field alignment system for scanning lithographic aligner |
| GB2251750B (en) * | 1991-01-09 | 1994-10-26 | Gec Ferranti Defence Syst | An optical system for the determination of the position of an object |
| JPH0864518A (ja) * | 1994-06-14 | 1996-03-08 | Canon Inc | 露光方法 |
| TW341719B (en) * | 1996-03-01 | 1998-10-01 | Canon Kk | Surface position detecting method and scanning exposure method using the same |
| US6559465B1 (en) | 1996-08-02 | 2003-05-06 | Canon Kabushiki Kaisha | Surface position detecting method having a detection timing determination |
| JP2002367883A (ja) * | 2001-06-05 | 2002-12-20 | Nikon Corp | マーク検出方法、荷電粒子ビーム露光方法、荷電粒子ビーム露光装置及びデバイス製造方法 |
| CN108515280A (zh) * | 2018-03-29 | 2018-09-11 | 大族激光科技产业集团股份有限公司 | 激光打孔装置及打孔方法 |
| CN111351794B (zh) * | 2018-12-20 | 2021-12-10 | 上海微电子装备（集团）股份有限公司 | 一种物体表面检测装置及检测方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5952535B2 (ja) * | 1977-01-21 | 1984-12-20 | キヤノン株式会社 | 光学装置 |
| US4199219A (en) * | 1977-04-22 | 1980-04-22 | Canon Kabushiki Kaisha | Device for scanning an object with a light beam |
| US4277178A (en) * | 1980-01-15 | 1981-07-07 | Ford Aerospace & Communications Corp. | Web element concentration detection system |
| JPS5719726A (en) * | 1980-07-10 | 1982-02-02 | Nippon Kogaku Kk <Nikon> | Positioning device |
-
1982
- 1982-10-02 JP JP57173674A patent/JPS5963504A/ja active Granted
-
1983
- 1983-09-22 US US06/534,828 patent/US4563094A/en not_active Expired - Lifetime
- 1983-09-23 GB GB08325482A patent/GB2131196B/en not_active Expired
- 1983-09-30 DE DE19833335658 patent/DE3335658A1/de active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| DE3335658A1 (de) | 1984-04-05 |
| GB8325482D0 (en) | 1983-10-26 |
| US4563094A (en) | 1986-01-07 |
| GB2131196A (en) | 1984-06-13 |
| JPS6352322B2 (en, 2012) | 1988-10-18 |
| GB2131196B (en) | 1987-01-28 |
| JPS5963504A (ja) | 1984-04-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| 8125 | Change of the main classification |
Ipc: G03F 9/00 |
|
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition |