DE3323844C2 - - Google Patents

Info

Publication number
DE3323844C2
DE3323844C2 DE19833323844 DE3323844A DE3323844C2 DE 3323844 C2 DE3323844 C2 DE 3323844C2 DE 19833323844 DE19833323844 DE 19833323844 DE 3323844 A DE3323844 A DE 3323844A DE 3323844 C2 DE3323844 C2 DE 3323844C2
Authority
DE
Germany
Prior art keywords
sio2
filler
use according
glass
plastic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19833323844
Other languages
German (de)
English (en)
Other versions
DE3323844A1 (de
Inventor
Hubert Dr. 8000 Muenchen De Aulich
Karl-Heinz 8162 Schliersee De Eisenrith
Hans-Peter Dr. 8000 Muenchen De Urbach
Hans Dr. 8035 Gauting De Denk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Priority to DE19833323844 priority Critical patent/DE3323844A1/de
Publication of DE3323844A1 publication Critical patent/DE3323844A1/de
Application granted granted Critical
Publication of DE3323844C2 publication Critical patent/DE3323844C2/de
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/295Organic, e.g. plastic containing a filler
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/126Preparation of silica of undetermined type
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/06Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C03C3/061Glass compositions containing silica with more than 90% silica by weight, e.g. quartz by leaching a soluble phase and consolidating
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Glass Compositions (AREA)
DE19833323844 1983-07-01 1983-07-01 Verfahren zum herstellen von als fuellstoff mit geringer (alpha)-aktivitaet fuer kunststoffe verwendbarem siliziumdioxid Granted DE3323844A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19833323844 DE3323844A1 (de) 1983-07-01 1983-07-01 Verfahren zum herstellen von als fuellstoff mit geringer (alpha)-aktivitaet fuer kunststoffe verwendbarem siliziumdioxid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19833323844 DE3323844A1 (de) 1983-07-01 1983-07-01 Verfahren zum herstellen von als fuellstoff mit geringer (alpha)-aktivitaet fuer kunststoffe verwendbarem siliziumdioxid

Publications (2)

Publication Number Publication Date
DE3323844A1 DE3323844A1 (de) 1985-01-03
DE3323844C2 true DE3323844C2 (es) 1988-04-28

Family

ID=6202958

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19833323844 Granted DE3323844A1 (de) 1983-07-01 1983-07-01 Verfahren zum herstellen von als fuellstoff mit geringer (alpha)-aktivitaet fuer kunststoffe verwendbarem siliziumdioxid

Country Status (1)

Country Link
DE (1) DE3323844A1 (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE9013615U1 (es) * 1990-09-28 1990-12-06 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt, De

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4795769A (en) * 1986-08-04 1989-01-03 Siemens Aktiengesellschaft Electric insulation with a silicic acid additive made by a melt process

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3123009A1 (de) * 1981-06-10 1982-12-30 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von fuer solarzellen verwendbarem silizium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE9013615U1 (es) * 1990-09-28 1990-12-06 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt, De

Also Published As

Publication number Publication date
DE3323844A1 (de) 1985-01-03

Similar Documents

Publication Publication Date Title
DE3002353C2 (es)
DE2133652C3 (de) Glaskeramik mit Fluorphlogopit-Kristallen, die sich durch gute dielektrische Eigenschaften, Wärmeschockfestigkeit und verbesserte maschinelle Bearbeitbarkeit auszeichnet
EP0199941B1 (de) Anorganische Formmasse mit Gehalten einer steinbildenden Komponente
DE2935797A1 (de) Faserfoermiges feuerfestes isoliermaterial
DE3705038C2 (es)
DE3934971C1 (es)
DE1927600A1 (de) Keramische Artikel niederer Ausdehnung
DE3509955C2 (es)
DE3323844C2 (es)
DE3226340C2 (es)
DE1496465B2 (de) Kristallisierte abdichtglaeser mit waermeausdehnungskoeffi zienten von hoechstens 70 x 10 hoch 7 grad c (0 450 grad c) die bei temperaturen unter 700 grad c entglast worden sind und verfahren zur herstellung einer kristallisierten glasab dichtung
EP0522343B1 (de) Hochfestes Tonerdeporzellan
DE3346772C2 (es)
DE4342996A1 (de) Schaumglasgranulat und Verfahren zu seiner Herstellung
DE2435555C2 (de) Optisches glas des systems sio tief 2 -b tief 2 o tief 3 -bao-la tief 2 o tief 3 -zro tief 2 mit der optischen lage nd=(1,650+-2)x10 hoch -3 und vd=55,5+-1,0, das sich durch hohe chemische bestaendigkeit und geringe kristallisationsneigung auszeichnet
EP0661240A2 (de) Schaumglasgranulat und Verfahren zu seiner Herstellung
DE3623684C2 (es)
DE3835492C2 (es)
EP0255657B1 (de) Elektrische Isolierung
DE3304104A1 (de) Kalziumfluorphlogopit-glaskeramiken
DE3329102C2 (de) Niedrigtemperatur-Abdichtungszusammensetzung
AT264357B (de) Verfahren zur Herstellung geformter keramischer Artikel sowie Mischung zur Durchführung des Verfahrens
DE2259392B2 (de) Glaskeramik des Systems SiO2 -Al2 O3 -CaO
DE1496465C (de) Kristallisierte Abdichtgläser mit Wärmeausdehnungskoeffizienten von höchstens 70 χ 10 hoch -7 /Grad C (0-450 Grad C), die bei Temperaturen unter 700 Grad C entglast worden sind, und Verfahren zur Herstellung einer kristallisierten Glasabdichtung
DD291445A7 (de) Verfahren zur herstellung von kieselglas-schmelzgranulat

Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee