DE3275563D1 - Apparatus for electroplating a metallic workpiece - Google Patents
Apparatus for electroplating a metallic workpieceInfo
- Publication number
- DE3275563D1 DE3275563D1 DE8282110104T DE3275563T DE3275563D1 DE 3275563 D1 DE3275563 D1 DE 3275563D1 DE 8282110104 T DE8282110104 T DE 8282110104T DE 3275563 T DE3275563 T DE 3275563T DE 3275563 D1 DE3275563 D1 DE 3275563D1
- Authority
- DE
- Germany
- Prior art keywords
- electroplating
- metallic workpiece
- workpiece
- metallic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE8282110104T DE3275563D1 (en) | 1981-11-06 | 1982-11-03 | Apparatus for electroplating a metallic workpiece |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3144128A DE3144128C1 (de) | 1981-11-06 | 1981-11-06 | Vorrichtung zum galvanischen Abscheiden eines Metalls auf einem metallischen Werkstueck |
DE8282110104T DE3275563D1 (en) | 1981-11-06 | 1982-11-03 | Apparatus for electroplating a metallic workpiece |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3275563D1 true DE3275563D1 (en) | 1987-04-09 |
Family
ID=6145791
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3144128A Expired DE3144128C1 (de) | 1981-11-06 | 1981-11-06 | Vorrichtung zum galvanischen Abscheiden eines Metalls auf einem metallischen Werkstueck |
DE8282110104T Expired DE3275563D1 (en) | 1981-11-06 | 1982-11-03 | Apparatus for electroplating a metallic workpiece |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3144128A Expired DE3144128C1 (de) | 1981-11-06 | 1981-11-06 | Vorrichtung zum galvanischen Abscheiden eines Metalls auf einem metallischen Werkstueck |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0079032B1 (de) |
DE (2) | DE3144128C1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4933051A (en) * | 1989-07-24 | 1990-06-12 | Omi International Corporation | Cyanide-free copper plating process |
US6413390B1 (en) * | 2000-10-02 | 2002-07-02 | Advanced Micro Devices, Inc. | Plating system with remote secondary anode for semiconductor manufacturing |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL71231C (de) * | 1948-04-22 | |||
DE1496966A1 (de) * | 1966-12-29 | 1969-08-14 | Peach Arthur Leslie | Plattierungsverfahren |
FR1582093A (de) * | 1968-05-31 | 1969-09-26 | ||
GB1273978A (en) * | 1968-07-08 | 1972-05-10 | Nat Res Dev | Improvements in or relating to electrolytic deposition of metals |
DE1926974A1 (de) * | 1969-05-23 | 1970-11-26 | Siemens Ag | Einrichtung zur selektiven Reinigung galvanischer Baeder |
-
1981
- 1981-11-06 DE DE3144128A patent/DE3144128C1/de not_active Expired
-
1982
- 1982-11-03 EP EP82110104A patent/EP0079032B1/de not_active Expired
- 1982-11-03 DE DE8282110104T patent/DE3275563D1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0079032B1 (de) | 1987-03-04 |
DE3144128C1 (de) | 1983-06-09 |
EP0079032A1 (de) | 1983-05-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |